Plasma processing system and multi-section faraday shielding device thereof
A Faraday shielding device includes an electrically conductive ring and a plurality of electrically conductive petal-shaped assemblies radially and symmetrically on the periphery of the electrically conductive ring. Each electrically conductive petal-shaped assembly includes a plurality of electrically conductive plates and connecting capacitors; the electrically conductive plate are at intervals along the radial direction; a connecting capacitor is between every two adjacent electrically conductive plates. Each connection capacitor includes upper and lower electrode plates, the lower end surface of each upper electrode plate and/or the upper end surface of each lower electrode plate has an insulating coating, the lower end surface of the upper electrode plate is connected to the upper end surface of the lower electrode plate, the upper electrode plate is electrically connected to one of the adjacent electrically conductive plate, and the lower electrode plate is electrically connected to the other of the adjacent electrically conductive plates.
1 . A multi-section Faraday shielding device of a plasma processing system, comprising
an electrically conductive ring and a plurality of electrically conductive petal-shaped assemblies radially and symmetrically arranged on the outer periphery of the electrically conductive ring;
wherein each of the electrically conductive petal-shaped assemblies includes a plurality of electrically conductive plates and a plurality of connecting capacitors; the plurality of electrically conductive plates of each of the electrically conductive petal-shaped assemblies are arranged at intervals along a radial direction; a connecting capacitor is provided between every two adjacent electrically conductive plates; wherein each connecting capacitor includes an upper electrode plate and a lower electrode plate, a lower end surface of the upper electrode plate and/or an upper end surface of the lower electrode plate are provided with an insulating coating; the upper electrode plate and the lower electrode plate are parallel to the electrically conductive plate; the lower end surface of the upper electrode plate is connected to the upper end surface of the lower electrode plate, the upper electrode plate is electrically conductively connected to one electrically conductive plate of two adjacent electrically conductive plates, and the lower electrode plate is electrically conductively connected to another electrically conductive plate of the two adjacent electrically conductive plates; and the plurality of electrically conductive plates are located on a same plane.
2 . The multi-section Faraday shielding device of the plasma processing system according to claim 1 , wherein the upper end surface of the upper electrode plate is not higher than the upper end surface of the electrically conductive plate; the lower end surface of the lower electrode plate is not lower than the lower end surface of the electrically conductive plate.
3 . The multi-section Faraday shielding device of the plasma processing system according to claim 1 , wherein the upper electrode plate is bonded and fixed with the lower electrode plate.
4 . The multi-section Faraday shielding device of the plasma processing system according to claim 3 , wherein outer edges of side walls of the upper electrode plate and the lower electrode plate are bonded and fixed with each other by a colloid.
5 . A plasma processing system, comprising the Faraday shielding device according to claim 1 .
6 . The plasma processing system according to claim 5 , further including a reaction chamber; wherein a dielectric window is arranged above the reaction chamber; the Faraday shielding device is arranged on the dielectric window.
7 . The plasma processing system according to claim 6 , further including a radio frequency coil; wherein the radio frequency coil is arranged on the Faraday shielding device.