Matrix for ceramic-containing materials
A ceramic-containing material, comprising a substrate comprising a ceramic material; an interface coating layer disposed on the ceramic material; and a crystalline matrix disposed on the interface coating layer, the crystalline matrix being substantially free of an amorphous phase and comprising a boron-doped material having a boron dopant present in an amount of less than approximately 10 atomic weight percent.
1 . A ceramic-containing material, comprising:
a substrate comprising a ceramic material;
an interface coating layer disposed on the ceramic material; and
a crystalline matrix disposed on the interface coating layer, the crystalline matrix being substantially free of an amorphous phase and comprising a boron-doped material having a boron dopant present in an amount of less than approximately 10 atomic percent.
2 . The ceramic-containing material of claim 1 , wherein the boron dopant present comprises approximately 2 atomic percent to approximately 10 atomic percent.
3 . The ceramic-containing material of claim 2 , wherein the boron dopant present comprises approximately 5 atomic percent to approximately 10 atomic percent.
4 . The ceramic-containing material of claim 1 , further comprising an interface protective coating layer disposed between the interface coating layer and the crystalline matrix.
5 . The ceramic-containing material of claim 4 , wherein the interface protective coating layer comprises a thickness of approximately 0.5 μm to approximately 2 μm.
6 . The ceramic-containing material of claim 4 , wherein the interface protective coating layer comprises silicon carbide.
7 . The ceramic-containing material of claim 1 , further comprising a seal coating layer disposed on the crystalline matrix and opposite an interface protective coating layer.
8 . The ceramic-containing material of claim 7 , wherein the seal coating layer comprises a thickness of approximately 1 μm to approximately 10 μm.
9 . The ceramic-containing material of claim 7 , wherein the seal coating layer comprises silicon carbide.
10 . The ceramic-containing material of claim 1 , wherein the boron dopant is dispersed throughout the crystalline matrix.
11 . The ceramic-containing material of claim 1 , wherein the boron dopant is graded throughout the crystalline matrix.
12 . The ceramic-containing material of claim 11 , wherein the boron dopant is present at a greater concentration proximate to the interface coating layer.
13 . The ceramic-containing material of claim 11 , wherein the boron dopant is present at a greater concentration opposite the interface coating layer.
14 . The ceramic-containing material of claim 1 , wherein the crystalline matrix comprises a thickness of approximately 50 am to approximately 200 μm.
15 . The ceramic-containing material of claim 1 , wherein the crystalline matrix comprises a boron-doped carbide-containing material.
16 . The ceramic-containing material of claim 15 , wherein the boron-doped carbide-containing material comprises a boron-doped silicon carbide.
17 . The ceramic-containing material of claim 1 , wherein the ceramic material comprises any one or more of the following: a ceramic fiber, a ceramic tow, a ceramic preform, and combinations thereof.
18 . The ceramic-containing material of claim 1 , wherein the amorphous phase comprises less than 5% by weight of the crystalline matrix.
19 . A gas turbine engine, comprising:
a fan section, a compressor section, a combustor section, a turbine section, an outer casing disposed radially outside of the compressor section, combustor section, and the turbine section, and a core gas path that extends through the compressor section, the combustor section, and the turbine section; and
at least one gas turbine engine component comprising:
a substrate comprising a ceramic material;
an interface coating layer disposed on the ceramic material; and
a crystalline matrix disposed on the interface coating layer, the crystalline matrix being substantially free of an amorphous phase and comprising a boron-doped material having a boron dopant present in an amount of less than approximately 10 atomic percent.