Chiral multidentate ligand, and application thereof in asymmetric hydrogenation
Disclosed are a chiral multidentate ligand (I), a preparation, and an application thereof. In this method, compound (M1) is subjected to condensation with compound (M2) followed by amine deprotection in the presence of a deprotection reagent to obtain compound (M4). Compound (1) is subjected to deprotonation by butyl lithium and phosphorization followed by dimethylamino group substitution to produce compound (3). The compound (3) and the compound (M4) are reacted in the presence of triethylamine to produce chiral multidentate ligands.
1 . A chiral multidentate ligand selected from the group consisting of L1-L10, shown as:
2 . A method of preparing the chiral multidentate ligand of claim 1 , comprising:
(S1) subjecting compound (M1) containing an amino-protecting group and compound (M2) to undergo a condensation reaction to obtain compound (M3); and subjecting the compound (M3) to amine deprotection in the presence of a deprotection reagent to obtain compound (M4); wherein when the amino-protecting group is a t-butyloxy carbonyl (Boc) group, the deprotection reagent is selected from the group consisting of trifluoroacetic acid, methanesulfonic acid, hydrochloric acid, sulfuric acid, and phosphoric acid; and when the amino-protecting group is a benzyloxycarbonyl (Cbz) group, the amino-protecting group is removed under the catalysis of Pd/C catalysts or Pd (OH) 2 /C catalyst in a hydrogen atmosphere;
(S2) subjecting compound (1) to deprotonation by butyl lithium and phosphorization to produce compound (2); and substituting a dimethylamino group in the compound (2) with an acetoxy group to obtain compound (3); and
(S3) reacting the compound ( 3 ) with the compound (M4) in the presence of triethylamine to produce chiral multidentate ligands L1-L9, wherein an enantiomer L10 of a chiral multidentate ligand L3 is synthesized from corresponding chiral raw materials through a method of preparing the chiral multidentate ligand L3, as shown in the following reaction scheme:
3 . The method of claim 2 , wherein the deprotection reagent is trifluoroacetic acid or hydrochloric acid.