Planar coil stellarator
Disclosed herein is a stellarator comprising two sets of coils, namely a set of encircling coils which encircle the plasma axis, and a set of shaping coils which do not encircle any other coil or the plasma. In some embodiments, the encircling coils include a structural element to maintain their shape under magnetic forces. In some embodiments, the shaping coils are mounted onto one or more structural elements which, together with the shaping coils, constitute a field shaping unit. Also disclosed is a controller which may modify the electrical current flowing in one or more subsets of the coils in order to achieve target plasma parameters. Also disclosed is a method of designing a set of shaping coils by discretizing a surface dipole or current potential distribution.
1 . A stellarator comprising a field-shaping coil system including one or more field shaping units which define a void adapted to confine a plasma, wherein each field shaping unit comprises (i) one or more structural mounting elements; and (ii) one or more shaping coils disposed on a surface of the one or more structural mounting elements, wherein the one or more shaping coils do not interlock with each other, and where each of the one or more shaping coils do not individually encircle the plasma.
2 . The stellarator of claim 1 , further comprising one or more additional coils.
3 . The stellarator of claim 2 , wherein the one or more additional coils are one or more control coils.
4 . The stellarator of claim 2 , wherein the one or more additional coils are one or more saddle coils.
5 . The stellarator of claim 2 , wherein the one or more additional coils are one or more encircling coils.
6 . The stellarator of claim 5 , wherein the one or more encircling coils are planar.
7 . The stellarator of claim 5 , wherein the one or more encircling coils are superconducting.
8 . The stellarator of claim 2 , wherein the one or more additional coils are one or more electromagnetic coils.
9 . The stellarator of claim 8 , wherein the one or more electromagnetic coils have a non-planar shape.
10 . The stellarator of claim 8 , wherein the one or more electromagnetic coils have a planar shape.
11 . The stellarator of claim 2 , further comprising one or more controllers communicatively coupled to at least the one or more additional coils.
12 . The stellarator of claim 1 , wherein the stellarator further comprises a breeding blanket.
13 . The stellarator of claim 1 , wherein the one or more surface-mounted shaping coils are planar.
14 . The stellarator of claim 1 , wherein the one or more surface-mounted shaping coils conform to a non-planar surface shape.
15 . The stellarator of claim 1 , further comprising one or more controllers.
16 . A stellarator comprising:
(a) a plurality of structural supports;
(b) one or more field shaping units operably connected to the plurality of structural supports, each of the one or more field shaping units comprising one or more, surface-mounted shaping coils; and
(c) one or more additional coils;
wherein the plurality of structural supports, the one or more field shaping units, and the one or more additional coils collectively are adapted to confine a plasma; and
wherein the one or more additional coils do not interlock each other; but where each of the one or more additional coils interlocks the plasma.
17 . The stellarator of claim 16 , wherein the one or more additional coils have a non-planar shape.
18 . The stellarator of claim 16 , wherein the one or more additional coils are superconducting.
19 . The stellarator of claim 16 , wherein the one or more surface-mounted shaping coils are planar.
20 . The stellarator of claim 16 , wherein the one or more surface-mounted shaping coils conform to a non-planar surface shape.
21 . The stellarator of claim 16 , further comprising one or more controllers.
22 . The stellarator of claim 21 , wherein the one or more controllers are communicatively coupled to at least one of the one or more surface-mounted shaping coils or the one or more additional coils.
23 . A stellarator comprising:
(a) a field-shaping coil system including one or more field shaping units which define a void adapted to confine a plasma, wherein each field shaping unit comprises:
(i) one or more structural mounting elements; and
(ii) one or more shaping coils disposed on a surface of the one or more structural mounting elements; and
(b) one or more additional coils;
wherein the one or more additional coils do not interlock each other; but where each of the one or more additional coils interlocks the plasma confined in the void;
wherein the one or more shaping coils do not interlock with each other; and
wherein each of the one or more shaping coils do not individually encircle the plasma.
24 . The stellarator of claim 23 , wherein the one or more additional coils are one or more electromagnetic coils.
25 . The stellarator of claim 24 , wherein the one or more electromagnetic coils have a non-planar shape.
26 . The stellarator of claim 23 , wherein the one or more additional coils are superconducting.
27 . The stellarator of claim 23 , wherein the one or more surface-mounted shaping coils are planar.
28 . The stellarator of claim 23 , wherein the one or more surface-mounted shaping coils conform to a non-planar surface shape.
29 . The stellarator of claim 23 , further comprising one or more controllers.
30 . The stellarator of claim 29 , wherein the one or more controllers are communicatively coupled to at least one of the one or more shaping coils or the one or more additional coils.