IP Library › Granted Patent US 12,500,208
Granted Patent B2
US 12,500,208 · App. 18/348,351 · Granted Dec 16, 2025

Integrated fan-out package having stress release structure

Inventors: Ming-Chih Yew (Hsinchu, TW); Po-Chen Lai (Hsinchu County, TW); Shu-Shen Yeh (Taoyuan, TW); Po-Yao Lin (Hsinchu County, TW); Shin-Puu Jeng (Hsinchu, TW)
Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
H01L25/0652H01L21/4853H01L21/4857H01L21/563H01L21/565H01L21/568H01L21/6835H01L23/3128H01L23/3135H01L23/5383H01L23/5386H01L24/08H01L25/50H01L2221/68372H01L2224/08145H01L2924/18161
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Quick Facts
Patent No.
US 12,500,208
App. No.
18/348,351
Granted
Dec 16, 2025
Kind
B2
Abstract

A semiconductor package includes a first die, a second die and a buffer layer. The first die and the second die are stacked on the first die. The buffer layer is disposed on a first sidewall of the second die, wherein a second sidewall opposite to the first sidewall of the second die is flush with a third sidewall of the first die.

Claims (30)

1 . A semiconductor package, comprising:

a first die and a second die stacked on the first die; and

a buffer layer, extending along a first sidewall of the second die, wherein a second sidewall opposite to the first sidewall of the second die is flush with a third sidewall of the first die, wherein the second sidewall of the second die is exposed by the buffer layer, and a sidewall of the buffer layer is flush with a fourth sidewall opposite to the third sidewall of the first die.

2 . The semiconductor package according to claim 1 further comprising a third die between the first die and the second die, wherein the buffer layer is further extending along a sidewall of the third die.

3 . The semiconductor package according to claim 2 , wherein a width of a portion of the buffer layer extending along the second die is different from a width of a portion of the buffer layer extending along the third die.

4 . A semiconductor package, comprising:

a redistribution structure;

a first package bonded to the redistribution structure and comprising a first die and a second die;

a second package bonded to the redistribution structure;

a first buffer layer, disposed on a sidewall of the second die;

a second buffer layer, disposed on a sidewall of the second package, wherein the first buffer layer and the second buffer layer are disposed between the first package and the second package; and

an underfill between the first package and the redistribution structure and between the first buffer layer and the second package, wherein the underfill is in direct contact with a sidewall of the first die.

5 . The semiconductor package according to claim 4 further comprising an encapsulant encapsulating the first package and the second package, wherein a sidewall of the encapsulant is flush with a sidewall of the redistribution structure.

6 . The semiconductor package according to claim 4 , wherein the first buffer layer surrounds the first package.

7 . The semiconductor package according to claim 4 , wherein the first buffer layer is in direct contact with the second die.

8 . The semiconductor package according to claim 4 , wherein the second package comprises a third die, and the second buffer layer is in direct contact with a sidewall of the third die.

9 . The semiconductor package according to claim 4 , wherein a sidewall of the first buffer layer is flush with a sidewall of the first die.

10 . The semiconductor package according to claim 4 , wherein the redistribution structure is a continuous structure disposed continuously under the first package and the second package.

11 . A semiconductor package, comprising:

a first die and a second die stacked on the first die; and

a buffer layer, extending along a first sidewall of the second die, wherein a second sidewall opposite to the first sidewall of the second die is flush with a third sidewall of the first die, and an outer sidewall of the buffer layer extending along the second die is flush with a fourth sidewall opposite to the third sidewall of the first die.

12 . The semiconductor package according to claim 11 , wherein an inner sidewall of the buffer layer is in direct contact with the first sidewall of the second die.

13 . The semiconductor package according to claim 11 , further comprising an encapsulant encapsulating the first die and the second die, wherein the outer sidewall of the buffer layer is in direct contact with the encapsulant.

14 . The semiconductor package according to claim 11 further comprising a third die between the first die and the second die, wherein the buffer layer is further disposed extending along a fifth sidewall of the third die.

15 . The semiconductor package according to claim 14 , wherein an outer sidewall of the buffer layer extending along the third die is flush with the fourth sidewall of the first die.

16 . The semiconductor package according to claim 14 , wherein a sixth sidewall opposite to the fifth sidewall of the third die is flush with the third sidewall of the first die.

17 . The semiconductor package according to claim 14 , wherein a width of the buffer layer extending along the second die is different from a width of the buffer layer extending along the third die.

18 . The semiconductor package according to claim 1 , wherein the first sidewall is physically connected to a first surface and a second surface of the second die, and the buffer layer continuously extends from the first surface to the second surface of the second die.

19 . The semiconductor package according to claim 1 further comprising an encapsulant encapsulating the first die and the second die, wherein the buffer layer is disposed between the second die and the encapsulant.

20 . The semiconductor package according to claim 1 , wherein the second die comprises a substrate, and a Young's modulus of the buffer layer is smaller than a Young's modulus of the substrate.

Continuity (2)
Continuation 17153739 · Jan 20, 2021
Related Publication 20230352447A1 · Nov 2, 2023
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