Electrochemical sensor for sensing two-phase cooling fluid contamination
An immersion cooling system includes an immersion tank defining an immersion chamber therein, an immersion working fluid, a first electrode, and a second electrode. The immersion working fluid is positioned at least partially in the immersion chamber. The first electrode is electrically coupled to an electrical power source, and the second electrode is positioned proximate to the first electrode and defines a sampling region therebetween. A sample portion of the immersion working fluid is positioned in the sampling region, and the second electrode is coupled to a microcontroller configured to measure at least a current across the sampling region between the first electrode and the second electrode.
1 . An immersion cooling system comprising:
an immersion tank defining an immersion chamber in the immersion tank;
an immersion working fluid positioned at least partially in the immersion chamber;
a first electrode configured to electrically couple to an electrical power source including a direct current (DC) source and an alternating current (AC) stimulus;
a second electrode positioned proximate to the first electrode and defining, between the first electrode and the second electrode, a sampling region for positioning a sample portion of the immersion working fluid;
an ammeter in electrical communication with the second electrode and configured to measure current across the sampling region between the first electrode and the second electrode; and
a microcontroller coupled to the second electrode wherein the microcontroller is configured to apply to the sample portion in the sampling region via the second electrode one or more stimulus signals powered in operation by the electrical power source and receive the current measured by the ammeter.
2 . The immersion cooling system of claim 1 , further comprising a voltmeter configured to measure voltage across the sampling region between the first electrode and the second electrode and wherein the microcontroller is further configured to sweep one or more stimulus signals from the direct current (DC) source and the alternating current (AC) stimulus through a range of voltages and receive the measured voltage and, based on the measured voltage and the measured current, record a plurality of impedance data points from the one or more stimulus signal sweeps.
3 . The immersion cooling system of claim 1 , wherein and the stimulus signal includes a static voltage.
4 . The immersion cooling system of claim 3 , wherein the stimulus signal further comprises a swept sine wave superimposed on the static voltage.
5 . The immersion cooling system of claim 4 , further comprising a voltmeter configured to measure voltage across the first electrode and the second electrode and wherein the microcontroller is further configured to sweep one or more stimulus signals from the direct current (DC) source and the alternating current (AC) stimulus through a range of voltages and receive the measured voltage and, based on the measured voltage and the measured current, record a plurality of impedance data points from one or more stimulus signal sweeps.
6 . The immersion cooling system of claim 1 , wherein the first electrode and the second electrode are located within the immersion chamber.
7 . The immersion cooling system of claim 1 , further comprising a condenser wherein the first electrode and the second electrode are located within the condenser.
8 . The immersion cooling system of claim 1 , further comprising a return conduit connected to the immersion chamber wherein the first electrode and the second electrode are located within the return conduit.
9 . The immersion cooling system of claim 1 , further comprising a heat generating component proximate to a cooling volume wherein the first electrode and the second electrode are located in the cooling volume proximate the heat-generating component.
10 . The immersion cooling system of claim 1 , wherein the first electrode and the second electrode constitute a first electrochemical sensor; and wherein the immersion cooling system further comprises a second electrochemical sensor positioned within the immersion chamber and in communication with the microcontroller.
11 . A method of determining contaminant concentration in an immersion working fluid using the immersion cooling system of claim 1 , the method comprising:
circulating the immersion working fluid in the immersion cooling system;
positioning the sample portion of the immersion working fluid in the sampling region between the first electrode and the second electrode;
applying a stimulus signal with a static voltage across the sampling region with the first electrode and second electrode;
varying a frequency of the stimulus signal;
measuring a first output signal across the sampling region; and
determining a first concentration of a contaminant based at least partially on the measured first output signal.
12 . The method of claim 11 , wherein the determining the first concentration of the contaminant includes inputting the measured first output signal into a machine learning (ML) model.
13 . The method of claim 11 , wherein the varying the frequency of the input signal includes changing a DC signal by superimposing the DC signal with an AC stimulus.
14 . The method of claim 11 , wherein the positioning the sample portion of the immersion working fluid in the sampling region between the first electrode and the second electrode includes flowing the sample portion of the immersion working fluid through a return conduit.
15 . The method of claim 11 , wherein the circulating the immersion working fluid in the immersion cooling system includes vaporizing at least a portion of the immersion working fluid.
16 . The method of claim 11 , wherein the first electrode and the second electrode constitute a first electrochemical sensor at a first location in the immersion cooling system, the method further comprising:
measuring a second output signal with a second electrochemical sensor at a second location in the immersion cooling system.
17 . The method of claim 16 , further comprising determining a second concentration of the contaminant at a second time based at least partially on the measured second output signal.
18 . The method of claim 11 , wherein the determining the first concentration of the contaminant based at least partially on the measured first output signal comprises using the microcontroller in communication with the first electrode and second electrode, the method further comprising remediating the immersion working fluid based at least partially on the first concentration of the contaminant using the microcontroller.
19 . The method of claim 18 , wherein the remediating the immersion working fluid based at least partially on the first concentration of the contaminant using the microcontroller includes adding uncontaminated immersion working fluid to the immersion cooling system by opening a valve.
20 . The method of claim 18 , wherein the remediating the immersion working fluid based at least partially on the first concentration of the contaminant using the microcontroller includes removing at least a portion of the immersion working fluid from the immersion cooling system by opening a valve.