Method and apparatus for inspection
An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.
1 . An electron beam apparatus comprising:
a stage configured to support an object comprising a plurality of dies or fields, each field or die having a boundary to enable separation of the object into pieces;
a plurality of electron beam columns, each electron beam column configured to provide concurrently a plurality of electron beams to the object when supported on the stage and to detect scattered or secondary electrons from the object, each electron beam column arranged to inspect a different region of the object associated with the electron beam column and each electron beam having its own respective concurrent field of view at the object; and
an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns in a direction closer to or further away from the object.
2 . The apparatus of claim 1 , wherein the electron beam columns are arranged in a two-dimensional array.
3 . The apparatus of claim 1 , wherein each column comprises an E×B deflector configured to deflect electrons from the object to a detector of the respective column.
4 . The apparatus of claim 1 , wherein a non-transitory computer program product comprising machine-readable instructions configured to cause at least one of the electron beam columns to inspect a portion of the object at a same time as another at least one of the electron beam columns is caused to inspect another portion of the object.
5 . The apparatus of claim 1 , further comprising a non-transitory computer program product comprising machine-readable instructions configured to cause relative movement between the object and the electron beam columns for inspection or measurement such that, during the inspection or measurement, a span in all directions of a combined field of view of the plurality of electron beams of a respective electron beam column is less than the span in all directions of the field or die being inspected by those electron beams of the respective electron beam column.
6 . The apparatus of claim 1 , wherein the electron beams of each column are arranged in a two-dimensional array.
7 . An electron beam apparatus comprising:
a stage configured to support an object comprising a plurality of dies or fields, each field or die having a boundary to enable separation of the object into pieces;
a plurality of electron beam columns, each electron beam column configured to provide concurrently a plurality of electron beams to the object when supported on the stage, each electron beam column arranged to inspect a different region of the object associated with the electron beam column and each electron beam having its own respective concurrent field of view at the object; and
an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns in a direction closer to or further away from the object.
8 . The apparatus of claim 7 , wherein the electron beam columns are arranged in a two-dimensional array.
9 . The apparatus of claim 7 , wherein each column comprises an E×B deflector configured to deflect electrons from the object to a detector of the respective column.
10 . The apparatus of claim 7 , wherein a non-transitory computer program product comprising machine-readable instructions configured to cause at least one of the electron beam columns to inspect a portion of the object at a same time as another at least one of the electron beam columns is caused to inspect another portion of the object.
11 . The apparatus of claim 7 , further comprising a non-transitory computer program product comprising machine-readable instructions configured to cause relative movement between the object and the electron beam columns for inspection or measurement such that, during the inspection or measurement, a span in all directions of a combined field of view of the plurality of electron beams of a respective electron beam column is less than the span in all directions of the field or die being inspected by those electron beams of the respective electron beam column.
12 . The apparatus of claim 7 , wherein the number of optical columns corresponds to at least the number of fields or dies on the object.
13 . The apparatus of claim 7 , wherein the electron beams of each column are arranged in a two-dimensional array.
14 . The apparatus of claim 7 , further comprising a plurality of detectors configured to detect scattered or secondary electrons from the object, each detector associated with a respective electron beam column.
15 . An electron beam apparatus comprising:
a stage configured to support an object comprising a plurality of dies or fields, each field or die having a boundary to enable separation of the object into pieces;
a stage configured to support the object;
a plurality of electron beam optics, each electron beam optic configured to separately direct a plurality of electron beams concurrently to the object when supported on the stage, each electron beam optic arranged to inspect a different region of the object associated with the electron beam optic and each electron beam having its own respective concurrent field of view at the object; and
an actuator system configured to move one or more of the electron beam optics relative to another one or more of the electron beam optics in a direction closer to or further away from the object.
16 . The apparatus of claim 15 , wherein each electron beam optic has an associated detector to detect scattered or secondary electrons from the object and the actuator system is configured to move together the associated electron beam optic detector.
17 . The apparatus of claim 15 , wherein each column comprises an E×B deflector configured to deflect electrons from the object to a detector of the respective column.
18 . The apparatus of claim 15 , wherein a non-transitory computer program product comprising machine-readable instructions configured to cause at least one of the electron beam columns to inspect a portion of the object at a same time as another at least one of the electron beam columns is caused to inspect another portion of the object.
19 . The apparatus of claim 15 , further comprising a non-transitory computer program product comprising machine-readable instructions configured to cause relative movement between the object and the electron beam columns for inspection or measurement such that, during the inspection or measurement, a span in all directions of a combined field of view of the plurality of electron beams of a respective electron beam column is less than the span in all directions of the field or die being inspected by those electron beams of the respective electron beam column.
20 . The apparatus of claim 15 , wherein the electron beams of each column are arranged in a two-dimensional array.