IP Library › Granted Patent US 12,520,730
Granted Patent B2
US 12,520,730 · App. 18/042,249 · Granted Jan 6, 2026

Sot-driven field-free switching MRAM and array thereof

Inventors: Guozhong Xing (Beijing, CN); Huai Lin (Beijing, CN); Yu Liu (Beijing, CN); Peiwen Zhang (Beijing, CN); Changqing Xie (Beijing, CN); Ling Li (Beijing, CN); Ming Liu (Beijing, CN)
Assignee: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
H10N50/20G06F7/501G11C11/161H10B61/10H10N50/85G11C11/1673G11C11/1675
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,520,730
App. No.
18/042,249
Granted
Jan 6, 2026
Kind
B2
Abstract

An SOT-driven field-free switching MRAM and an array thereof. From top to bottom, the SOT-MRAM sequentially includes: a selector ( 1 ) configured to turn on or turn off the SOT-MRAM under an action of an external voltage; a magnetic tunnel junction ( 2 ), including a ferromagnetic reference layer, a tunneling layer and a ferromagnetic free layer arranged sequentially from top to bottom; and a spin-orbit coupling layer ( 3 ) made of one or more selected from heavy metal, doped heavy metal, heavy metal alloy, metal oxide, dual heavy metal layers, semiconductor material, two-dimensional semi-metal material and anti-ferromagnetic material. The spin-orbit coupling layer is configured to generate an in-plane effective field in the ferromagnetic free layer by using the interlayer exchange coupling effect and generate spin-orbit torques by using the spin Hall effect, so as to perform a deterministic data storage in the magnetic tunnel junction ( 2 ).

Claims (14)

1 . An SOT-driven field-free switching MRAM, wherein from top to bottom, the SOT-MRAM sequentially comprises:

a selector configured to turn on or turn off the SOT-MRAM under an action of an external voltage;

a magnetic tunnel junction, comprising a ferromagnetic reference layer, a tunneling layer and a ferromagnetic free layer arranged sequentially from top to bottom; and

a spin-orbit coupling layer made of one or more selected from heavy metal, doped heavy metal, heavy metal alloy, metal oxide, dual heavy metal layers, semiconductor material, two-dimensional semi-metal material and anti-ferromagnetic material, wherein the spin-orbit coupling layer is configured to generate an in-plane effective field in the ferromagnetic free layer by using the interlayer exchange coupling effect and generate spin-orbit torques by using the spin Hall effect, so as to perform a deterministic data storage in the magnetic tunnel junction,

wherein the selector is a metal-semiconductor-metal structure made of a two-dimensional van der Waals material, and the external voltage is an external forward voltage or an external reverse voltage.

2 . The SOT-driven field-free switching MRAM according to claim 1 , wherein a magnetization direction of a magnetic material in the ferromagnetic free layer is perpendicular to a plane where the ferromagnetic material is located.

3 . The SOT-driven field-free switching MRAM according to claim 1 , wherein the two-dimensional van der Waals material is WS 2 or WSe 2 .

4 . The SOT-driven field-free switching MRAM according to claim 1 , wherein the ferromagnetic reference layer and the ferromagnetic free layer are made of CoFeB, Co or NiFe.

5 . The SOT-driven field-free switching MRAM according to claim 1 , wherein the tunneling layer is made of MgO.

6 . The SOT-driven field-free switching MRAM according to claim 1 , wherein in the spin-orbit coupling layer, the heavy metal is made of one or more of Pt, Pd, Hf, β-Ta and β-W; the heavy metal alloy is made of one or more of Pt 80 Al 20 , Pt 85 Hf 15 and Pt 75 Au 25 ; the metal oxide comprises one or more of W 88 O 12 and PtO 2 ; the anti-ferromagnetic material is made of one or more of PtMn, FeMn, PdMn and IrMn; the semiconductor material is (Ga, Mn) As; and the two-dimensional semi-metal material is made of one or more of WTe 2 , MoTe 2 and PtTe 2 .

7 . The SOT-driven field-free switching MRAM according to claim 1 , wherein the SOT-MRAM further comprises:

a bit line located above the selector, wherein the bit line is configured to output the data stored in the SOT-MRAM.

8 . An array formed by the SOT-driven field-free switching MRAMs according to claim 1 , wherein the array is an array structure of M rows, N columns and K layers comprising M×N×K SOT-MRAMs, and spin-orbit coupling layers of each row of SOT-MRAMs are connected to a corresponding common word line, where M, N and K are positive integers.

9 . The array according to claim 8 , wherein the array is the three-dimensional array when K is greater than 1, in two adjacent layers of SOT-MRAMs, a bit line in a bottom layer of SOT-MRAMs and the common word line in a top layer of SOT-MRAMs cross at an interval.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 20, 2023
From: XING, GUOZHONG; LIN, HUAI; LIU, YU; ZHANG, PEIWEN; XIE, CHANGQING; LI, LING; LIU, MING
To: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
Reel/Frame 062743/0871 →
Continuity (1)
Related Publication 20230337548A1 · Oct 19, 2023
References Cited (18)
US 9324402B2 · Wu · 2016 [cited by examiner]
US 10236075B1 · Kim · 2019 [cited by examiner]
US 11514963B2 · Drouard · 2022 [cited by examiner]
US 12260089B2 · Park · 2025 [cited by examiner]
US 20060105990A1 · Stahl · 2006 [cited by examiner]
US 20170117027A1 · Braganca · 2017 [cited by examiner]
US 20190006415A1 · Li · 2019 [cited by examiner]
US 20190147929A1 · Sasaki et al. · 2019 [cited by applicant]
US 20190148046A1 · Suzuki · 2019 [cited by examiner]
US 20200075099A1 · Choi · 2020 [cited by examiner]
US 20200082861A1 · Sasaki · 2020 [cited by examiner]
US 20200273512A1 · Petti · 2020 [cited by examiner]
US 20210210127A1 · Drouard · 2021 [cited by examiner]
CN 107039064A · 2017 [cited by applicant]
CN 109075210A · 2018 [cited by applicant]
CN 109637569A · 2019 [cited by applicant]
CN 111554809A · 2020 [cited by applicant]
International Search Report and Written Opinion for Chinese PCT Application No. PCT/CN2020/110217, dated May 19, 2021. 9 pages including English translation. [cited by applicant]