Display panel and method for preparing same and display device
Provided are a display panel and a method for preparing same and a display device. The preparation method includes: forming a step-shaped opening on a pixel define film using a patterning process; forming an organic photoresist in the opening; performing fluorinated plasma treatment on the pixel define film outside the opening such that the pixel define film outside the opening forms a first pixel define layer having a hydrophilic surface layer, and the remaining pixel define film forms a hydrophobic second pixel define layer; and removing the organic photoresist in the opening.
1. A method for preparing a display panel, comprising:
preparing a pixel define film on a base plate, and forming a step-shaped opening on the pixel define film using a patterning process, wherein the opening comprises a first opening and a second opening, the second opening is located on a side of the first opening that is away from the base plate, and a step surface is formed at a joint between the second opening and the first opening;
forming an organic photoresist in the opening by: forming a layer of organic photoresist on the pixel define film; and removing the organic photoresist outside the opening and a part of the organic photoresist in the second opening and retaining the organic photoresist in the first opening and a part of the organic photoresist in the second opening by means of patterning, so that a top surface of the organic photoresist in the second opening is lower than a top surface of the pixel define film, a part of a sidewall of the second opening is not covered by the organic photoresist, and the organic photoresist covers the step surface;
performing fluorinated plasma treatment on the pixel define film from the top surface of the pixel define film and from the part of the sidewall of the second opening using a fluorinated plasma gas, so that the pixel define film subjected to the fluorinated plasma treatment comprises a first pixel define layer which is hydrophilic and a second pixel define layer which is hydrophobic, wherein the second pixel define layer is disposed on a side of the first pixel define layer away from the base plate and extends from outside the second opening to inside the second opening; and
removing the organic photoresist in the opening.
2. The method as claimed in claim 1 , wherein the preparing of the pixel define film on the base plate and the forming of the step-shaped opening on the pixel define film using the patterning process comprise:
coating a layer of pixel define layer material on the base plate, and curing the pixel define layer material to form the pixel define film; and
performing the patterning process on the pixel define film using an exposure and development process to form the opening.
3. The method as claimed in claim 2 , wherein the performing of the patterning process on the pixel define film using the exposure and development process to form the opening comprises:
removing an entirety of the pixel define layer material in an area corresponding to the first opening and a part of the pixel define layer material in an area outside the first opening and within the second opening using a half-tone mask and an exposure and development technology.
4. The method as claimed in claim 1 , wherein the removing of the organic photoresist outside the opening and the part of the organic photoresist in the second opening by means of patterning comprises:
removing the organic photoresist using oxygen by means of patterning.