Naphthalimide sulfonate derivative, and photoacid generator and photoresist composition which comprise same
The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition which comprise same, and, more specifically, to a naphthalimide sulfonate derivative compound, and a photoacid generator and a photoresist composition which comprise same, the compound having an excellent absorbance of light with an i-line wavelength (365 nm), having a high solubility in an organic solvent, having excellent thermal stability, and exhibiting a good acid generation rate.
1 . A naphthalimide sulfonic acid derivative compound represented by the following Formula I or II:
wherein, in Formula I, R 1 is a substituted or unsubstituted aliphatic hydrocarbon group, a substituted or unsubstituted aryl group, a substituted or unsubstituted arylalkyl group, or a substituted or unsubstituted alkylaryl group; R 2 is hydrogen atom or t-butyl group;
m is an integer of 1 to 4; n is an integer of 0 to 2;
wherein, in Formula II, R 1 , m and n are the same as defined in Formula I, and R 2 is hydrogen atom.
2 . The naphthalimide sulfonic acid derivative compound of claim 1 , wherein R 1 is a C 1 -C 12 linear alkyl group or C 3 -C 12 branched alkyl group that is unsubstituted or substituted with one or more halogen atoms or alicyclic hydrocarbon group; a C 3 -C 12 alicyclic hydrocarbon group that is unsubstituted or substituted with one or more halogen atoms; a C 6 -C 20 aryl group that is unsubstituted or substituted with one or more halogen atoms; a C 7 -C 20 arylalkyl group that is unsubstituted or substituted with one or more halogen atoms or C 1 -C 12 alkylthio group; or a C 7 -C 20 alkylaryl group that is unsubstituted or substituted with one or more halogen atoms.
3 . The naphthalimide sulfonic acid derivative compound of claim 1 , wherein R 1 is methyl group, ethyl group, trifluoromethyl group, 2,2,2-trifluoroethyl group, nonafluorobutyl group or tosyl group.
4 . The naphthalimide sulfonic acid derivative compound of claim 1 , which is selected from the following compounds:
5 . A photoacid generator comprising a naphthalimide sulfonic acid derivative compound of claim 1 .
6 . A photoresist composition comprising a naphthalimide sulfonic acid derivative compound of claim 1 ; and a binder resin.