Light emitting element and method for manufacturing the same
Embodiments provide a light emitting element that includes a base layer, a first electrode disposed on the base layer, a second electrode facing the first electrode, and functional layers disposed between the first electrode and the second electrode. The first electrode includes a first layer disposed on the base layer, and a second layer disposed on the first layer and including a reflective metal. Photonic crystal pore patterns, each spaced apart along a first direction and extending along a second direction crossing the first direction, are defined between the base layer and the first layer.
1 . A light emitting element comprising:
a base layer;
a first electrode disposed on the base layer;
a second electrode facing the first electrode; and
a plurality of functional layers disposed between the first electrode and the second electrode, wherein
the first electrode includes:
a first layer disposed on the base layer; and
a second layer disposed on the first layer and including a reflective metal, and
a plurality of photonic crystal pore patterns, each spaced apart along a first direction and extending along a second direction crossing the first direction, are defined between the base layer and the first layer.
2 . The light emitting element of claim 1 , wherein the plurality of photonic crystal pore patterns each have a width in the first direction in a range of about 50 nm to about 550 nm.
3 . The light emitting element of claim 1 , wherein the plurality of photonic crystal pore patterns each have a height in a third direction crossing each of the first direction and the second direction in a range of about 20 nm to about 110 nm.
4 . The light emitting element of claim 1 , wherein the first electrode further comprises a third layer disposed on the second layer and including a transparent conductive oxide.
5 . The light emitting element of claim 4 , wherein an upper surface of the third layer is a flat surface.
6 . The light emitting element of claim 1 , wherein the plurality of photonic crystal pore patterns is each in a vacuum state.
7 . The light emitting element of claim 1 , wherein the first layer comprises:
a first portion disposed between the plurality of photonic crystal pore patterns; and
a second portion extending from the first portion and disposed on the plurality of photonic crystal pore patterns.
8 . The light emitting element of claim 7 , wherein the second layer comprises:
a third portion disposed on the first portion; and
a fourth portion extending from the third portion and disposed on the second portion.
9 . The light emitting element of claim 7 , wherein a thickness of the first portion and a thickness of the second portion are substantially the same.
10 . The light emitting element of claim 7 , wherein
the first portion contacts an upper surface of the base layer, and
the plurality of photonic crystal pore patterns are defined between the base layer and the second portion.
11 . The light emitting element of claim 1 , wherein
the first layer comprises indium zinc oxide, indium tin oxide, or a combination thereof, and
the second layer comprises silver (Ag), gold (Au), aluminum (Al), or a combination thereof.
12 . The light emitting element of claim 1 , wherein the plurality of functional layers comprise:
a hole transport region disposed on the first electrode;
an emission layer disposed on the hole transport region; and
an electron transport region disposed on the emission layer.
13 . The light emitting element of claim 1 , wherein an upper surface of the base layer is a flat surface.
14 . A light emitting element comprising:
a base layer;
a first electrode disposed on the base layer;
a second electrode facing the first electrode; and
a plurality of functional layers disposed between the first electrode and the second electrode, wherein
the first electrode includes:
a first layer disposed on the base layer, and having a portion thereof disposed directly on the base layer and a remaining portion thereof disposed to be spaced apart from the base layer with a void therebetween;
a second layer disposed on the first layer and including a reflective metal; and
a third layer disposed on the second layer and including a transparent conductive oxide.
15 . A method for manufacturing a display device, the method comprising:
forming a first electrode on a base layer;
forming a plurality of functional layers on the first electrode; and
forming a second electrode on the plurality of functional layers, wherein
the forming of the first electrode includes:
forming a plurality of photoresist patterns each spaced apart along a first direction on the base layer and extending in a second direction crossing the first direction;
providing a transparent conductive oxide to cover the plurality of photoresist patterns to form a first layer;
removing the plurality of photoresist patterns after the forming of the first layer; and
providing a reflective metal on the first layer to form a second layer.
16 . The method of claim 15 , wherein the forming of the first electrode further includes:
providing a transparent conductive oxide on the second layer to form a third layer.
17 . The method of claim 15 , wherein in the removing of the plurality of photoresist patterns, a plurality of photonic crystal pore patterns in a vacuum state are formed between the base layer and the first layer.
18 . The method of claim 17 , wherein
the first layer comprises:
a first portion disposed between the plurality of photonic crystal pore patterns; and
a second portion extending from the first portion and disposed on the plurality of photonic crystal pore patterns, and
the first portion contacts an upper surface of the base layer, and
the plurality of photonic crystal pore patterns are defined between the base layer and the second portion.
19 . The method of claim 15 , wherein
the transparent conductive oxide comprises indium zinc oxide, indium tin oxide, or a combination thereof, and
the reflective metal comprises silver (Ag), gold (Au), aluminum (Al), or a combination thereof.
20 . The method of claim 15 , wherein the forming of the plurality of photoresist patterns is performed through laser interference lithography.