IP Library Granted Patent US 12,548,758
Granted Patent B2
US 12,548,758 · App. 17/951,570 · Granted Feb 10, 2026

Negative electrode plate, electrochemical apparatus, and electronic apparatus

Inventors: Zhihuan Chen (Ningde, CN); Daoyi Jiang (Ningde, CN); Ting Yi (Ningde, CN); Hang Cui (Ningde, CN)
Assignee: NINGDE AMPEREX TECHNOLOGY LIMITED
H01M4/134H01M4/386H01M4/483H01M2004/021H01M2004/027H01M4/622H01M4/625
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,548,758
App. No.
17/951,570
Granted
Feb 10, 2026
Kind
B2
Abstract

A negative electrode plate includes a current collector and an active substance layer provided on the current collector, where the active substance layer includes a silicon-based material, and a proportion by mass of element silicon in the active substance layer has a minimum value X1 and a maximum value X2 among different locations of a same area size, where a value of X1/X2 is M, and M≥0.7; and a weight loss rate of the active substance layer under thermogravimetric (TG) analysis within 800° C. has a minimum value Y1 and a maximum value Y2 among different locations of a same area size, where a value of Y1/Y2 is N, and N≥0.7. In this disclosure, the silicon-based material and a binder in the active substance layer are uniformly dispersed, improving C-rate performance and cycling performance of the electrochemical apparatus and reducing swelling of an electrode assembly.

Claims (30)

1 . A negative electrode plate, comprising:

a current collector; and

an active substance layer provided on the current collector,

wherein the active substance layer comprises a silicon-based material, and a proportion by mass of element silicon in the active substance layer has a minimum value X1 and a maximum value X2 among different locations of a same area size, wherein a value of X1/X2 is M, and M≥0.7; and

a weight loss rate of the active substance layer under thermogravimetric (TG) analysis within 800° C. has a minimum value Y1 and a maximum value Y2 among different locations of a same area size, wherein N=Y1/Y2, and N≥0.7;

wherein in an X-ray diffraction pattern of the silicon-based material, the highest intensity at 2θ within the range of 20.5°-21.5° is I 1 , and the highest intensity at 2θ within the range of 28.0°-29.0° is I 2 , wherein 0<I 2 /I 1 ≤1.

2 . The negative electrode plate according to claim 1 , wherein a mass percentage of the silicon-based material in the active substance layer is 2%-80%.

3 . The negative electrode plate according to claim 1 , wherein the silicon-based material comprises SiO x , wherein 0.6≤x≤1.5; and/or an average particle size of the silicon-based material is 500 nm-30 μm.

4 . The negative electrode plate according to claim 1 , wherein the silicon-based material comprises at least one of Si, SiO x , a silicon-carbon material or a silicon alloy, wherein a particle size of Si is less than 100 nm, and 0.6≤x≤1.5.

5 . The negative electrode plate according to claim 1 , wherein particle size distribution of the silicon-based material satisfies 0.3≤D n 10/D v 50≤0.6, wherein D n 10 is a particle diameter when a cumulative quantity-of-particles based distribution percentage reaches 10%, which is obtained with a laser scattering particle analyzer, and D v 50 is a particle diameter when a cumulative volume based distribution percentage reaches 50%, which is obtained with a laser scattering particle analyzer.

6 . The negative electrode plate according to claim 1 , wherein the active substance layer further comprises a binder; the binder comprises at least one of carboxymethyl cellulose, polyacrylic acid, polyvinyl pyrrolidone, polyaniline, polyimide, polyamide-imide, polysiloxane, polystyrene-butadiene rubber, epoxy resin, polyester resin, polyurethane resin, or polyfluorene; and a mass percentage of the binder in the active substance layer is 0.5%-10%.

7 . The negative electrode plate according to claim 1 , wherein the active substance layer further comprises a conductive agent;

wherein the conductive agent comprises at least one of single-wall carbon nanotubes, multi-wall carbon nanotubes, vapor grown carbon fiber, conductive carbon black, acetylene black, Ketjen black, conductive graphite, or graphene; and/or a mass percentage of the conductive agent in the active substance layer is 0.1%-5%.

8 . The negative electrode plate according to claim 1 , wherein a mass percentage of the silicon-based material in the active substance layer is 2%-40%.

9 . The negative electrode plate according to claim 1 , wherein a mass percentage of the silicon-based material in the active substance layer is 40%-80%.

10 . The negative electrode plate according to claim 1 , wherein an average particle size of the silicon-based material is 500 nm-10 μm.

11 . An electrochemical apparatus, comprising:

a positive electrode plate;

a negative electrode plate; and

a separator disposed between the positive electrode plate and the negative electrode plate;

wherein the negative electrode plate comprises

a current collector; and

an active substance layer provided on the current collector,

wherein the active substance layer comprises a silicon-based material, and a proportion by mass of element silicon in the active substance layer has a minimum value X1 and a maximum value X2 among different locations of a same area size, wherein a value of X1/X2 is M, and M≥0.7; and

a weight loss rate of the active substance layer under thermogravimetric (TG) analysis within 800° C. has a minimum value Y1 and a maximum value Y2 among different locations of a same area size, wherein N=Y1/Y2, and N≥0.7;

wherein in an X-ray diffraction pattern of the silicon-based material, the highest intensity at 2θ within the range of 20.5°-21.5° is I 1 , and the highest intensity at 2θ within the range of 28.0°-29.0° is I 2 , wherein 0<I 2 /I 1 ≤1.

12 . The electrochemical apparatus according to claim 11 , wherein a mass percentage of the silicon-based material in the active substance layer is 2%-40%.

13 . The electrochemical apparatus according to claim 11 , wherein a mass percentage of the silicon-based material in the active substance layer is 40%-80%.

14 . The electrochemical apparatus according to claim 11 , wherein an average particle size of the silicon-based material is 500 nm-10 μm.

15 . An electronic apparatus, comprising the electrochemical apparatus according to claim 11 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 23, 2022
From: CHEN, ZHIHUAN; JIANG, DAOYI; YI, TING; CUI, HANG
To: NINGDE AMPEREX TECHNOLOGY LIMITED
Reel/Frame 061195/0626 →
Continuity (2)
Continuation PCTCN2020081306 · Mar 26, 2020
Related Publication 20230021755A1 · Jan 26, 2023
References Cited (17)
US 9583278B2 · Miyauchi et al. · 2017 [cited by applicant]
US 10374225B2 · Yamamoto et al. · 2019 [cited by applicant]
US 20150187516A1 · Miyauchi et al. · 2015 [cited by applicant]
US 20190140261A1 · Yamamoto et al. · 2019 [cited by applicant]
US 20190157664A1 · Yamamoto · 2019 [cited by examiner]
US 20200365895A1 · Sawada · 2020 [cited by examiner]
US 20210184219A1 · Sawada · 2021 [cited by examiner]
US 20220069296A1 · Zhu · 2022 [cited by examiner]
US 20230343944A1 · Chen · 2023 [cited by examiner]
CN 104205442A · 2014 [cited by applicant]
CN 109075376A · 2018 [cited by applicant]
CN 109075377A · 2018 [cited by applicant]
CN 110797520A · 2020 [cited by applicant]
CN 110890531A · 2020 [cited by applicant]
CN 110911635A · 2020 [cited by applicant]
JP 6016573B2 · 2016 [cited by applicant]
International Search Report dated Dec. 28, 2020, issued in counterpart International Application No. PCT/CN2020/081306 (2 pages). [cited by applicant]