Fabrication method for semiconductor structure
A fabrication method for a semiconductor structure with a hole spin qubit includes: providing a substrate; growing a germanium quantum well on the substrate, in which the germanium quantum well is an inclined quantum well structure grown in a [110] direction, and the germanium quantum well is grown by a complementary metal oxide semiconductor process; and fabricating a two-dimensional gate-defined quantum dot in the germanium quantum well.
1 . A fabrication method for a semiconductor structure, comprising:
providing a substrate;
growing a germanium quantum well on the substrate, wherein the germanium quantum well is an inclined quantum well structure grown in a [110] direction, and the germanium quantum well is grown by a complementary metal oxide semiconductor process; and
fabricating a two-dimensional gate-defined quantum dot in the germanium quantum well.
2 . The fabrication method of claim 1 , wherein growing the germanium quantum well on the substrate comprises:
growing an alloy layer on the substrate;
growing a [100] germanium layer on the alloy layer, wherein the [100] germanium layer is p-type doped; and
growing an inclined plane by etching the [100] germanium layer.
3 . The fabrication method of claim 2 , further comprising:
growing a dielectric layer on the [100] germanium layer; and
growing an electrode on the dielectric layer.
4 . The fabrication method of claim 3 , wherein a dielectric material of the dielectric layer is SiO 2 or Al 2 O 3 , and a thickness of the dielectric layer is between 10 nm and 100 nm.
5 . The fabrication method of claim 3 , wherein the electrode is a metal electrode, a material of the metal electrode is Al or Au, and a thickness of the metal electrode is in a range of 10 to 100 nm.
6 . The fabrication method of claim 2 , wherein the inclined plane is inclined at an angle of 45 degrees to a horizontal direction.
7 . The fabrication method of claim 2 , wherein the alloy layer is a [100] germanium-silicon alloy layer, a thickness of the [100] germanium-silicon alloy layer is ranging from 1 nm to 100 nm, and a percentage of silicon in the [100] germanium-silicon alloy layer is less than 50%.
8 . The fabrication method of claim 2 , wherein a thickness of the [100] germanium layer is in a range of 10 to 1000 nm.
9 . The fabrication method of claim 2 , wherein the [100] germanium layer is P-doped by a method comprising thermal diffusion, electrochemical implantation, or ion implantation.
10 . The fabrication method of claim 1 , wherein a size of the two-dimensional gate-controlled quantum dot is 60 to 100 nm.
11 . The fabrication method of claim 1 , wherein the substrate is a [100] silicon substrate.
12 . The fabrication method of claim 1 , wherein a bulk phase of the germanium material of the germanium quantum well is a crystal structure with a tetrahedral covalent bond.
13 . The fabrication method of claim 1 , wherein a mobility of the germanium quantum well reaches a level of 10 5 cm 2 /(V·s).
14 . The fabrication method of claim 1 , wherein the two-dimensional gate-defined quantum dot has a Rabi frequency of a level of GHz, and a quality factor of greater than 10 4 .
15 . The fabrication method of claim 1 , wherein the two-dimensional gate-defined quantum dot is fabricated in the germanium quantum well by an electric dipole spin resonance technique.
16 . The fabrication method of claim 1 , wherein a back gate static electric field, an in-inclined plane alternating electric field or microwave, an inclined plane perpendicular electrostatic field and an in-inclined plane or inclined plane perpendicular static magnetic field are applied to the germanium quantum well to generate a Rabi frequency, wherein a direction of the in-inclined plane static magnetic field is not perpendicular to a direction of the in-inclined plane alternating electric field or microwave.
17 . The fabrication method of claim 16 , wherein a frequency of the in-inclined plane alternating electric field or microwave is equal to an intrinsic frequency of the in-inclined plane or inclined plane perpendicular static magnetic field.
18 . A semiconductor structure, comprising:
a substrate;
a germanium quantum well grown on the substrate, wherein the germanium quantum well is an inclined quantum well structure grown in a [110] direction; and
a two-dimensional gate-defined quantum dot fabricated in the germanium quantum well.
19 . The semiconductor structure of claim 18 , comprising the substrate, an alloy layer, a [100] germanium layer, a dielectric layer and an electrode grown sequentially from bottom to top, the [100] germanium layer being p-type doped to grow an inclined plane with respect to the [100] germanium layer.
20 . The semiconductor structure of claim 18 , wherein the inclined plane is inclined at an angle of 45 degrees to a horizontal direction.