IP Library › Granted Patent US 12,500,263
Granted Patent B2
US 12,500,263 · App. 17/937,458 · Granted Dec 16, 2025

Method for producing oxyhalide

Inventors: Yoshiaki Tanaka (Kyoto, JP); Tetsuya Asano (Nara, JP); Akihiro Sakai (Nara, JP)
Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
H01M10/0562C01G35/006H01M10/0525C01P2002/50C01P2006/40H01M2300/0071H01M2300/008
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Quick Facts
Patent No.
US 12,500,263
App. No.
17/937,458
Granted
Dec 16, 2025
Kind
B2
Abstract

A producing method according to the present disclosure includes heat-treating a material mixture at higher than or equal to 150° C. and lower than or equal to 450° C., wherein the material mixture contains MX 5 and at least one selected from the group consisting of Li 2 O 2 , Li 2 O, and LiOH, M is at least one selected from the group consisting of Ta and Nb, and X is at least one selected from the group consisting of Cl and Br.

Claims (34)

1 . A method for producing an oxyhalide comprising:

heat-treating a dry powder material mixture at higher than or equal to 150° C. and lower than or equal to 450° C. to obtain the oxyhalide, wherein

the dry powder material mixture that is heat-treated contains dry powdery raw materials of MX 5 and at least one selected from the group consisting of Li 2 O 2 , Li 2 O, and LiOH,

M is at least one selected from the group consisting of Ta and Nb, and

X is at least one selected from the group consisting of Cl and Br.

2 . The method for producing an oxyhalide according to claim 1 ,

wherein X contains Cl.

3 . The method for producing an oxyhalide according to claim 1 ,

wherein the dry powder material mixture is heat-treated at higher than or equal to 200° C. in the heat-treating.

4 . The method for producing an oxyhalide according to claim 1 ,

wherein the dry powder material mixture is heat-treated at lower than or equal to 400° C. in the heat-treating.

5 . The method for producing an oxyhalide according to claim 1 ,

wherein the dry powder material mixture is fired for greater than or equal to 30 minutes and less than or equal to 12 hours in the heat-treating.

6 . The method for producing an oxyhalide according to claim 1 ,

wherein the dry powder material mixture further contains NbOCl 3 .

7 . The method for producing an oxyhalide according to claim 1 ,

wherein the dry powder material mixture further contains at least one selected from the group consisting of LiF and MeF 5 , and

Me is at least one selected from the group consisting of Ta and Nb.

8 . A method for producing an oxyhalide comprising:

heat-treating a material mixture at higher than or equal to 150° C. and lower than or equal to 450° C.,

wherein the material mixture contains NbOCl 3 , MX 5 and at least one selected from the group consisting of Li 2 O 2 , Li 2 O, and LiOH,

M is at least one selected from the group consisting of Ta and Nb, and

X is at least one selected from the group consisting of Cl and Br.

9 . The method for producing an oxyhalide according to claim 8 ,

wherein X contains Cl.

10 . The method for producing an oxyhalide according to claim 8 ,

wherein the material mixture is heat-treated at higher than or equal to 200° C. in the heat-treating.

11 . The method for producing an oxyhalide according to claim 8 ,

wherein the material mixture is heat-treated at lower than or equal to 400° C. in the heat-treating.

12 . The method for producing an oxyhalide according to claim 8 ,

wherein the material mixture is fired for greater than or equal to 30 minutes and less than or equal to 12 hours in the heat-treating.

13 . The method for producing an oxyhalide according to claim 8 ,

wherein the material mixture further contains at least one selected from the group consisting of LiF and MeF 5 , and

Me is at least one selected from the group consisting of Ta and Nb.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 27, 2022
From: TANAKA, YOSHIAKI; ASANO, TETSUYA; SAKAI, AKIHIRO
To: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Reel/Frame 062205/0617 →
Priority Claims (1)
JP 2020-080651 · Apr 30, 2020 · national
Continuity (2)
Continuation PCTJP2021016247 · Apr 22, 2021
Related Publication 20230041243A1 · Feb 9, 2023
References Cited (19)
US 4108970A · Ballman · 1978 [cited by examiner]
US 11581569B2 · Yushin · 2023 [cited by examiner]
US 11821080B2 · Liu · 2023 [cited by examiner]
US 12068453B2 · Tanaka · 2024 [cited by examiner]
US 12080846B2 · Tanaka · 2024 [cited by examiner]
US 20190088995A1 · Asano et al. · 2019 [cited by applicant]
US 20210249683A1 · Tanaka et al. · 2021 [cited by applicant]
US 20220209290A1 · Takeuchi et al. · 2022 [cited by applicant]
US 20230055771A1 · Takeuchi et al. · 2023 [cited by applicant]
US 20230307704A1 · Tanaka et al. · 2023 [cited by applicant]
WO 2018025582 · 2018 [cited by applicant]
WO 2020137155A1 · 2020 [cited by applicant]
WO 2021075243A1 · 2021 [cited by applicant]
WO 2021220577A1 · 2021 [cited by applicant]
WO 2022091567A1 · 2022 [cited by applicant]
The EPC Office Action dated Nov. 24, 2023 for the related European Patent Application No. 21797902.0. [cited by applicant]
International Search Report of PCT application No. PCT/JP2021/016247 dated Jul. 13, 2021. [cited by applicant]
English Translation of Chinese Search Report dated Oct. 9, 2023 for the related Chinese Patent Application No. 202180027982.1. [cited by applicant]
A.M. Srivastava et al., “Synthesis and Luminescence Properties Of Cs2NbOF5 AND Cs2NbOCl5 With Isolated [NbOX5]-2 (X = F-, Ci-) Octahedra”, Mat. Res. Bull., vol. 26, Issue 6, Dec. 31, 1991 (Dec. 31, 1991), pp. 443-448. [cited by applicant]