In-chamber metrology of substrates for process characterization and improvement
A method includes receiving, by a processing device, first data generated by a first sensor of a substrate processing system. The first data is generated responsive to the first sensor receiving electromagnetic radiation from a substrate held by a robot arm of a transfer chamber in the substrate processing system. The method further includes processing the first data to obtain second data. The second data includes a first indication of performance of the substrate processing system. The method further includes causing, in view of the second data, performance of a corrective actions associated with the substrate processing system.
1 . A method, comprising:
receiving, by a processing device, first data generated by a first sensor of a substrate processing system, the first data having been generated responsive to the first sensor receiving electromagnetic radiation from a substrate held by a robot arm of a transfer chamber in the substrate processing system while the substrate is being moved by the robot arm;
processing the first data to obtain second data, wherein the second data comprises a first indication of performance of the substrate processing system;
receiving third data from the first sensor, wherein the first data is associated with a first portion of the substrate and the third data is associated with a second portion of the substrate;
processing the third data to obtain fourth data, wherein the fourth data comprises a second indication of performance of the substrate processing system; and
causing, in view of the second data and the fourth data, performance of a corrective action associated with the substrate processing system.
2 . The method of claim 1 , wherein the first data comprises spectral data, and wherein the second data comprises an indication of a thickness of the substrate.
3 . The method of claim 1 , wherein the second data comprises an indication of conditions under which the substrate had been processed by the substrate processing system.
4 . The method of claim 1 , wherein the first sensor receives the electromagnetic radiation from the substrate while the robot arm is transferring the substrate from a first region of the substrate processing system to a second region of the substrate processing system.
5 . The method of claim 1 , further comprising:
generating a profile of the substrate in view of the third data and the fourth data.
6 . The method of claim 1 , further comprising:
receiving a signal from an object detection apparatus, the signal indicating presence of the substrate at a first location of the substrate processing system; and
triggering an operation of the first sensor responsive to receiving the signal from the object detection apparatus, wherein triggering an operation of the first sensor comprises causing the first sensor to detect electromagnetic radiation from the substrate at a target time, the target time being based on (i) a time at which the object detection apparatus indicated presence of the substrate at the first location and (ii) a speed at which the substrate is being transferred by the robot arm.
7 . The method of claim 1 , further comprising:
receiving fifth data generated by one or more additional sensors of the substrate processing system, wherein the first sensor and the one or more additional sensors form an array of sensors, the fifth data having been generated responsive to the one or more additional sensors receiving electromagnetic radiation from one or more regions of the substrate different from a region of the substrate from which the first sensor received electromagnetic radiation; and
processing the fifth data to obtain sixth data, wherein the sixth data comprises a third indication of performance of the substrate processing system.
8 . The method of claim 1 , further comprising:
receiving fifth data generated by a second sensor of the substrate processing system; and
processing the fifth data to obtain sixth data, wherein the sixth data comprises a third indication of performance of the substrate processing system, and wherein the first sensor is to receive electromagnetic radiation of a first range of wavelengths, and wherein the second sensor is to receive electromagnetic radiation of a second range of wavelengths.
9 . The method of claim 8 , wherein the sixth data comprises temperature data of the substrate, and wherein the first sensor is configured to receive radiation reflected from the substrate.
10 . The method of claim 1 , further comprising:
receiving a plurality of sensor data associated with a first plurality of substrates after the first plurality of substrates have been processed by an etch process or a deposition process;
receiving a plurality of data indicative of processing conditions of the first plurality of substrates; and
training a machine learning model by providing the plurality of sensor data to the machine learning model as training input and providing the plurality of data indicative of processing conditions to the machine learning model as target output.
11 . The method of claim 1 , wherein processing the first data to obtain second data comprises providing the first data to a trained machine learning model, wherein the trained machine learning model is configured to receive sensor data as input and generate an indication of processing conditions of the substrate as output.
12 . A substrate processing system, comprising:
a process chamber;
a transfer chamber coupled to the process chamber;
a robot arm of the transfer chamber configured to transfer a substrate between the process chamber and the transfer chamber;
a first sensor having a first field of view, wherein at least a portion of the first field of view includes at least a portion of the substrate as the substrate is transferred to or from the process chamber by the robot arm, wherein the first sensor is to receive electromagnetic radiation that has interacted with the substrate;
a pyrometer; and
a processing device to process data, the data generated responsive to the first sensor receiving electromagnetic radiation, to determine at least one of (i) one or more indications of performance of the substrate processing system or (ii) one or more properties of the substrate.
13 . The substrate processing system of claim 12 , further comprising a source of electromagnetic radiation, wherein the first sensor comprises an electromagnetic probe, and wherein the electromagnetic probe is disposed to receive electromagnetic radiation generated by the source that has interacted with the substrate.
14 . The substrate processing system of claim 13 , wherein the electromagnetic radiation that has interacted with the substrate comprises electromagnetic radiation reflected from a surface of the substrate.
15 . The substrate processing system of claim 13 , wherein the electromagnetic radiation that has interacted with the substrate comprises electromagnetic radiation transmitted through the substrate.
16 . The substrate processing system of claim 12 , wherein the first sensor is to receive infrared radiation emitted by the substrate.
17 . The substrate processing system of claim 12 , further comprising one or more additional sensors, the first sensor and the one or more additional sensors comprising an array of sensors, a second sensor of the array of sensors having a second field of view, wherein the second field of view includes a second portion of the substrate, different from the at least a portion of the substrate included in the first field of view.
18 . The substrate processing system of claim 12 , wherein the processing device is to process data comprising:
first data associated with electromagnetic radiation received by the first sensor from a first region of the substrate at a first time; and
second data associated with electromagnetic radiation received by the first sensor from a second region of the substrate at a second time, wherein the first region is different from the second region.
19 . The substrate processing system of claim 12 , wherein the first sensor is to receive electromagnetic radiation reflected from the substrate and the pyrometer is to receive electromagnetic radiation emitted from the substrate.
20 . A non-transitory machine readable storage medium storing instructions which, when executed, cause a processing device to perform operations comprising:
receiving first data generated by a first sensor of a substrate processing system, the first data having been generated responsive to the first sensor receiving electromagnetic radiation from a substrate held by a robot arm of a transfer chamber in the substrate processing system while the substrate is being moved by the robot arm;
processing the first data to obtain second data, wherein the second data comprises first one or more property values of the substrate;
receiving third data from the first sensor, wherein the first data is associated with a first portion of the substrate and the third data is associated with a second portion of the substrate;
processing the third data to obtain fourth data, wherein the fourth data comprises second one or more property values of the substrate; and
causing, in view of the second data, performance of a corrective action associated with the substrate processing system.
21 . The non-transitory machine readable storage medium of claim 20 , wherein the operations further comprise:
receiving fifth data generated by the first sensor of the substrate processing system; and
processing the fifth data to obtain third one or more property values of the substrate, wherein:
the first data, the fifth data, and the third data are each generated responsive to the first sensor receiving electromagnetic radiation from the substrate while the substrate is being transferred by the robot arm;
the first data corresponds to a first spatial region of the substrate, the third data corresponds to a second spatial region of the substrate, and the fifth data corresponds to a third spatial region of the substrate; and
the first spatial region is different from the second spatial region, and the third spatial region is different from the first and second spatial regions.
22 . The non-transitory machine readable storage medium of claim 21 , wherein the robot arm is configured to transfer the substrate according to a first trajectory and a second trajectory, wherein:
the first trajectory causes a first portion of the substrate to intersect with a field of view of the first sensor;
the second trajectory causes a second portion of the substrate to intersect with the field of view of the first sensor;
the first portion includes the first spatial region; and
the second portion includes the second spatial region.
23 . The non-transitory machine readable storage medium of claim 20 , wherein processing the first data to obtain second data is performed in view of at least one of:
an angle of a surface of the substrate with respect to an optical axis of the first sensor; or
a distance of the surface of the substrate from one or more components of the first sensor.
24 . The non-transitory machine readable storage medium of claim 20 , wherein the operations further comprise:
receiving fifth data generated by a second sensor of the substrate processing system, the fifth data having been generated responsive to the second sensor receiving electromagnetic radiation from the substrate; and
processing the fifth data to obtain sixth data, wherein the sixth data comprises an indication of a temperature of the substrate, and wherein the first sensor is to receive electromagnetic radiation of a first range of wavelengths and the second sensor is to receive electromagnetic radiation of a second range of wavelengths.