IP Library Granted Patent US 12,583,798
Granted Patent B2
US 12,583,798 · App. 18/108,929 · Granted Mar 24, 2026

Atomic layer deposition method enhancing the nucleation and crystallinity of a boron nitride interface coating on a silicon carbide fiber

Inventor: John E. Holowczak (South Windsor, CT)
Assignee: RTX Corporation
C04B35/62281C04B35/62868C04B35/62876C04B41/4578C23C16/45525C04B2235/386C04B2235/408C04B2235/5244C04B2235/614C04B2235/76
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Quick Facts
Patent No.
US 12,583,798
App. No.
18/108,929
Granted
Mar 24, 2026
Kind
B2
Abstract

A method of forming a ceramic matrix composite includes arranging a plurality of fibers into a preform, each of the plurality of fibers being formed from silicon carbide, depositing a nucleating layer on the plurality of fibers, the nucleating layer comprising a crystalline material having an a-lattice constant and a c-lattice constant, and depositing a boron nitride layer on the nucleating layer. The c-lattice constant of the crystalline material of the nucleating layer corresponds to an a-lattice constant of the silicon carbide, such that the c-lattice constant of the crystalline material is within 3.0% of the a-lattice constant of the silicon carbide.

Claims (26)

1 . A method of forming a ceramic matrix composite, the method comprising:

arranging a plurality of fibers into a preform, each of the plurality of fibers being formed from silicon carbide;

depositing a nucleating layer on the plurality of fibers, the nucleating layer comprising a crystalline material having an a-lattice constant and a c-lattice constant, wherein the crystalline material comprises ruthenium; and

depositing a boron nitride layer on the nucleating layer;

wherein the c-lattice constant of the crystalline material of the nucleating layer corresponds to an a-lattice constant of the silicon carbide, such that the c-lattice constant of the crystalline material is within 3.0% of the a-lattice constant of the silicon carbide.

2 . The method of claim 1 , wherein the boron nitride layer comprises an amount of hexagonal boron nitride, the hexagonal boron nitride having an a-lattice constant corresponding to the a-lattice constant of the crystalline material of the nucleating layer, such that the a-lattice constant of hexagonal boron nitride is within 8.0% of the a-lattice constant of the crystalline material.

3 . The method of claim 1 , wherein the boron nitride layer further comprises an amount of turbostratic boron nitride, the turbostratic boron nitride having an a-lattice constant corresponding to the a-lattice constant of the crystalline material of the nucleating layer, such that the a-lattice constant of turbostratic boron nitride is within 8.0% of the a-lattice constant of the crystalline material.

4 . The method of claim 1 , wherein the a-lattice constant of ruthenium is 2.7 angstroms, and wherein the c-lattice constant of ruthenium is 4.3 angstroms.

5 . The method of claim 4 , wherein the a-lattice constant of hexagonal boron nitride ranges from 2.5 angstroms to 2.9 angstroms.

6 . The method of claim 4 , wherein the silicon carbide is β-silicon carbide.

7 . The method of claim 6 , wherein the c-lattice constant of the B-silicon carbide is 4.4 angstroms.

8 . The method of claim 2 , wherein the nucleating layer is deposited using atomic layer deposition.

9 . The method of claim 2 , wherein the boron nitride layer is deposited using chemical vapor infiltration.

10 . The method of claim 2 , wherein the nucleating layer is deposited such that it has a uniform thickness ranging from 2 nanometers to 20 nanometers.

11 . The method of claim 10 , wherein the thickness ranges from 5 nanometers to 10 nanometers.

12 . The method of claim 2 and further comprising: densifying the preform with a ceramic matrix.

13 . The method of claim 12 , wherein densifying the preform comprises at least one of: chemical vapor infiltration, slurry infiltration, melt infiltration, and polymer infiltration and pyrolysis.

14 . The method of claim 12 and further comprising: prior to the step of densifying the preform, depositing a further layer on the boron nitride layer comprising at least one of: silicon-doped boron nitride, silicon nitride, carbon, silicon carbide, and boron nitride.

15 . A method of forming a ceramic matrix composite, the method comprising:

arranging a plurality of fibers into a preform, each of the plurality of fibers being formed from silicon carbide;

depositing a nucleating layer on the plurality of fibers, the nucleating layer comprising a crystalline material comprising ruthenium, the crystalline material having an a-lattice constant and a c-lattice constant; and

depositing a boron nitride layer on the nucleating layer, the boron nitride comprising hexagonal boron nitride and turbostratic boron nitride;

wherein the a-lattice constant of the crystalline material of the nucleating layer corresponds to an a-lattice constant of each of the hexagonal boron nitride and turbostratic boron nitride, such that the a-lattice constant of the crystalline material is within 8.0% of the a-lattice constant of each of the hexagonal boron nitride and turbostratic boron nitride.

16 . The method of claim 15 , wherein the c-lattice constant of the crystalline material of the nucleating layer corresponds to an a-lattice constant of the silicon carbide, such that the c-lattice constant of the crystalline material is within 3.0% of the a-lattice constant of the silicon carbide.

17 . The method of claim 16 , wherein the silicon carbide is β-silicon carbide.

18 . The method of claim 15 and further comprising: densifying the preform with a ceramic matrix.

Assignments (2)
CHANGE OF NAME Recorded Jul 27, 2023
From: RAYTHEON TECHNOLOGIES CORPORATION
To: RTX CORPORATION
Reel/Frame 064402/0837 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 13, 2023
From: HOLOWCZAK, JOHN E.
To: RAYTHEON TECHNOLOGIES CORPORATION
Reel/Frame 062675/0646 →
Continuity (1)
Related Publication 20240270652A1 · Aug 15, 2024
References Cited (5)
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