Vapor chamber system
A vapor chamber system, includes a heat source and a vapor chamber device. The vapor chamber device includes a first casing, a second casing, a second capillary structure and a third capillary structure. The first casing includes a first plate, and a first capillary structure. The second casing is stacked on the first casing. The second capillary structure is disposed between the first capillary structure and the supporting posts of the second casing. The third capillary structure is disposed at a zone of the inner surface of the first plate, the zone is within a projection of the heat source projected onto the inner surface, and an area of the zone is smaller than an area of the projection of the heat source.
1 . A vapor chamber system, comprising:
a heat source;
a vapor chamber device, comprising:
a first casing comprising a first plate, a first capillary structure at an inner surface of the first plate, and a first lateral wall protruding from the inner surface and surrounding the first capillary structure, wherein the heat source is in contact with an outer surface of the first plate;
a second casing stacked on the first casing and comprising a second plate, a plurality of supporting posts protruding from the second plate, and a second lateral wall protruding from the second plate and surrounding the supporting posts, wherein the supporting posts face towards the first capillary structure, and the first lateral wall is connected to the second lateral wall;
a second capillary structure disposed between the first capillary structure and the supporting posts of the second casing, wherein the supporting posts abut against the second capillary structure; and
a third capillary structure disposed at a zone of the inner surface of the first plate, wherein the third capillary structure comprises metal powders or non-woven metal wool, the zone is within a projection of the heat source projected onto the inner surface, and an area of the zone is smaller than an area of the projection of the heat source.
2 . The vapor chamber system according to claim 1 , wherein the first capillary structure comprises a plurality of trenches formed between a plurality of protruding bars, the third capillary structure is only filled in a part of the trenches corresponding to the zone.
3 . The vapor chamber system according to claim 1 , wherein the first capillary structure is not disposed in the zone, the first casing comprises a plurality of supporters disposed in the zone, and the third capillary structure surrounds the supporters.
4 . The vapor chamber system according to claim 1 , wherein the third capillary structure is only disposed between the inner surface of the first plate and the second capillary structure, the third capillary structure is not filled into the second capillary structure.
5 . The vapor chamber system according to claim 1 , wherein a part of the first capillary structure is disposed in the zone where the third capillary structure is located, the first casing comprises a plurality of supporters disposed in the zone, the third capillary structure surrounds the supporters, and the supporters contacts the part of the first capillary structure in the zone.
6 . The vapor chamber system according to claim 1 , wherein a ratio of the area of the zone to the area of the projection of the heat source is between 0.001˜0.5.
7 . The vapor chamber system according to claim 1 , wherein a ratio of the area of the zone to the area of the projection of the heat source is between 0.05˜0.2.