Method for rule-based retargeting of target pattern
A method for generating a retargeted pattern for a target pattern to be printed on a substrate. The method includes obtaining (i) the target pattern comprising at least one feature, the at least one feature having geometry including a first dimension and a second dimension, and (ii) a plurality of biasing rules defined as a function of the first dimension, the second dimension, and a property associated with features of the target pattern within a measurement region; determining values of the property at a plurality of locations on the at least one feature of the target pattern, each location surrounded by the measurement region; selecting, from the plurality of biasing rules based on the values of the property, a sub-set of biases; and generating the retargeted pattern by applying the selected sub-set of biases to the at least one feature of the target pattern.
1. A method of generating a retargeted pattern for a target pattern to be printed on a substrate, the method comprising:
obtaining (i) the target pattern, the target pattern comprising at least one feature having geometry including a first dimension and a second dimension, and (ii) a plurality of biasing rules defined as a function of the first dimension, the second dimension, and a property associated with a plurality of features of the target pattern;
determining values of the property at a plurality of locations on the at least one feature of the target pattern;
selecting, from the plurality of biasing rules based on the values of the property, a sub-set of biases for the plurality of locations on the at least one feature; and
generating, by a hardware computer system, the retargeted pattern for the target pattern by applying the selected sub-set of biases to the at least one feature of the target pattern.
2. The method of claim 1 , wherein the determining of the values of the property comprises:
(a) assigning a measurement region around a given location at the at least one feature;
(b) identifying one or more features within the measurement region;
(c) calculating, via a user-defined function, a value of the property associated with the identified one or more features within the measurement region; and
(d) selecting another location at the at least one feature, and performing steps (b) and (c) using the measurement region in (a).
3. The method of claim 2 , wherein the calculating of the value of the property comprises applying a convolution operation between a measurement region and the user-defined function.
4. The method of claim 3 , wherein the measurement region is represented as an image comprising the one or more features, and the value of the property is calculated by convoluting the image with the user-defined function.
5. The method of claim 2 , wherein the user-defined function is a geometric function, a signal processing function or an image processing function that transforms the one or more features within the measurement region into a characteristic value, the characteristic value being specific to the one or more features in a defined location.
6. The method of claim 5 , wherein the user-defined function is a geometric function and the geometric function is a function of a shape, size, or relative position of the at least one feature of the target pattern.
7. The method of claim 5 , wherein the user-defined function is a signal processing function and the signal processing function is an image processing function, a sinusoidal function, cosine function, or a Fourier transform.
8. The method of claim 5 , wherein the user-defined function is an image processing function and the image processing function is a low-pass filter and/or an edge-detection function.
9. The method of claim 1 , wherein the property is a density of features or a kernel.
10. The method of claim 9 , wherein the property is a density of features and further comprising calculating the density, the calculating the density comprising:
determining a total area of identified one or more features within a measurement region;
determining a total area of the measurement region; and
computing a density value as a ratio of the total area of features within the measurement region and the total area of the measurement region.
11. The method of claim 1 , wherein each location is surrounded by a measurement region and the measurement region is movable across the target pattern, and wherein the target pattern is a design pattern, an after development image pattern, and/or an etch pattern.
12. The method of claim 1 , wherein the first dimension is a width of the at least one feature, and the second dimension is a space between the at least one feature and a neighboring feature, wherein the selected biases for a given width and space are retarget values, each retarget value is for a portion of the at least one feature of the target pattern, and wherein the method further comprises:
applying each retarget value to a corresponding edge to generate the retargeted pattern; and
applying an optical proximity correction to the retargeted pattern to produce a post-optical proximity correction pattern.
13. The method of claim 1 , wherein each bias of the plurality of biases are at least one selected from:
etch compensation to be applied to an after development inspection pattern so that an etch pattern is within the desired specification;
a model-error compensation associated with one or more process models used for simulating a patterning process;
a mask proximity correction to be applied to a design layout to reduce a variation in the target pattern, the variation caused due to mask manufacturing; or
an initial OPC bias to be applied to the design layout to generate an initial retargeted layout for optimal proximity correction.
14. The method of claim 1 , wherein the biasing rules are represented as a table of the first dimension and the second dimension for each of the property, or represented in a plurality of tables depending on an outcome of applying a kernel used to determine the property.
15. The method of claim 1 , wherein the selecting of biases comprises:
(a) identifying a range in which a given value of the property belongs;
(b) selecting, for the identified range of the property, a biasing rule from the plurality of biasing rules; and
(c) selecting, from the biasing rule, a bias value associated with a given location of the plurality of locations on the at least one feature for given values of the first dimension and the second dimension.
16. A non-transitory computer readable medium having instructions therein, the instructions, when executed by a computer system, configured to cause the computer system to at least:
obtain (i) a target pattern to be printed on a substrate, the target pattern comprising at least one feature having geometry including a first dimension and a second dimension, and (ii) a plurality of biasing rules defined as a function of the first dimension, the second dimension, and a property associated with a plurality of features of the target pattern;
determine values of the property at a plurality of locations on the at least one feature of the target pattern;
select, from the plurality of biasing rules based on the values of the property, a sub-set of biases for the plurality of locations on the at least one feature; and
generate a retargeted pattern for the target pattern by applying the selected sub-set of biases to the at least one feature of the target pattern performance of the method of claim 1 .
17. The medium of claim 16 , wherein the instructions configured to cause the computer system to determine the values of the property are further configured to cause the computer system to:
(a) assign a measurement region around a given location at the at least one feature;
(b) identify one or more features within the measurement region;
(c) calculate, via a user-defined function, a value of the property associated with the identified one or more features within the measurement region; and
(d) select another location at the at least one feature, and perform (b) and (c) using the measurement region in (a).
18. The medium of claim 16 , wherein the property is a density of features or a kernel.
19. The medium of claim 16 , wherein the first dimension is a width of the at least one feature, and the second dimension is a space between the at least one feature and a neighboring feature, wherein the selected biases for a given width and space are retarget values, each retarget value is for a portion of the at least one feature of the target pattern, and wherein the instructions are further configured to cause the computer system to:
apply each retarget value to a corresponding edge to generate the retargeted pattern; and
apply an optical proximity correction to the retargeted pattern to produce a post-optical proximity correction pattern.
20. The medium of claim 16 , wherein each bias of the plurality of biases are at east one selected from:
etch compensation to be applied to an after development inspection pattern so that an etch pattern is within the desired specification;
a model-error compensation associated with one or more process models used for simulating a patterning process;
a mask proximity correction to be applied to a design layout to reduce a variation in the target pattern, the variation caused due to mask manufacturing; or
an initial OPC bias to be applied to the design layout to generate an initial retargeted layout for optimal proximity correction.