Granted Patent B2

US 12,597,586 · App. 17/175,724 · Granted Apr 7, 2026

Inventors: Sho Sato (Miyagi, JP); Ken Yoshida (Miyagi, JP)

Assignee: TOKYO ELECTRON LIMITED

H01J37/32183

Abstract

Claims (14)

1 . A plasma processing apparatus comprising:

a chamber configured to perform a plasma processing on a target substrate;

an electrode provided in the chamber and configured to supply a radio-frequency power to the chamber for the plasma processing in the chamber;

a radio-frequency power supply electrically connected to the electrode and configured to generate the radio-frequency power supplied to the electrode; and

a matching box connected between the radio-frequency power supply and the electrode and configured to set a load impedance on a load side of the radio-frequency power supply,

wherein the radio-frequency power supply is configured to supply one of a modulated wave and a continuous wave of the radio-frequency power to the electrode in a preceding period of two consecutive periods, and supply a remaining one of the modulated wave and the continuous wave to the electrode in a subsequent period of the two consecutive periods, wherein the continuous wave is a wave with a steady unchanged power level and the modulated wave is a wave where two power levels are alternately and periodically repeated,

the radio-frequency power supply generates the modulated wave so that a power level of the radio-frequency power in a first sub-period of alternating first sub-period and second sub-period is higher than a power level of the radio-frequency power in the second sub-period, and

the matching box is configured to gradually change the load impedance to a target impedance for the subsequent period by gradually changing the load impedance during a period in which the continuous wave is supplied out of the two consecutive periods,

wherein the matching box is configured to gradually change the load impedance so that an absolute value of a reflectance coefficient of the radio-frequency power is gradually changed to a set target value for the subsequent period during the period in which the continuous wave is supplied, and

wherein the matching box is configured to gradually and step-wise change the absolute value of the reflectance coefficient to the set target value for the subsequent period through a plurality of consecutive sub-periods during the period in which the continuous wave is is supplied,

a time length of each of the plurality of sub-periods is set to 0.2 seconds or more, and a difference between a target value of the absolute value of the reflectance coefficient in one sub-period of any two consecutive sub-periods included in the plurality of consecutive sub-periods, and a target value of the absolute value of the reflectance coefficient in a remaining sub-period is set to or less.

2 . The plasma processing apparatus according to claim 1 , wherein the matching box is configured to gradually change the load impedance so that the absolute value of the reflectance coefficient of the radio-frequency power is gradually increased to the set target value larger than zero before the radio-frequency power supplied from the radio-frequency power supply to the electrode is switched from the continuous wave to the modulated wave.

3 . The plasma processing apparatus according to claim 2 , wherein the set target value is 0.3 or more and 0.5 or less.

4 . The plasma processing apparatus according to claim 1 , wherein the difference is set to 0.05 or less.

Assignments (1)

Priority Claims (1)

Continuity (1)

References Cited (11)