Buried power rail with robust connection to a wrap around contact
A buried power rail contact structure is provided that wraps around a source/drain region of a first field effect transistor (FET), contacts a surface of a buried power rail, and has a reduced height as compared to a height of a neighboring source/drain contact structure that contacts a surface of a source/drain region of a second FET. Both the buried power rail contact structure and the source/drain contact structure have a negative taper, i.e., each of the buried power rail contact structure and the source/drain contact structure has outermost sidewalls that slope outward from a topmost surface of the contact structure to a bottommost surface of the contact structure. Such contact structures reduce the parasitic capacitance between a functional gate structure and the contact structure.
1. A semiconductor structure comprising:
a first functional gate structure having a first source/drain region and located in a first active area of a semiconductor substrate;
a second functional gate structure having a second source/drain region and located in a second active area of the semiconductor substrate;
a shallow trench isolation structure separating the first active area of the semiconductor substrate from the second active area of the semiconductor substrate;
a buried power rail located between the first active area and the second active area and beneath a topmost surface of the shallow trench isolation structure;
a buried power rail contact structure having a negative taper and contacting the buried power rail and the first source/drain region;
a source/drain contact structure having a negative taper and contacting the second source/drain region, wherein the buried power rail contact structure has a topmost surface that is vertically offset from, and located beneath, a topmost surface of the source/drain contact structure; and
an interlayer dielectric material layer located laterally adjacent to, and above, the buried power rail contact structure and laterally adjacent to the source/drain contact structure, wherein the buried power rail contact structure contacts a first portion of the buried power rail, and the interlayer dielectric material layer contacts a second portion of the buried power rail, and the interlayer dielectric material layer has a topmost surface that is coplanar with a topmost surface of the source/drain contact structure.
2. The semiconductor structure of claim 1 , wherein the buried power rail contact structure is a wrap-around contact contacting an upper portion of outermost sidewalls of the first source/drain region and a topmost surface of the first source/drain region.
3. The semiconductor structure of claim 2 , further comprising a dielectric spacer contacting a lower portion of the outermost sidewalls of the first source/drain region.
4. The semiconductor structure of claim 1 , wherein the source/drain contact structure is a wrap-around contact contacting an upper portion of outermost sidewalls of the second source/drain region and a topmost surface of the second source/drain region.
5. The semiconductor structure of claim 4 , further comprising a dielectric spacer contacting a lower portion of the outermost sidewalls of the second source/drain region.
6. The semiconductor structure of claim 1 , further comprising a protective spacer located between sidewalls of the buried power rail and the first active area of the semiconductor substrate and the second active area of the semiconductor substrate.
7. The semiconductor structure of claim 6 , wherein the protective spacer has a topmost surface that extends above a topmost surface of the semiconductor substrate and contacts a lower portion of the outermost sidewalls of both the first source/drain region and the second source/drain region.
8. The semiconductor structure of claim 1 , further comprising a bottom dielectric isolation layer located beneath each of the first functional gate structure, the first source/drain region, the second functional gate structure, and the second source/drain region.
9. The semiconductor structure of claim 1 , wherein each of the first functional gate structure and the second functional gate structure contacts a surface of a semiconductor channel material structure.
10. The semiconductor structure of claim 9 , wherein the semiconductor channel material structure comprises at least one semiconductor channel material nanosheet, and wherein the first functional gate structure wraps around the at least one semiconductor channel material nanosheet present in the first active area, and wherein the second functional gate structure wraps around the at least one semiconductor channel material nanosheet present in the second active area.
11. The semiconductor structure of claim 1 , further comprising an interconnect structure located above the first functional gate structure and the second functional gate structure.
12. The semiconductor structure of claim 11 , wherein the interconnect structure comprises an electrically conductive structure embedded in an interconnect dielectric material layer, wherein the electrically conductive structure contacts a surface of the source/drain contact structure.
13. The semiconductor structure of claim 1 , wherein both the buried power rail contact structure and the source/drain contact structure has an upper portion having a first width and a lower portion having a second width, wherein the first width is less than the second width.
14. A semiconductor structure comprising:
a first functional gate structure having a first source/drain region and located in a first active area of a semiconductor substrate;
a second functional gate structure having a second source/drain region and located in a second active area of the semiconductor substrate;
a shallow trench isolation structure separating the first active area of the semiconductor substrate from the second active area of the semiconductor substrate;
a buried power rail located between the first active area and the second active area and beneath a topmost surface of the shallow trench isolation structure;
a buried power rail contact structure contacting the buried power rail and the first source/drain region;
a source/drain contact structure contacting the second source/drain region, wherein both the buried power rail contact structure and the source/drain contact structure are pyramidal in shape and the buried power rail contact structure has a topmost surface that is vertically offset from, and located beneath, a topmost surface of the source/drain contact structure; and
an interlayer dielectric material layer located laterally adjacent to, and above, the buried power rail contact structure, and laterally adjacent to the source/drain contact structure, wherein the buried power rail contact structure is entirely embedded in the interlayer dielectric material layer, and the interlayer dielectric material layer has a topmost surface that is coplanar with a topmost surface of the source/drain contact structure.
15. The semiconductor structure of claim 14 , wherein the buried power rail contact structure is a wrap-around contact contacting an upper portion of outermost sidewalls of the first source/drain region and a topmost surface of the first source/drain region.
16. The semiconductor structure of claim 14 , wherein the source/drain contact structure is a wrap-around contact contacting an upper portion of outermost sidewalls of the second source/drain region and a topmost surface of the second source/drain region.