Apparatus and process for oxidant formation
An apparatus and process for oxidant formation can be configured to facilitate improved mixing of for formation of an oxidant. Embodiments can be configured so conduits having a relatively large aspect ratio (e.g., 1.5 to 5 or 1.5 to over 5) can be utilized for improved gas mixing even in situations in which the carrier gas is at a relatively low pressure. Embodiments can also facilitate low nitrogen oxide formation combustion. Some embodiments can additionally provide improved carbon capture.
1 . An apparatus for oxidant formation comprising:
a mixing device positionable and configured to receive a carrier gas from at least one source of gas and/or flue gas recycled from a combustion device, the mixing device also positionable and configured to receive oxygen from a source of oxygen for injecting the oxygen into the carrier gas to form an oxidant for feeding to the combustion device;
the mixing device comprising a plurality of injection devices positioned within a conduit of the mixing device, the injection devices positionable downstream of at least one flow conditioning device such that the carrier gas is passable through the at least one flow conditioning device before passing along the injection devices; and
the injection devices are positioned and configured to inject the oxygen into the carrier gas to form the oxidant;
wherein the injection devices comprise a central region of injection devices, a first outer region of injection devices positioned between the central region of the injection devices and a first sidewall of the conduit and a second outer region of injection devices positioned between the central region of the injection devices and a second sidewall of the conduit;
wherein the central region of injection devices are positioned between the first outer region of injection devices and the second outer region of injection devices;
each of the injection devices of the central region of injection devices is configured to inject a mass flow rate of oxygen into the carrier gas via a central region injection rate,
each of the injection devices of the first outer region of injection devices is configured to inject a mass flow rate of oxygen into the carrier gas via an outer region injection rate,
each of the injection devices of the second outer region of injection devices is configured to inject a mass flow rate of oxygen into the carrier gas via the outer region injection rate, and
the central region injection rate being at least 10% greater than the outer region injection rate.
2 . The apparatus of claim 1 , wherein a mass flow rate of oxygen injectable into the carrier gas via the central region of injection devices is between 30% and 60% of an overall mass flow rate of oxygen injectable into the carrier gas, a mass flow rate of oxygen injectable into the carrier gas by the first outer region of injection devices is between 20% and 40% of the overall mass flow rate of oxygen injectable into the carrier gas, and a mass flow rate of oxygen injectable into the carrier gas by the second outer region of injection devices is between 20% and 40% of the overall mass flow rate of oxygen injectable into the carrier gas.
3 . The apparatus of claim 2 , wherein the mass flow rate of oxygen injectable into the carrier gas by the second outer region of injection devices is equal to the mass flow rate of oxygen injectable into the carrier gas by the first outer region of injection devices.
4 . The apparatus of claim 1 , wherein the conduit has a duct aspect ratio of between 3.5 and 5.
5 . The apparatus of claim 1 , wherein the conduit has a duct aspect ratio that is greater than 3.
6 . The apparatus of claim 1 , comprising the at least one flow conditioning device.
7 . The apparatus of claim 6 , wherein the at least one flow conditioning device includes a perforated plate positioned within the conduit upstream of the injection devices, the perforated plate having a thickness and a plurality of holes, each of the holes having a hole diameter;
wherein a ratio of the thickness of the perforated plate to the hole diameter is between 0.3 and 1.
8 . The apparatus of claim 7 , wherein the perforated plate is positioned downstream of a carrier gas flow device or a flow disturbance component at a distance between a value that is equal to half of a height of the conduit and a value that is triple the height of the conduit.
9 . The apparatus of claim 1 , wherein the plurality of injection devices are in a staggered configuration within the conduit.
10 . The apparatus of claim 1 , wherein the plurality of injection devices are arranged in a plurality of rows.
11 . The apparatus of claim 1 , wherein the plurality of injection devices comprise a plurality of oxygen injection apertures along a periphery or circumference of the injection devices.