Granted Patent B2

US 12,538,657 · App. 17/798,160 · Granted Jan 27, 2026

Inventors: Mengyang Wen (Beijing, CN); Xing Fan (Beijing, CN); Yueping Zuo (Beijing, CN); Chunyang Wang (Beijing, CN); Xiongnan Zhang (Beijing, CN)

Assignee: BOE Technology Group Co., Ltd.

H10K59/122H10K71/00H10K59/1201

Abstract

Claims (33)

1 . An OLED display substrate, comprising:

a base substrate;

a thin-film transistor array layer located on the base substrate;

a pixel definition layer and a light-emitting unit located on a side of the thin-film transistor array layer away from the base substrate; and

wherein the pixel definition layer defines a pixel opening penetrating the pixel definition layer, at least part of the hierarchical structure of the light-emitting unit is located in the pixel opening, and a side surface of the pixel opening is provided with an insulative barrier layer;

wherein the side surface of the pixel definition layer away from the base substrate is provided with a light shielding layer;

wherein the light shielding layer comprises a plurality of spaced light shielding graphics.

2 . The OLED display substrate according to claim 1 , wherein the insulative barrier layer uses an inorganic insulative material.

3 . The OLED display substrate according to claim 2 , wherein the insulative barrier layer uses a light shielding material.

4 . The OLED display substrate according to claim 2 , wherein the insulative barrier layer uses a molybdenum oxide.

5 . The OLED display substrate according to claim 1 , wherein the insulative barrier layer and the light shielding layer are arranged on the same layer and material.

6 . The OLED display substrate according to claim 1 , wherein the insulative barrier layer is integral with the light shielding layer.

7 . The OLED display substrate according to claim 1 , wherein the thickness of the insulative barrier layer is 200 nm-400 nm.

8 . A display panel, comprising an OLED display substrate according to claim 1 .

9 . A display device, comprising an OLED display substrate according to claim 1 .

10 . A method for making an OLED display substrate, comprising:

forming a thin-film transistor array layer on a base substrate;

forming a pixel definition layer on a side of the thin-film transistor array layer away from the base substrate, the pixel definition layer defining a pixel opening penetrating the pixel definition layer;

forming an insulative barrier layer on a side surface in the pixel opening; and

forming at least part of the hierarchical structure of a light-emitting unit in the pixel opening;

wherein the forming the insulative barrier layer on the side surface of the pixel opening comprises:

forming the insulative barrier layer by using a light shielding material;

wherein the method further comprises:

forming the light shielding layer on the side surface of the pixel definition layer away from the base substrate;

wherein the method further comprises: forming a plurality of spaced light shielding graphics by performing a patterning process on the light shielding layer.

11 . The method for making the OLED display substrate according to claim 10 , wherein the insulative barrier layer and the light shielding layer are simultaneously formed by one patterning process by using the light shielding material.

12 . The method for making the OLED display substrate according to claim 10 , wherein before the forming the pixel definition layer on a side of the thin-film transistor array layer away from the base substrate, the method further comprises:

forming a first electrode on a side of the thin-film transistor array layer away from the base substrate, the light-emitting unit comprising the first electrode;

wherein the forming the pixel definition layer on a side of the thin-film transistor array layer away from the base substrate comprises:

forming the pixel definition layer on a side of the first electrode away from the base substrate; and

the after forming the pixel definition layer on a side of the first electrode away from the base substrate, the method further comprising:

forming the light shielding material layer on the side surface of the pixel opening and a side of the pixel definition layer away from the base substrate,

forming the insulative barrier layer covering the side surface of the pixel opening and a plurality of spaced light shielding graphics covering a side of the pixel definition layer away from the base substrate by performing the patterning process on the light shielding material layer.

Assignments (1)

Priority Claims (1)

Continuity (1)

References Cited (13)