Method for inspecting photosensitive composition and method for producing photosensitive composition
Provided are a method for inspecting a photosensitive composition, the method being able to more accurately evaluate photosensitive compositions produced at different times and including the same materials, and a method for producing a photosensitive composition. The method for inspecting a photosensitive composition includes a first step of performing exposure treatment, heat treatment, and development treatment in this order on a dummy substrate including a first photosensitive composition layer formed using a first photosensitive composition; a second step of performing exposure treatment, heat treatment, and development treatment under the same conditions as in the first step on a first evaluation substrate including the first photosensitive composition layer to form a pattern; a third step of performing exposure treatment, heat treatment, and development treatment under the same conditions as in the first step on a second evaluation substrate including a second photosensitive composition layer formed using a second photosensitive composition to form a pattern; and a fourth step of determining whether a difference between a dimension of the pattern obtained in the second step and a dimension of the pattern obtained in the third step is within an acceptable range. The first photosensitive composition and the second photosensitive composition are compositions including the same materials and produced in different lots.
1. A method for inspecting a photosensitive composition, comprising:
a first step of performing exposure treatment, heat treatment, and development treatment in this order on a dummy substrate including a first photosensitive composition layer formed using a first photosensitive composition;
a second step of performing exposure treatment, heat treatment, and development treatment under the same conditions as in the first step on a first evaluation substrate including the first photosensitive composition layer to form a pattern;
a third step of performing exposure treatment, heat treatment, and development treatment under the same conditions as in the first step on a second evaluation substrate including a second photosensitive composition layer formed using a second photosensitive composition to form a pattern; and
a fourth step of determining whether a difference between a dimension of the pattern obtained in the second step and a dimension of the pattern obtained in the third step is within an acceptable range,
wherein the first photosensitive composition and the second photosensitive composition are compositions including the same materials and produced in different lots.
2. The method for inspecting a photosensitive composition according to claim 1 , comprising, between the second step and the third step, a fifth step of performing exposure treatment, heat treatment, and development treatment under the same conditions as in the first step in this order on a dummy substrate including the second photosensitive composition layer.
3. The method for inspecting a photosensitive composition according to claim 2 , wherein the fifth step is a step of exposing the dummy substrate including the second photosensitive composition layer in an exposure unit under the same conditions as in the first step, heating the exposed dummy substrate in a heating unit under the same conditions as in the first step, and developing the heated dummy substrate in a development unit under the same conditions as in the first step.
4. The method for inspecting a photosensitive composition according to claim 3 , wherein the number of the dummy substrate treated in the exposure unit, the heating unit, and the development unit in the fifth step is one.
5. The method for inspecting a photosensitive composition according to claim 3 , wherein a time period between the second step and the third step is 8 minutes or more.
6. The method for inspecting a photosensitive composition according to claim 3 , wherein the first step is performed a plurality of times.
7. The method for inspecting a photosensitive composition according to claim 2 , wherein a time period between the second step and the third step is 8 minutes or more.
8. The method for inspecting a photosensitive composition according to claim 2 , wherein the first step is performed a plurality of times.
9. The method for inspecting a photosensitive composition according to claim 1 , wherein the first step is a step of exposing the dummy substrate including the first photosensitive composition layer in an exposure unit, heating the exposed dummy substrate in a heating unit, and developing the heated dummy substrate in a development unit,
the second step is a step of exposing the first evaluation substrate including the first photosensitive composition layer in the exposure unit under the same conditions as in the first step, heating the exposed first evaluation substrate in the heating unit under the same conditions as in the first step, and developing the heated first evaluation substrate in the development unit under the same conditions as in the first step to form a pattern, and
the third step is a step of exposing the second evaluation substrate including the second photosensitive composition layer in the exposure unit under the same conditions as in the first step, heating the exposed second evaluation substrate in the heating unit under the same conditions as in the first step, and developing the heated second evaluation substrate in the development unit under the same conditions as in the first step to form a pattern.
10. The method for inspecting a photosensitive composition according to claim 9 , wherein the number of the dummy substrate treated in the exposure unit, the heating unit, and the development unit in the first step is one.
11. The method for inspecting a photosensitive composition according to claim 9 , wherein the number of the first evaluation substrate treated in the exposure unit, the heating unit, and the development unit in the second step is one.
12. The method for inspecting a photosensitive composition according to claim 9 , wherein the number of the second evaluation substrate treated in the exposure unit, the heating unit, and the development unit in the third step is one.
13. The method for inspecting a photosensitive composition according to claim 9 , wherein a time period between the second step and the third step is 8 minutes or more.
14. The method for inspecting a photosensitive composition according to claim 9 , wherein the first step is performed a plurality of times.
15. The method for inspecting a photosensitive composition according to claim 1 , wherein a time period between the second step and the third step is 8 minutes or more.
16. The method for inspecting a photosensitive composition according to claim 1 , wherein the first step is performed a plurality of times.
17. A method for producing a photosensitive composition, comprising the method for inspecting a photosensitive composition according to claim 1 .
18. A method for producing a photosensitive composition, comprising the method for inspecting a photosensitive composition according to claim 2 .
19. A method for producing a photosensitive composition, comprising the method for inspecting a photosensitive composition according to claim 9 .
20. A method for producing a photosensitive composition, comprising the method for inspecting a photosensitive composition according to claim 3 .