Image sensor and method of fabricating the same
An image sensor includes; a semiconductor substrate including a first surface and an opposing second surface, a pixel isolation structure in the semiconductor substrate and defining a pixel section, a photoelectric conversion region in the pixel section, a first device isolation layer on the pixel section and defining an active area on the first surface of the semiconductor substrate, a floating diffusion region in the active area and spaced apart from the photoelectric conversion region, a transfer gate electrode on the active area between the photoelectric conversion region and the floating diffusion region, and a second device isolation layer in the active area between the transfer gate electrode and the floating diffusion region.
1 . An image sensor, comprising:
a substrate including a first surface and a second surface opposing the first surface;
a pixel isolation structure comprising:
a separation pattern directly in contact with the second surface of the substrate, and
a capping pattern between the separation pattern and the first surface of the substrate;
a first photoelectric conversion region in the substrate;
a second photoelectric conversion region in the substrate;
a floating diffusion region connected to the first and second photoelectric conversion regions;
a first transfer gate electrode comprising a first portion on the first surface of the substrate and a second portion extending into the substrate;
a second transfer gate electrode comprising a first portion on the first surface of the substrate and a second portion extending into the substrate; and
a first device isolation layer between the first transfer gate electrode and the floating diffusion region,
wherein the first device isolation layer is vertically overlapping with the first portion of the first transfer gate electrode in a plan view,
wherein the pixel isolation structure is disposed between the first photoelectric conversion region and the second photoelectric conversion region,
wherein the first device isolation layer has a first width in a first direction parallel to the first surface of the substrate in a vertical view and the capping pattern has a second width in the first direction in the vertical view,
wherein the second width is greater than the first width, and
wherein the first transfer gate electrode is vertically overlapping with the first photoelectric conversion region in the plan view and the second transfer gate electrode is vertically overlapping with the second photoelectric conversion region in the plan view.
2 . The image sensor of claim 1 , wherein the second portion of the first transfer gate electrode has a third height in a second direction perpendicular to the first direction in the vertical view, and
wherein the third height is greater than a height of the first device isolation layer in the second direction.
3 . The image sensor of claim 2 , wherein the first device isolation layer surrounds at least a portion of a lateral surface of the second portion of the first transfer gate electrode in the plan view.
4 . The image sensor of claim 3 , wherein the floating diffusion region has a fourth height in the second direction, and
wherein the fourth height is smaller than the height of the first device isolation layer.
5 . The image sensor of claim 4 , wherein the first device isolation layer is directly in contact with the first portion of the first transfer gate electrode.
6 . The image sensor of claim 1 , wherein the first device isolation layer entirely surrounds at least a portion of a lateral surface of the second portion of the first transfer gate electrode in the plan view.
7 . The image sensor of claim 1 , wherein the second portion of the first transfer gate electrode has a third width in the first direction, and
wherein the third width is greater than the first width.
8 . The image sensor of claim 1 , wherein the first device isolation layer includes a dielectric material.
9 . The image sensor of claim 1 , wherein the capping pattern is directly in contact with the first surface of the substrate.
10 . The image sensor of claim 9 , wherein the pixel isolation structure is directly in contact with the second surface of the substrate.
11 . The image sensor of claim 1 , comprising a single microlens that is disposed on the first and second photoelectric conversion regions.
12 . An image sensor, comprising:
a substrate including a first surface and a second surface opposing the first surface;
a pixel isolation structure comprising:
a separation pattern directly in contact with the second surface of the substrate, and
a capping pattern between the separation pattern and the first surface of the substrate;
a first photoelectric conversion region in the substrate;
a second photoelectric conversion region in the substrate;
a floating diffusion region connected to the first and second photoelectric conversion regions;
a first transfer gate electrode comprising a first portion on the first surface of the substrate and a second portion extending into the substrate;
a second transfer gate electrode comprising a first portion on the first surface of the substrate and a second portion extending into the substrate;
a gate dielectric layer on the second portion of the first transfer gate electrode; and
a first device isolation layer between the first transfer gate electrode and the floating diffusion region,
wherein the first device isolation layer is directly in contact with the gate dielectric layer,
wherein the pixel isolation structure is disposed between the first photoelectric conversion region and the second photoelectric conversion region,
wherein the first device isolation layer has a first width in a first direction parallel to the first surface of the substrate in a vertical view and the capping pattern has a second width in the first direction in the vertical view,
wherein the second width is greater than the first width, and
wherein the first transfer gate electrode is vertically overlapping with the first photoelectric conversion region in a plan view and the second transfer gate electrode is vertically overlapping with the second photoelectric conversion region in the plan view.
13 . The image sensor of claim 12 , wherein the first device isolation layer penetrates the substrate.
14 . The image sensor of claim 12 , wherein the second portion of the first transfer gate electrode has a third height in a second direction perpendicular to the first direction in the vertical view, and
wherein the third height is greater than a height of the first device isolation layer in the second direction.
15 . The image sensor of claim 14 , wherein the second portion of the first transfer gate electrode has a third width in the first direction, and
wherein the third width is greater than the first width.
16 . The image sensor of claim 14 , wherein the floating diffusion region has a fourth height in the second direction, and
wherein the fourth height is smaller than the height of the first device isolation layer in the second direction.
17 . The image sensor of claim 15 , wherein the first device isolation layer surrounds at least a portion of a lateral surface of the second portion of the first transfer gate electrode.
18 . An image sensor, comprising:
a substrate including a first surface and a second surface opposing the first surface;
a pixel isolation structure comprising:
a separation pattern directly in contact with the second surface of the substrate, and
a capping pattern between the separation pattern and the first surface of the substrate;
a first photoelectric conversion region in the substrate;
a second photoelectric conversion region in the substrate;
a floating diffusion region connected to the first and second photoelectric conversion regions;
a first transfer gate electrode comprising a first portion on the first surface of the substrate and a second portion extending into the substrate;
a second transfer gate electrode comprising a first portion on the first surface of the substrate and a second portion extending into the substrate; and
a first device isolation layer between the first transfer gate electrode and the floating diffusion region,
wherein the first device isolation layer is vertically overlapping with the first portion of the first transfer gate electrode in a plan view,
wherein the pixel isolation structure is disposed between the first photoelectric conversion region and the second photoelectric conversion region,
wherein the first device isolation layer has a first width in a first direction parallel to the first surface of the substrate in a vertical view and the capping pattern has a second width in the first direction in the vertical view,
wherein the second width is greater than the first width,
wherein the first transfer gate electrode is vertically overlapping with the first photoelectric conversion region in the plan view and the second transfer gate electrode is vertically overlapping with the second photoelectric conversion region in the plan view,
wherein the second portion of the first transfer gate electrode has a first height in a second direction perpendicular to the first direction in the vertical view,
wherein the first device isolation layer has a second height in the second direction, and
wherein the first height is greater than the second height.
19 . The image sensor of claim 18 , wherein the first portion of the first transfer gate electrode covers at least a portion of an upper surface of the first device isolation layer.
20 . The image sensor of claim 18 , wherein a lower surface of the second portion of the first transfer gate electrode is at a level lower than a level of a lower surface of the first device isolation layer.