Radiation shield
A radiation shield and an assembly and a reactor including the radiation shield are disclosed. The radiation shield can be used to control heat flux from a susceptor heater assembly and thereby enable better control of temperatures across a surface of a substrate placed on a surface of the susceptor heater assembly.
1. An apparatus for supporting a substrate during a reaction process, the apparatus comprising:
a susceptor heater assembly comprising a substrate support surface, a base, and a side surface; and
a radiation shield coupled to the susceptor heater assembly, wherein the radiation shield is positioned opposite the substrate support surface proximate to a bottom surface of the base, wherein the radiation shield comprises a plate having an outer diameter and an inner diameter, and wherein the plate is coupled to the side surface of the susceptor heater assembly at the outer diameter and is spaced apart a distance at the inner diameter from a movable pedestal adapted to vertically position the susceptor heater assembly in the reaction chamber.
2. The apparatus of claim 1 , further comprising a flow control ring, wherein the radiation shield is coupled to the susceptor heater assembly by the flow control ring, wherein the flow control ring is coupled to the radiation shield and the side surface of the susceptor heater assembly and extends along a perimeter of the susceptor heater assembly.
3. The apparatus of claim 2 , wherein the radiation shield includes one or more protrusions extending from the outer diameter of the plate and used to couple the radiation shield to the flow control ring.
4. The apparatus of claim 3 , wherein the flow control ring comprises one or more notches to receive the one or more protrusions to couple the radiation shield to the flow control ring.
5. The apparatus of claim 4 , wherein each of the one or more notches includes a first section to receive one of the one or more protrusions and a second section to retain the one of the one or more protrusions.
6. The apparatus of claim 5 , wherein the second section includes a first surface, a second surface, and a third surface spanning therebetween, and wherein the third surface is tapered, whereby the radiation shield is attached to the flow control ring without separate fasteners.
7. The apparatus of claim 2 , wherein the radiation shield includes an upper surface facing the bottom surface of the base that has a surface treatment configured to reflect one or more wavelengths of infrared radiation.
8. The apparatus of claim 2 , wherein the side surface includes a ledge and wherein the flow control ring is configured to rest upon the ledge when the flow control ring is coupled to the base of the susceptor heater assembly.
9. The apparatus of claim 1 , further comprising an attachment device coupled to the plate, wherein the attachment device is configured to removably couple the plate to the side surface of the susceptor heater assembly.
10. The apparatus of claim 9 , wherein the plate comprises a first section and a second section, wherein the first section comprises an annular disc having an inner perimeter and an outer perimeter, and wherein the second section comprising a hollow frusto shape.
11. The apparatus of claim 10 , wherein the attachment device is coupled to the second section of the plate.
12. The apparatus of claim 11 , wherein the attachment device comprises a slidable member configured to slide along the second section of the plate.
13. An apparatus for supporting a substrate during a reaction process, the apparatus comprising:
a susceptor heater assembly comprising a substrate support surface, a base, and a side surface;
a flow control ring coupled to the side surface and extending along a perimeter of the susceptor heater assembly; and
a radiation shield coupled to the flow control ring, wherein the radiation shield is positioned opposite the substrate support surface proximate to a bottom surface of the base, and wherein the radiation shield comprises a plate, wherein the plate is supported at an outer diameter by the flow control ring, wherein a gap is provided between the plate and the bottom surface of the base of the susceptor heater assembly, and wherein the plate does not contact the heater assembly at an inner diameter.
14. The apparatus of claim 13 , wherein the gap is retained at the inner diameter of the plate.
15. The apparatus of claim 13 , wherein the radiation shield comprises one or more protrusions extending from the outer diameter of the plate and used to couple the radiation shield to the flow control ring.
16. The apparatus of claim 15 , wherein the flow control ring comprises one or more notches to receive the one or more protrusions to couple the radiation shield to the flow control ring.
17. The apparatus of claim 16 , wherein each of the one or more notches includes a first section to receive one of the one or more protrusions and a second section to retain the one of the one or more protrusions.