Pattern film, method for manufacturing pattern film, and transmittance variable device comprising same
A pattern film, a method for manufacturing a pattern film, and a transmittance variable device comprising the same are disclosed herein. In some embodiments, a pattern film includes a base layer, and a spacer pattern formed on the base layer, the spacer pattern comprises a partition wall spacer comprises a plurality of spacer dots and a spacer line connecting the spacer dots, and a ball spacer, the ball spacer is one of embedded in, partially embedded in, or in contact with the partition wall spacer, when any 3 or more spacer dots are selected, the spacer line forms a closed figure having the selected spacer dots at the vertices thereof, the selected spacer dots are not present inside the closed figure, a length of at least one side of the closed figure is different from lengths of the remaining sides, and each spacer dot has irregularity of 50% or greater.
1. A pattern film, comprising:
a base layer; and
a spacer pattern formed on the base layer,
wherein the spacer pattern comprises a partition wall spacer and a ball spacer,
wherein the partition wall spacer comprises a plurality of spacer dots and a spacer line connecting the spacer dots,
wherein the ball spacer is one of embedded in, partially embedded in, or in contact with the partition wall spacer,
wherein, when any 3 or more spacer dots are selected among the plurality of spacer dots, the spacer line forms a closed figure having the selected spacer dots at the vertices thereof, wherein the selected spacer dots are not present inside the closed figure,
wherein a length of at least one side of the closed figure is different from the lengths of the remaining sides,
wherein each spacer dot in the plurality has irregularity of 50% or greater,
wherein a rectangular 200×200 pixel area is set based on an area of the pattern film through which light passes from an LED light source, and
wherein, using a lower left end corner of the rectangular 200×200 pixel area as x axis, y axis (0,0), the rectangular 200×200 pixel area of (0,0) to (200,200) satisfies the following Equation 3:
2≤ D 1− D 2(%)≤10 [Equation 3]
in Equation 3, D1 is a diffraction ratio when the spacer dot of the pattern film has irregularity of 0%; D2 is a diffraction ratio when the spacer dot of the pattern film has irregularity of 70%; and each diffraction ratio satisfies the following Equation 4:
[1− Sc/S ]×100(%) [Equation 4]
in Equation 4, S is a total amount of light in the rectangular 200×200 pixel area of (0,0) to (200,200); and Sc is an amount of pixel light in an area having pixels employing (100,100) as an origin and having a radius of 50 in the rectangular 200×200 pixel area of (0,0) to (200,200).
2. The pattern film of claim 1 , wherein a line width (T) of the partition wall of the partition wall spacer and an average particle diameter (D) of the ball spacer satisfy the following Equation 1:
1.0≤ T/D≤ 20 [Equation 1].
3. The pattern film of claim 1 , wherein the base layer is an inorganic base layer or an organic base layer.
4. The pattern film of claim 1 , wherein the spacer pattern has optical density of 0.4 or greater and 4 or less.
5. The pattern film of claim 1 , wherein the spacer pattern has a line width of 10 μm or greater and 200 μm or less.
6. The pattern film of claim 1 , wherein a total area (A) of the base layer and an area (B) of the surface of the base layer in contact with the spacer pattern satisfy the following Equation 2:
5≤[ B/A ]×100(%)≤30 [Equation 2].
7. The pattern film of claim 1 , wherein an average value of a height of the partition wall spacer is 2 μm or greater and 100 μm or less, and a standard deviation of the height of the partition wall spacer is 0.05 μm or greater and 0.5 μm or less.
8. The pattern film of claim 1 , wherein a standard deviation of a particle diameter of the ball spacer is 0.8 μm or less.
9. The pattern film of claim 1 , wherein less than 85% of the sides of the closed figure have the same length.
10. A method for manufacturing the pattern film of claim 1 , the method comprising:
forming an ultraviolet curable resin layer comprising a ball spacer on one surface of a base layer;
laminating a film mask on the ultraviolet curable resin layer;
irradiating the ultraviolet curable resin layer with ultraviolet light through the film mask;
peeling the film mask from the ultraviolet curable resin layer after the irradiation; and
peeling an uncured area of the ultraviolet curable resin layer after the irradiation.
11. A transmittance variable device, comprising:
the pattern film of claim 1 ; and
a substrate disposed opposite to the pattern film,
wherein the base layer of the pattern film and the substrate are separated by a space, and
wherein the space is maintained by the spacer pattern of the pattern film.
12. The transmittance variable device of claim 11 , comprising an adhesive layer disposed between the pattern film and the substrate, wherein the adhesive layer has a vertical alignment force.