Semiconductor structure including multiple gate electrodes
The present disclosure provides a semiconductor structure. The semiconductor structure includes: a first doped structure over a substrate and a second doped structure over the first doped structure and the substrate; a first gate layer, at last partially disposed between the first doped structure and the second doped structure; a first gate dielectric layer, surrounding the first gate layer; a channel layer, surrounding the first gate dielectric layer; a second gate dielectric layer, surrounding the channel layer; and a second gate layer, surrounding the second gate dielectric layer. A manufacturing method for forming the same is also provided.
1 . A semiconductor structure, comprising:
a first doped structure over a substrate and a second doped structure over the first doped structure and the substrate;
a first gate layer having a lower portion disposed between the first doped structure and the second doped structure and an upper portion disposed above the second doped structure;
a first gate dielectric layer, surrounding the first gate layer;
a channel layer, surrounding the first gate dielectric layer;
a second gate dielectric layer, surrounding the channel layer; and
a second gate layer, surrounding the second gate dielectric layer.
2 . The semiconductor structure of claim 1 , wherein the first gate layer penetrates through the second doped structure to define the lower portion below the second doped structure and the upper portion above the second doped structure.
3 . The semiconductor structure of claim 1 , wherein the first gate dielectric layer penetrates through the second doped structure at a position that an upper portion of the first gate dielectric layer is disposed above the second doped structure.
4 . The semiconductor structure of claim 1 , wherein an entirety of the channel layer is disposed between the first doped structure and the second doped structure at a position that an upper end of the channel layer is in contact with the second doped structure while a lower end of the channel layer is in contact with the first doped structure.
5 . The semiconductor structure of claim 1 , wherein an entirety of the second gate dielectric layer is disposed between the first doped structure and the second doped structure at a position that an upper end of the second gate dielectric layer is in contact with the second doped structure while a lower end of the second gate dielectric is in contact with the first doped structure.
6 . The semiconductor structure of claim 1 , wherein an entirety of the second gate layer is disposed below the second doped structure.
7 . The semiconductor structure of claim 1 , further comprising:
a first spacer layer, separating the second gate layer from the first doped structure; and
a second spacer layer, separating the second gate layer from the second doped structure;
wherein a thickness of the first spacer layer is equal to a thickness of the second spacer layer and is equal to a thickness of the second gate layer.
8 . The semiconductor structure of claim 1 , wherein the first gate dielectric layer has a base and a hollow portion extended therefrom, wherein the first gate layer is surrounded by the hollow body, wherein a first thickness of the base of the first gate dielectric layer adjacent to a bottom of the first gate layer is different from a second thickness of the hollow portion of the first gate dielectric layer adjacent to a sidewall of the first gate layer.
9 . The semiconductor structure of claim 8 , wherein the first thickness is greater than the second thickness.
10 . The semiconductor structure of claim 1 , wherein the channel layer contacts the first doped structure and the second doped structure.
11 . A semiconductor structure, comprising:
a vertical gate-all-around (GAA) structure, comprising:
a gate structure, comprising:
an inner gate;
an inner oxide, surrounding the inner gate;
a channel layer, surrounding the inner oxide;
an outer oxide, surrounding the channel layer; and
an outer gate, surrounding the outer oxide; and
a first doped structure and a second doped structure, disposed at two opposite sides of the gate structure respectively;
a first contact, in contact with a top surface of the inner gate and electrically connected to the inner gate; and
a second contact, in contact with a portion of the outer gate exposed through the second doped structure and electrically connected to the outer gate;
wherein the second doped structure is penetrated by the inner gate and the inner oxide, wherein an upper portion of the inner gate and an upper portion of the inner oxide are disposed above the second dope structure.
12 . The semiconductor structure of claim 11 , wherein the first doped structure is disposed at a lower end of the gate structure.
13 . The semiconductor structure of claim 11 , wherein the second doped structure is connected to an upper end of the channel layer and an upper end of the outer oxide.
14 . The semiconductor structure of claim 11 , wherein the inner oxide encircles the inner gate, the channel layer encircles the inner oxide, the outer oxide encircles the channel layer, and the outer gate encircles the outer oxide from a top-view perspective.
15 . The semiconductor structure of claim 11 , further comprising:
a third contact, electrically connected to the first doped structure and in contact with a portion of the first doped structure outside an overlapping area of the second doped structure and the gate structure; and
a fourth contact, in contact with the second doped structure and electrically connected to the second doped structure.
16 . The semiconductor structure of claim 15 , wherein the third contact and the fourth contact are electrically isolated from each other.
17 . The semiconductor structure of claim 11 , wherein the first contact and the second contact are electrically isolated from each other.
18 . The semiconductor structure of claim 11 , wherein the channel layer includes indium gallium zinc oxide (IGZO).
19 . The semiconductor structure of claim 11 , wherein the GAA structure further comprises:
a spacer structure, disposed between the outer gate and the first doped structure, and between the outer gate and the second doped structure.