IP Library Granted Patent US 12,529,660
Granted Patent B2
US 12,529,660 · App. 18/144,657 · Granted Jan 20, 2026

Integrated quality monitoring view for battery manufacturing process

Inventors: Anjali Chandran (Cochin, IN); Hrishikesh Thakre (Nagpur, IN); Senthilkumar Jayaraman (Mettur, IN); Ajaykumar Bangur (Bangalore, IN); Ajay Krishna (Lucknow, IN); Bharath Kumar M G (Bangalore, IN)
Assignee: HONEYWELL INTERNATIONAL INC.
G01N21/8914G01N35/00613
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Quick Facts
Patent No.
US 12,529,660
App. No.
18/144,657
Granted
Jan 20, 2026
Kind
B2
Abstract

Integrated quality monitoring techniques enable a plant operator to simultaneously view and analyze data that are derived from a plurality of sensors. An apparatus for and a method of inferring quality of a sheet roll consecutively monitors new data including: (a) surface defects of the sheet roll from vision defect tracking system, (b) measurement defects of the sheet roll from vision measurement system, and (c) quality and defect data of the sheet roll from quality control system, and simultaneously integrating the new data with old data in history. Data connect application programming interface can furnish historical, current and alarms data for analysis to an aggregator node for reporting and analysis.

Claims (12)

1 . A method of inferring quality of a sheet roll, the method comprising:

monitoring surface defects of the sheet roll using at least one imaging device configured to capture surface images of the sheet roll;

monitoring measurement defects of the sheet roll using a vision measurement system comprising at least one scanner configured to measure at least a basis weight and a thickness of the sheet roll; and

monitoring quality and defect data of the sheet roll using a quality control system comprising a processor configured to analyze data received from the at least one imaging device and the at least one scanner;

applying, by a marker device, fiducial markers on the sheet roll at predefined intervals along a machine direction, wherein the fiducial markers synchronize a defect measurement using data from the at least one imaging device, the vision measurement system and the quality control system; and

generating, by the processor, a defect map that visually represents and correlates a defect data obtained from the at least one imaging device, at least one scanner, and the quality control system.

2 . The method of claim 1 , wherein the monitoring of surface defects, measurement defects, and quality and defect data is continuous.

3 . The method of claim 1 , wherein the monitoring of surface defects, measurement defects, and quality and defect data is real-time.

4 . The method of claim 1 further comprising deriving an analysis pattern.

5 . The method of claim 1 further comprising reporting the data simultaneously.

6 . The method of claim 1 further comprising viewing the data in real-time.

7 . The method of claim 1 further comprising taking corrective action.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 8, 2023
From: CHANDRAN, ANJALI; THAKRE, HRISHIKESH; JAYARAMAN, SENTHILKUMAR; BANGUR, AJAYKUMAR; KRISHNA, AJAY; M G, BHARATH KUMAR
To: HONEYWELL INTERNATIONAL INC.
Reel/Frame 063569/0328 →
Continuity (1)
Related Publication 20240377336A1 · Nov 14, 2024
References Cited (30)
US 3681595A · Dahlin · 1972 [cited by applicant]
US 4921574A · Hu · 1990 [cited by applicant]
US 4943721A · Vidrine · 1990 [cited by applicant]
US 5795394A · Belotserkovsky · 1998 [cited by applicant]
US 7528400B2 · Duck · 2009 [cited by applicant]
US 8021517B2 · Hughes · 2011 [cited by applicant]
US 8596861B2 · Kane · 2013 [cited by applicant]
US 9309625B2 · Backstrom · 2016 [cited by applicant]
US 10041673B2 · Pathangay · 2018 [cited by applicant]
US 10501274B2 · Ramakrishnan · 2019 [cited by applicant]
US 10628934B2 · Weaver · 2020 [cited by applicant]
US 11143495B2 · Hughes et al. · 2021 [cited by applicant]
US 20090079971A1 · Toma · 2009 [cited by examiner]
US 20090191327A1 · Lotz · 2009 [cited by applicant]
US 20120218542A1 · Ichizawa · 2012 [cited by examiner]
US 20130004816A1 · Berkowitz · 2013 [cited by applicant]
US 20180172432A1 · Hughes · 2018 [cited by applicant]
US 20180211373A1 · Stoppa · 2018 [cited by examiner]
US 20180356805A1 · Krishna · 2018 [cited by applicant]
US 20190178812A1 · Richard · 2019 [cited by examiner]
US 20200096380A1 · Nebel · 2020 [cited by applicant]
US 20210223171A1 · Shitara · 2021 [cited by examiner]
US 20210232985A1 · Palanisamy · 2021 [cited by examiner]
US 20210262776A1 · Tixier · 2021 [cited by applicant]
US 20220305516A1 · Lee · 2022 [cited by applicant]
US 20230021315A1 · Martins Loureiro · 2023 [cited by examiner]
CN 112258459A · 2021 [cited by applicant]
CN 110544231B · 2021 [cited by applicant]
CN 111951253B · 2021 [cited by applicant]
CN 114308723A · 2022 [cited by applicant]