Multiple objectives metrology system, lithographic apparatus, and methods thereof
A metrology or inspection system, a lithographic apparatus, and a method are provided. The system includes an illumination system, an optical system, a first optical device, a second optical device, a detector, and a processor. The optical system is configured to split an illumination beam into a first sub-beam and a second sub-beam. The first optical device is configured to receive the first sub beam and direct the first sub-beam towards a first spot on a substrate. The substrate includes one or more target structures. The second optical device is configured to receive the second sub-beam and direct the second sub-beam towards a second spot on the substrate. The first spot is a different location than the second spot. The detector is configured to receive diffracted beams and to generate a detection signal. The processor is configured to determine a property of the one or more target structures.
1. A system comprising:
an illumination system configured to generate an illumination beam;
a non-polarizing beam splitter configured to split the illumination beam into a first sub-beam and a second sub-beam, wherein the non-polarizing beam splitter comprises four quadrants comprising a first pair of mirrored quadrants and a second pair of non-mirrored quadrants;
a first optical device configured to receive the first sub-beam via the first pair of mirrored quadrants of the non-polarizing beam splitter and direct the first sub-beam towards a first spot on a substrate, the substrate having one or more target structures;
a second optical device configured to receive the second sub-beam via the second pair of non-mirrored quadrants of the non-polarizing beam splitter and direct the second sub-beam towards a second spot on the substrate, wherein the first spot is a different location than the second spot;
an optical element configured to receive diffracted beams from the first and second spots and recombine the diffracted beams;
a detector configured to receive the recombined diffracted beams from the optical element and to generate a detection signal; and
a processor configured to analyze the detection signal to determine a property of the one or more target structures based on at least the detection signal.
2. The system of claim 1 , wherein the diffracted beams comprise non-zero diffraction orders.
3. The system of claim 1 , wherein the optical element comprises a mirror, the mirror including two reflective quadrants and two transmissive quadrants.
4. The system of claim 1 , further comprising:
a deflecting element configured to direct each diffracted beam of the diffracted beams to a respective zone of the detector.
5. The system of claim 1 , further comprising:
an optical relay system configured to direct the second sub-beam to the second spot.
6. The system of claim 5 , wherein the optical relay system comprises a lens and a mirror.
7. The system of claim 5 , further comprising a second relay system configured to direct the first sub-beam to the first optical device.
8. The system of claim 6 , further comprising:
a linkage configured to maintain the lens and the second optical device at a predefined distance with respect to each other.
9. The system of claim 8 , wherein the linkage connects the lens and the mirror to a stage of the second optical device.
10. The system of claim 9 , wherein the stage comprises a driven stage and the system further comprises a non-driven stage configured to control a movement of the lens via the linkage.
11. The system of claim 1 , wherein a position of the second optical device is adjustable relative to the first optical device.
12. The system of claim 1 , further comprising:
a second optical system configured to direct a zero diffraction order of each diffracted beam of the diffracted beams to the detector.
13. The system of claim 12 , wherein the zero diffraction order of each diffracted beam of the diffracted beams is detected at a center of the detector.
14. The system of claim 12 , wherein:
the second optical system comprises a deflecting element; and
the deflecting element is configured to direct the zero diffraction order of each diffracted beam to a respective area of the detector.
15. The system of claim 14 , wherein the deflecting element comprises an optical wedge.
16. The system of claim 1 , wherein the one or more target structures comprise two different marks.
17. The system of claim 1 , further comprising:
a third optical device configured to receive a third sub-beam and direct the third sub-beam towards a third spot on the substrate; and
a fourth optical device configured to receive a fourth sub-beam and direct the fourth sub-beam towards a fourth spot on the substrate,
wherein the first spot, the second spot, the third spot, and the fourth spot are different from each other.
18. The system of claim 17 , wherein the first optical device, the second optical device, the third optical device, and the fourth optical device are movable independently of each other.
19. A method comprising:
splitting an illumination beam into a first sub-beam and a second sub-beam using a non-polarizing beam splitter comprising four quadrants comprising a first pair of mirrored quadrants and a second pair of non-mirrored quadrants;
directing, via the first pair of mirrored quadrants of the non-polarizing beam splitter, the first sub-beam to a first spot on a substrate, wherein the substrate includes one or more target structures;
directing, via the second pair of non-mirrored quadrants of the non-polarizing beam splitter, the second sub-beam to a second spot on the substrate, wherein the first spot is a different location than the second spot;
recombining, using an optical element, diffracted beams from the first and second spots;
generating, at a detector, a detection signal based on the recombining; and
analyzing the detection signal to determine a property of the one or more target structures based on at least the detection signal.
20. A lithography apparatus comprising:
an illumination apparatus configured to illuminate a pattern of a patterning device;
a projection system configured to project an image of the pattern onto a substrate; and
a metrology or inspection system comprising:
an illumination system configured to generate an illumination beam,
a non-polarizing beam splitter configured to split the illumination beam into a first sub-beam and a second sub-beam, wherein the non-polarizing beam splitter comprises four quadrants comprising a first pair of mirrored quadrants and a second pair of non-mirrored quadrants,
a first optical device configured to receive the first sub-beam via the first pair of mirrored quadrants of the non-polarizing beam splitter and direct the first sub-beam towards a first spot on a substrate, the substrate having one or more target structures,
a second optical device configured to receive the second sub-beam via the second pair of non-mirrored quadrants of the non-polarizing beam splitter and direct the second sub-beam towards a second spot on the substrate, wherein the first spot is a different location than the second spot,
an optical element configured to receive diffracted beams from the first and second spots and recombine the diffracted beams;
a detector configured to receive recombined diffracted beams from the optical element and to generate a detection signal, and
a processor configured to analyze the detection signal to determine a property of the one or more target structures based on at least the detection signal.