System for analyzing a sample

1 . A method for analyzing a sample using a system, wherein the sample is a solid sample comprising a first chemical element and a second chemical element, wherein the system comprises a plasma spectrometer and an analytical device, wherein the plasma spectrometer is configured to ionize the sample using a plasma, such that ions and/or photons are generated, and to analyze the generated ions and/or photons, wherein the analytical device is configured to determine a concentration of the first chemical element, wherein the sample is provided to the plasma spectrometer in the form of an aerosol, the method comprising:

determining a concentration of the first chemical element using the analytical device;

determining a sensitivity of the plasma spectrometer to the first chemical element and a sensitivity of the plasma spectrometer to the second chemical element;

measuring a signal intensity of the first chemical element using the plasma spectrometer;

measuring a signal intensity of the second chemical element using the plasma spectrometer; and

calculating a concentration of the second chemical element based on the determined concentration of the first chemical element, the sensitivities of the plasma spectrometer to the first chemical element and to the second chemical element, and the signal intensities of the first chemical element and the second chemical element.

2 . A method according to claim 1 , wherein the sample is at least one of a powder or dust, a rock sample, a soil sample, a drug sample, and a food sample.

3 . A method according to claim 1 , wherein a surface of the sample is mechanically machined such that the sample is partially brought into the form of an aerosol.

4 . A method according to claim 1 , wherein the sample is provided in the form of a solid cylinder.

5 . A method according to claim 4 , wherein the solid cylinder is obtained by surface drilling.

6 . A method according to claim 1 , wherein the sample is brought into the form of an aerosol by exposure to mechanical machining, light, electric power and/or sound waves.

7 . A system for analyzing a sample, the system comprising:

a plasma spectrometer; and

an analytical device,

wherein the sample is a solid sample comprising a first chemical element and a second chemical element, wherein the plasma spectrometer is configured to ionize the sample using a plasma, such that ions and/or photons are generated, and to analyze the generated ions and/or photons, wherein the analytical device is configured to determine a concentration of the first chemical element, wherein the sample is provided to the plasma spectrometer in the form of an aerosol, and

wherein the system is configured to execute the method according to claim 1 .

8 . The system according to claim 7 , wherein the plasma spectrometer and the analytical device are arranged such that a same area or portion of the sample is analyzed by either device.

9 . The system according to claim 7 , further comprising a sample unit configured to move the sample along a direction, and

wherein the analytical device and the plasma spectrometer are arranged along the direction such that the same area or portion of the sample is continuously analyzed by either device.

10 . The system according to claim 7 , further comprising a cleaning unit configured to clean and/or dry the sample prior to providing the sample to the analytical device and/or the plasma spectrometer.

11 . The system according to claim 7 , wherein the analytical device is configured to determine the concentration of the first chemical element with a high precision of less than 3% relative standard deviation.

12 . The system according to claim 7 , wherein the plasma spectrometer is configured to determine the concentration of the second element in a concentration range which is not available or only partially available via the analytical device.

13 . The system according to claim 7 , wherein the plasma spectrometer is configured to aspirate the sample in the form of an aerosol using the plasma.

14 . The system according to claim 7 , wherein the plasma spectrometer is a microwave inductively coupled atmospheric plasma mass spectrometer, a microwave inductively coupled atmospheric plasma optical emission spectrometer, a radio-frequency inductively coupled mass spectrometer, a radio-frequency inductively coupled optical spectrometer, a glow discharge mass spectrometer, or a glow discharge optical spectrometer.

15 . The system according to claim 7 , wherein the analytical device is an X-ray fluorescence spectrometer, a laser induced breakdown spectrometer, or an X-ray diffractometer.

16 . The method of according to claim 1 , wherein calculating the concentration of the second chemical element includes:

determining a first ratio of the signal intensities to the first chemical element and the second chemical element;

determining a second ratio of the signal sensitivities to the first chemical element and the second chemical element;

multiplying the concentration of the first chemical element by the second ratio to yield a result; and

dividing the result by the first ratio to yield the concentration of the second chemical element.

17 . The method of according to claim 1 , wherein calculating the concentration of the second chemical element includes:

determining a first ratio of the signal intensities of the first chemical element and the second chemical element;

determining a second ratio of the signal sensitivities to the first chemical element and the second chemical element;

dividing the concentration of the first chemical element by the signal intensity of the first chemical element to yield a result; and

multiplying the result by the signal intensity of the second chemical element and by the second ratio to yield the concentration of the second chemical element.

18 . A method for analyzing a sample using a system, wherein the sample is a solid sample comprising a first chemical element and a second chemical element, wherein the system comprises a plasma spectrometer and an analytical device, wherein the plasma spectrometer is configured to ionize the sample using a plasma, such that ions and/or photons are generated, and to analyze the generated ions and/or photons, wherein the analytical device is configured to determine a concentration of the first chemical element, wherein the sample is provided to the plasma spectrometer in the form of an aerosol, the method comprising:

determining a concentration of the first chemical element using the analytical device;

determining a sensitivity of the plasma spectrometer to the first chemical element and a sensitivity of the plasma spectrometer to the second chemical element;

measuring a signal intensity of the first chemical element using the plasma spectrometer;

measuring a signal intensity of the second chemical element using the plasma spectrometer; and

calculating a concentration of the second chemical element based on the determined concentration of the first chemical element, the sensitivities of the plasma spectrometer to the first chemical element and to the second chemical element, and the signal intensities of the first chemical element and the second chemical element,

wherein the analytical device is an X-ray fluorescence spectrometer or an X-ray diffractometer.