IP Library Granted Patent US 12,555,746
Granted Patent B2
US 12,555,746 · App. 18/396,693 · Granted Feb 17, 2026

High-frequency power supply system

Inventors: Yuichi Hasegawa (Osaka, JP); Yuya Ueno (Osaka, JP)
Assignee: DAIHEN Corporation
H01J37/32183H01J37/32128H01J37/32146H01J37/32155H03H7/40
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,555,746
App. No.
18/396,693
Granted
Feb 17, 2026
Kind
B2
Abstract

A high-frequency power supply system according to the present disclosure includes a first power supply, a second power supply, a first matcher, and a second matcher. The second power supply performs pulse modulation of repeating an ON operation of outputting a second forward wave voltage and an OFF operation of not outputting the second forward wave voltage are repeated. The first power supply performs frequency modulation control in a second power supply ON period, and outputs a first forward wave voltage having a first fundamental frequency in a second power supply OFF period.

Claims (13)

1 . A high-frequency power supply system comprising:

a first power supply capable of outputting a first forward wave voltage having a first fundamental frequency;

a second power supply capable of outputting a second forward wave voltage having a second fundamental frequency lower than the first fundamental frequency;

a first matcher connected between the first power supply and a load; and

a second matcher connected between the second power supply and the load, wherein

the second power supply performs pulse modulation of repeating an ON operation of outputting the second forward wave voltage and an OFF operation of not outputting the second forward wave voltage, and

the first power supply performs frequency modulation control in a second power supply ON period in which the ON operation is performed, and outputs the first forward wave voltage having the first fundamental frequency in a second power supply OFF period in which the OFF operation is performed.

2 . The high-frequency power supply system according to claim 1 , wherein

the frequency modulation control is performed by frequency-modulating the first forward wave voltage with a modulation signal having a frequency substantially identical with the second fundamental frequency.

3 . The high-frequency power supply system according to claim 2 , wherein

the modulation signal has an initial phase, a frequency shift, and an offset frequency as adjustment parameters,

an absolute value of a reflection coefficient or a power value of a reflected wave power at an output terminal of the first power supply calculated in the second power supply ON period is reduced by adjusting the initial phase and the frequency shift, and

the absolute value of the reflection coefficient or the power value of the reflected wave power at the output terminal of the first power supply calculated in the second power supply ON period is reduced by adjusting the offset frequency.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 27, 2023
From: HASEGAWA, YUICHI; UENO, YUYA
To: DAIHEN CORPORATION
Reel/Frame 065957/0365 →
Priority Claims (1)
JP 2022-212631 · Dec 28, 2022 · national
Continuity (1)
Related Publication 20240222082A1 · Jul 4, 2024
References Cited (93)
US 9947514B2 · Radomski et al. · 2018 [cited by applicant]
US 10304669B1 · Coumou et al. · 2019 [cited by applicant]
US 20060151591A1 · Matsuno · 2006 [cited by applicant]
US 20070170997A1 · Matsuno · 2007 [cited by applicant]
US 20080129407A1 · Matsuno · 2008 [cited by applicant]
US 20100194195A1 · Coumou · 2010 [cited by examiner]
US 20130213573A1 · Valcore, Jr. et al. · 2013 [cited by applicant]
US 20130213934A1 · Valcore, Jr. et al. · 2013 [cited by applicant]
US 20130214682A1 · Valcore, Jr. et al. · 2013 [cited by applicant]
US 20130214683A1 · Valcore, Jr. et al. · 2013 [cited by applicant]
US 20130214828A1 · Valcore, Jr. et al. · 2013 [cited by applicant]
US 20140009073A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140091875A1 · Shimomoto et al. · 2014 [cited by applicant]
US 20140167613A1 · Fong et al. · 2014 [cited by applicant]
US 20140172335A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140195033A1 · Lyndaker et al. · 2014 [cited by applicant]
US 20140210508A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140214350A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140214351A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140214395A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140265852A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140305589A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140354173A1 · Matsuno · 2014 [cited by applicant]
US 20150048740A1 · Valcore, Jr. et al. · 2015 [cited by applicant]
US 20150069912A1 · Valcore, Jr. et al. · 2015 [cited by applicant]
US 20150091440A1 · Osborne · 2015 [cited by applicant]
US 20150091441A1 · Marakhtanov et al. · 2015 [cited by applicant]
US 20150122420A1 · Konno et al. · 2015 [cited by applicant]
US 20150122421A1 · Konno · 2015 [cited by examiner]
US 20150214012A1 · Valcore, Jr. et al. · 2015 [cited by applicant]
US 20150244342A1 · Shimomoto et al. · 2015 [cited by applicant]
US 20150311041A1 · Valcore, Jr. et al. · 2015 [cited by applicant]
US 20160005573A1 · Valcore, Jr. et al. · 2016 [cited by applicant]
US 20160044775A1 · Valcore, Jr. et al. · 2016 [cited by applicant]
US 20160079037A1 · Hirano · 2016 [cited by examiner]
US 20160172162A1 · Fong et al. · 2016 [cited by applicant]
US 20160189937A1 · Valcore, Jr. et al. · 2016 [cited by applicant]
US 20160233058A1 · Marakhtanov et al. · 2016 [cited by applicant]
US 20160240356A1 · Howald et al. · 2016 [cited by applicant]
US 20160259872A1 · Howald et al. · 2016 [cited by applicant]
US 20160268100A1 · Valcore, Jr. et al. · 2016 [cited by applicant]
US 20160276137A1 · Valcore, Jr. et al. · 2016 [cited by applicant]
US 20160307736A1 · Howald et al. · 2016 [cited by applicant]
US 20160307738A1 · Marakhtanov et al. · 2016 [cited by applicant]
US 20160308560A1 · Howald et al. · 2016 [cited by applicant]
US 20160322207A1 · Howald et al. · 2016 [cited by applicant]
US 20160336152A1 · Valcore, Jr. et al. · 2016 [cited by applicant]
US 20160343548A1 · Howald et al. · 2016 [cited by applicant]
US 20170032945A1 · Valcore, Jr. et al. · 2017 [cited by applicant]
US 20170062187A1 · Radomski et al. · 2017 [cited by applicant]
US 20170084432A1 · Valcore, Jr. et al. · 2017 [cited by applicant]
US 20170103872A1 · Howald et al. · 2017 [cited by applicant]
US 20170178864A1 · Valcore, Jr. et al. · 2017 [cited by applicant]
US 20170178873A1 · Valcore, Jr. et al. · 2017 [cited by applicant]
US 20170194130A1 · Lyndaker et al. · 2017 [cited by applicant]
US 20170294293A1 · Howald et al. · 2017 [cited by applicant]
US 20170330732A1 · Valcore, Jr. et al. · 2017 [cited by applicant]
US 20180018418A1 · Valcore, Jr. et al. · 2018 [cited by applicant]
US 20180033596A1 · Valcore, Jr. et al. · 2018 [cited by applicant]
US 20180053632A1 · Fong et al. · 2018 [cited by applicant]
US 20180068834A1 · Valcore, Jr. et al. · 2018 [cited by applicant]
US 20180294140A1 · Valcore, Jr. et al. · 2018 [cited by applicant]
US 20180323038A1 · Valcore, Jr. et al. · 2018 [cited by applicant]
US 20190057847A1 · Valcore, Jr. et al. · 2019 [cited by applicant]
US 20190214232A1 · Morii et al. · 2019 [cited by applicant]
US 20190272306A1 · Howald et al. · 2019 [cited by applicant]
US 20190288683A1 · Morii et al. · 2019 [cited by applicant]
US 20190318919A1 · Lyndaker et al. · 2019 [cited by applicant]
US 20200067545A1 · Howald et al. · 2020 [cited by applicant]
US 20200074034A1 · Valcore, Jr. et al. · 2020 [cited by applicant]
US 20200203129A1 · Koshimizu · 2020 [cited by examiner]
US 20200211824A1 · Morii · 2020 [cited by applicant]
US 20200212869A1 · Morii · 2020 [cited by applicant]
US 20200212893A1 · Morii · 2020 [cited by applicant]
US 20200218774A1 · Howald et al. · 2020 [cited by applicant]
US 20200243304A1 · Valcore, Jr. et al. · 2020 [cited by applicant]
US 20200412364A1 · Morii et al. · 2020 [cited by applicant]
US 20210281235A1 · Morii · 2021 [cited by applicant]
US 20220208519A1 · Hasegawa et al. · 2022 [cited by applicant]
US 20220277934A1 · Valcore, Jr. et al. · 2022 [cited by applicant]
JP 3183914B2 · 2001 [cited by applicant]
JP 4975291B2 · 2012 [cited by applicant]
JP 6084417B2 · 2017 [cited by applicant]
JP 6177012B2 · 2017 [cited by applicant]
JP 2017188434A · 2017 [cited by applicant]
JP 6312405B2 · 2018 [cited by applicant]
JP 2018536295A · 2018 [cited by applicant]
JP 6773283B2 · 2020 [cited by applicant]
JP 6898338B2 · 2021 [cited by applicant]
JP 2022102688A · 2022 [cited by applicant]
JP 7105184B2 · 2022 [cited by applicant]
JP 7105185B2 · 2022 [cited by applicant]
JP 7112952B2 · 2022 [cited by applicant]