Semiconductor device and electronic system including the same
A semiconductor device includes a substrate that includes a cell array region, a peripheral region, and a scribe lane region. A stack structure is disposed on the cell array region of the substrate and includes electrodes that are vertically stacked and spaced apart from each other. A dummy structure extends from the peripheral region to the scribe lane region of the substrate and includes first dielectric layers and second dielectric layers that are alternately and repeatedly stacked. A vertical channel structure penetrates the stack structure, and a slit in the dummy structure on the scribe lane region. The slit extends in a direction that is perpendicular to a top surface of the substrate and penetrates at least a portion of the dummy structure. The slit includes a void.
1. A semiconductor device, comprising:
a substrate including a cell array region, a peripheral region, and a scribe lane region;
a stack structure disposed on the cell array region of the substrate, the stack structure including a plurality of electrodes that are vertically stacked and spaced apart from each other;
a dummy structure extending from the peripheral region to the scribe lane region of the substrate, the dummy structure including a plurality of first dielectric layers and a plurality of second dielectric layers that are alternately and repeatedly stacked, the plurality of first dielectric layers and the plurality of second dielectric layers being spaced apart from the stack structure in a horizontal direction that is perpendicular to the direction of the vertical stacking of the stack structure;
a vertical channel structure penetrating the stack structure; and
a slit disposed in the dummy structure on the scribe lane region,
wherein the slit extends in a direction perpendicular to a top surface of the substrate and the slit penetrates at least a portion of the dummy structure, and
wherein the slit includes a void.
2. The semiconductor device of claim 1 , wherein the slit completely penetrates the dummy structure.
3. The semiconductor device of claim 1 , wherein the slit further includes a slit dielectric layer.
4. The semiconductor device of claim 3 , wherein
the vertical channel structure includes a vertical dielectric pattern, and
the slit dielectric layer includes a material that is the same as a material of the vertical dielectric pattern.
5. The semiconductor device of claim 1 , wherein
the dummy structure includes a first dummy structure and a second dummy structure disposed on the first dummy structure, and
the slit includes a first slit disposed in the first dummy structure and a second slit disposed in the second dummy structure.
6. The semiconductor device of claim 5 , wherein
the first slit includes a first void, and
the second slit includes a second void.
7. The semiconductor device of claim 5 , wherein the first slit in the first dummy structure at least partially overlaps the second slit in the second dummy structure in a vertical direction.
8. The semiconductor device of claim 1 , wherein
the slit is provided in plural, and
the plurality of slits is arranged on the scribe lane region and forms a slit array.
9. The semiconductor device of claim 1 , wherein the slit has a linear pattern shape that extends on the scribe lane region.
10. The semiconductor device of claim 1 , wherein the void is filled with air.
11. A semiconductor device, comprising:
a substrate including a cell array region, a peripheral region, and a scribe lane region;
a stack structure disposed on the cell array region of the substrate, the stack structure including a plurality of electrodes that are vertically stacked and spaced apart from each other;
a dummy structure extending from the peripheral region to the scribe lane region of the substrate, the dummy structure including a plurality of first dielectric layers and a plurality of second dielectric layers that are alternately and repeatedly stacked, the plurality of first dielectric layers and the plurality of second dielectric layers being spaced apart from the stack structure in a horizontal direction that is perpendicular to the direction of the vertical stacking of the stack structure;
a vertical channel structure penetrating the stack structure; and
a slit disposed in the dummy structure on the scribe lane region,
wherein the slit extends in a direction perpendicular to a top surface of the substrate and penetrates at least a portion of the dummy structure, and
wherein the slit includes a slit layer that at least partially covers a top surface of the slit.
12. The semiconductor device of claim 11 , wherein
the vertical channel structure includes a vertical dielectric pattern, and
the slit layer includes a material that is the same as a material of the vertical dielectric pattern.
13. The semiconductor device of claim 11 , wherein the slit layer is formed by a physical vapor deposition process.
14. The semiconductor device of claim 11 , further comprising a slit dielectric layer that at least partially surrounds the slit.
15. The semiconductor device of claim 14 , where the slit dielectric layer and the slit layer define a void in the slit.
16. The semiconductor device of claim 11 , wherein the slit is formed substantially simultaneously with the vertical channel structure.
17. The semiconductor device of claim 11 , wherein
the slit is provided in plural, and
the plurality of slits is arranged on the scribe lane region and forms a slit array.
18. An electronic system, comprising:
a three-dimensional semiconductor memory device; and
a controller electrically connected to the three-dimensional semiconductor memory device and configured to control the three-dimensional semiconductor memory device,
wherein the three-dimensional semiconductor memory device comprises:
a substrate that includes a cell array region, a peripheral region, and a scribe lane region;
a stack structure disposed on the cell array region of the substrate, the stack structure including a plurality of electrodes that are vertically stacked and spaced apart from each other;
a dummy structure that extends from the peripheral region to the scribe lane region of the substrate, the dummy structure including a plurality of first dielectric layers and a plurality of second dielectric layers that are alternately and repeatedly stacked, the plurality of first dielectric layers and the plurality of second dielectric layers being spaced apart from the stack structure in a horizontal direction that is perpendicular to the direction of the vertical stacking of the stack structure;
a vertical channel structure penetrating the stack structure; and
a slit disposed in the dummy structure on the scribe lane region,
wherein the slit extends in a direction perpendicular to a top surface of the substrate and penetrates at least a portion of the dummy structure, and
wherein the slit includes a void.
19. The electronic system of claim 18 , wherein
the stack structure has a stepwise structure, and
each of a plurality of cell contact plugs is coupled to a corresponding electrode constituting the stepwise structure of the stack structure.
20. The electronic system of claim 19 , wherein the cell contact plugs are formed substantially simultaneously with the slit.