Alignment mechanism, alignment method, film forming device and film forming method
The alignment mechanism of the present disclosure is configured to adjust positions of a substrate and a mask, the alignment mechanism being characterized by including a substrate suctioner configured to suction and hold the substrate; a mask supporter configured to support the mask; a temporary receiver configured to temporarily support at least one of the substrate to be suctioned by the substrate suctioner and the mask to be placed on the mask supporter, the temporary receiver being provided at the mask supporter; a horizontal coarse movement stage mechanism that carries the mask supporter and the temporary receiver and moves the mask supporter and the temporary receiver within the horizontal plane; and a vertical coarse movement stage mechanism that raises and lowers the horizontal coarse movement stage mechanism.
1 . An alignment method for adjusting positions of a substrate and a mask, the alignment method comprising:
supporting the substrate by a temporary receiver configured to (i) temporarily support the substrate before the substrate is suctioned by a substrate suctioner configured to suction and hold the substrate and to (ii) temporarily support the mask before the mask is supported by a mask supporter configured to support the mask;
adjusting a position of the substrate, while the substrate is being supported by the temporary receiver, with respect to the substrate suctioner by driving a horizontal coarse movement stage mechanism configured to move both of (i) the mask supporter, which is configured to support the mask after the mask has been supported by the temporary receiver, and (ii) the temporary receiver, which is configured to temporarily support the substrate before the substrate is suctioned by a substrate suctioner and to temporarily support the mask before the mask is supported by the mask supporter, in a horizontal plane; and
suctioning the substrate, which has been positionally adjusted by driving a vertical coarse movement stage mechanism that raises and lowers the horizontal coarse movement stage mechanism, with the substrate suctioner.
2 . The alignment method according to claim 1 , further comprising, before supporting the substrate by the temporary receiver,
supporting the mask with the temporary receiver;
adjusting a position of the mask supported by the temporary receiver by driving the horizontal coarse movement stage mechanism to move the mask supporter and the temporary receiver in the horizontal plane; and
placing the mask, which has been positionally adjusted, on the mask supporter.
3 . The alignment method according to claim 2 , further including, after the suctioning of the substrate,
readjusting the position of the mask placed on the mask supporter by driving the horizontal coarse movement stage mechanism to move the mask supporter and the temporary receiver again in the horizontal plane.
4 . The alignment method according to claim 2 , wherein
the temporary receiver can be at two positions, which are a receiving position in which the temporary receiver can receive the substrate or the mask, and a retracted position in which the temporary receiver can avoid interference with the substrate or the mask; and
the temporary receiver is moved from the receiving position to the retracted position after the mask has been placed on the mask supporter.
5 . The alignment method according to claim 1 , wherein
the temporary receiver can be at two positions, which are a receiving position in which the temporary receiver can receive the substrate or the mask, and a retracted position in which the temporary receiver can avoid interference with the substrate or the mask; and
the temporary receiver is moved from the receiving position to the retracted position after the substrate has been suctioned to the substrate suctioner.
6 . The alignment method according to claim 2 , wherein when the horizontal coarse movement stage mechanism is driven to move the mask supporter in the horizontal plane, the position of the mask on the mask supporter is fixed by a mask fixing mechanism.
7 . The alignment method according to claim 1 , further comprising:
detecting, using a position detector, positions of a substrate alignment mark formed on the substrate and a mask alignment mark formed on the mask, wherein
the position of the substrate supported by the temporary receiver is adjusted on the basis of the substrate alignment mark detected by the position detector.
8 . The alignment method according to claim 7 , further comprising:
moving the horizontal coarse movement stage mechanism, with the vertical coarse movement stage mechanism, to a position where the substrate alignment mark can be measured by the position detector.
9 . The alignment method according to claim 3 , wherein
the position of the substrate supported by the temporary receiver, the position of the mask supported by the temporary receiver, and/or the position of the mask placed on the mask supporter are adjusted on the basis of the substrate alignment mark and the mask alignment mark, respectively, which are detected by a position detector configured to detect positions of a substrate alignment mark formed on the substrate and a mask alignment mark formed on the mask, and
when the substrate alignment mark is not found in a detection field of view of the position detector step of adjusting when the position of the substrate is adjusted, the alignment method further includes:
driving the horizontal coarse movement stage mechanism to search for the substrate alignment mark; and
calculating coordinates of the searched substrate alignment mark and repeating the adjusting the position of the substrate, the suctioning the substrate, and the readjusting the position of the mask on the basis of the calculated coordinates so that both the mask alignment mark and the substrate alignment mark enter the field of view of the position detector.
10 . The alignment method according to claim 7 , further comprising:
finely adjusting a relative position between the substrate that has been positionally adjusted and the mask by a fine movement stage mechanism configured to adjust the position of the substrate suctioner.
11 . The alignment method according to claim 10 , wherein the fine movement stage mechanism is a magnetic levitation stage mechanism including a fixed plate section that is fixedly installed parallel to a suction surface of the substrate suctioner, a movable plate section that is relatively movable with respect to the fixed plate section, and a magnetic levitation unit configured to cause the movable plate section to magnetically levitate and move with respect to the fixed plate section.
12 . The alignment mechanism according to claim 11 , wherein the substrate suctioner is provided at the movable plate section.
13 . An alignment method for adjusting positions of a substrate and a mask, the alignment method comprising:
supporting the mask by a temporary receiver configured to (i) temporarily support the substrate before the substrate is suctioned by a substrate suctioner configured to suction and hold the substrate and to (ii) temporarily support the mask before the mask is supported by a mask supporter configured to support the mask;
adjusting a position of the mask, while the mask is being supported by the temporary receiver, by driving a horizontal coarse movement stage mechanism configured to move both of (i) the mask supporter, which is configured to support the mask after the mask has been supported by the temporary receiver, and (ii) the temporary receiver, which is configured to temporarily support the substrate before the substrate is suctioned by a substrate suctioner and to temporarily support the mask before the mask is supported by the mask supporter, in a horizontal plane; and
placing the mask, which has been positionally adjusted by driving the horizontal coarse movement stage mechanism to move the mask supporter and the temporary receiver in the horizontal plane, on the mask supporter.
14 . A film forming method for forming a film on a substrate with a film forming material through a mask, the film forming method comprising:
adjusting positions of the substrate and the mask by the alignment method according to claim 1 , and
forming a film on the substrate with the film forming material atomized by a film forming source through the mask.