Connecting semicondcutor device assembly components using interconnect dies with spacer component coupled to a portion of an interconnect die
A semiconductor package assembly includes a die having a front surface and a back surface opposite to and parallel to the front surface. A first portion of a front surface of an interconnect die is coupled to a portion of the back surface of the die. The interconnect die includes a connectivity region that is coupled to one or more through-die vias in the die through the back surface of the die. A spacer component is coupled to a second portion of the front surface of the interconnect die. The spacer component includes conductive connections, with one or more of the conductive connections are coupled to the conductive pathways of the connectivity region of the interconnect die.
1 . A semiconductor assembly comprising:
a die having a front surface and a back surface opposite to and parallel to the front surface;
an interconnect die, where a first portion of a front surface of the interconnect die is coupled to a portion of the back surface of the die and the interconnect die including a connectivity region having conductive pathways and the connectivity region coupled to one or more through-die vias in the die through the back surface of the die;
a conductive trace layer comprising a plurality of conductive traces included in a dielectric material, the plurality of conductive traces perpendicular to the conductive connections of a spacer component and coupled to one or more of conductive connections of the spacer component; and
the spacer component is separate from the die and coupled to a second portion of the front surface of the interconnect die,
the spacer component including one or more conductive connections coupled to one or more of the conductive pathways of the connectivity region of the interconnect die, wherein
the spacer component has a thickness that is substantially the same as a distance between the front surface of the interconnect die and a topmost surface of the plurality of conductive traces.
2 . The semiconductor assembly of claim 1 , wherein the conductive trace layer does not include at least one active component.
3 . The semiconductor assembly of claim 1 , further comprising:
a component coupled to at least a set of the plurality of conductive traces.
4 . The semiconductor assembly of claim 3 , wherein the component comprises a memory.
5 . The semiconductor assembly of claim 1 , further comprising:
an additional spacer component including additional conductive connections perpendicular to the plurality of conductive traces, one or more of the additional conductive connections coupled to one or more conductive traces of the plurality of conductive traces; and
an additional interconnect die having an additional connectivity region including additional conductive pathways perpendicular to the additional conductive connections, one or more of the additional conductive pathways coupled to one or more of the additional conductive connections.
6 . The semiconductor assembly of claim 5 , further comprising:
an additional die having an additional front surface and an additional back surface parallel to and opposite to the additional front surface, one or more additional through-die vias in the additional die coupling a portion of the additional back surface to one or more of the additional conductive pathways of the additional connectivity region of the additional interconnect die.
7 . The semiconductor assembly of claim 1 , wherein the conductive connections comprise through silicon vias.
8 . The semiconductor assembly of claim 1 , wherein the interconnect die is hybrid bonded to the die.
9 . The semiconductor assembly of claim 1 , wherein the spacer component comprises a dielectric material.
10 . The semiconductor assembly of claim 9 , wherein the spacer component does not include at least one active component.
11 . The semiconductor assembly of claim 1 , wherein the front surface of the die is configured to be coupled to a substrate and the front surface of the die is not partially obstructed by the interconnect die.
12 . The semiconductor assembly of claim 1 , further comprising:
an additional die having an additional front surface and an additional back surface parallel to and opposite to the additional front surface; and
an additional spacer component contacting the additional back surface of the additional die and one or more conductive portions of the additional die coupled to one or more of conductive connections of the additional spacer component.
13 . The semiconductor assembly of claim 12 , wherein the additional die has a height less than a height of the die.
14 . The semiconductor assembly of claim 12 , wherein the additional die has a different temperature constraint than the die.
15 . A method comprising:
coupling a first portion of a connectivity region of a front surface of an interconnect die to one or more through-die vias on a back surface of a die, the back surface of the die opposite to and parallel to a front surface of the die, the connectivity region having conductive pathways; and
coupling a spacer component to a second portion of the front surface of the interconnect die, the spacer component including conductive connections, one or more of which are coupled to one or more of the conductive pathways of the connectivity region of the interconnect die; and
coupling one or more of the conductive connections of the spacer component to a plurality of conductive traces included in a conductive trace layer, the plurality of conductive traces included in a dielectric material and are perpendicular to the conductive connections, wherein
the spacer component has a thickness that is substantially the same as a distance between the front surface of the interconnect die and a topmost surface of the plurality of conductive traces.
16 . The method of claim 15 , further comprising: coupling a component to at least a set of the conductive traces.
17 . The method of claim 15 , wherein the spacer component has a thickness based on a distance between the front surface of the interconnect die and a surface of the plurality of conductive traces.