Second harmonic generation element and light source device
A second harmonic generation element includes a substrate, a first multilayer film reflecting mirror, a second harmonic generation layer, and a second multilayer film reflecting mirror. The first multilayer film reflecting mirror is formed on the substrate. The second harmonic generation layer is disposed on the first multilayer film reflecting mirror. The second harmonic generation layer is made of a SrB 4 O 7 crystal that receives a fundamental wave with a predetermined wavelength and emits a second harmonic wave with a wavelength in an ultraviolet region. The second multilayer film reflecting mirror is formed on the second harmonic generation layer. The second multilayer film reflecting mirror constitutes a resonator with the first multilayer film reflecting mirror.
1 . A second harmonic generation element comprising:
a substrate;
a first multilayer film reflecting mirror formed on the substrate;
a second harmonic generation layer disposed on the first multilayer film reflecting mirror, the second harmonic generation layer being made of a SrB 4 O 7 crystal that receives a fundamental wave with a predetermined wavelength and emits a second harmonic wave with a wavelength in an ultraviolet region; and
a second multilayer film reflecting mirror formed on the second harmonic generation layer, the second multilayer film reflecting mirror constituting a resonator with the first multilayer film reflecting mirror.
2 . The second harmonic generation element according to claim 1 , wherein
the second harmonic wave has a wavelength of 240 nm or less.
3 . The second harmonic generation element according to claim 1 , wherein
between the first multilayer film reflecting mirror and the second harmonic generation layer, a thin film layer having a configuration that differs only in thickness from one pair of thin film pairs constituting the first multilayer film reflecting mirror is formed.
4 . The second harmonic generation element according to claim 1 , wherein
the first multilayer film reflecting mirror and the second multilayer film reflecting mirror are formed by alternately laminating thin films made of HfO 2 and thin films made of SiO 2 .
5 . The second harmonic generation element according to claim 1 , wherein
the first multilayer film reflecting mirror and the second multilayer film reflecting mirror are formed by alternately laminating thin films made of MgO and thin films made of SiO 2 .
6 . A light source device comprising:
the second harmonic generation element according to claim 1 ; and
a laser light source made of a III-V group nitride semiconductor that emits the fundamental wave toward an upper surface of the second multilayer film reflecting mirror of the second harmonic generation element or a lower surface of the substrate.
7 . The light source device according to claim 6 , wherein
the first multilayer film reflecting mirror and the second multilayer film reflecting mirror of the second harmonic generation element are configured such that the second harmonic wave is emitted to outside from the second multilayer film reflecting mirror.
8 . The light source device according to claim 6 , wherein
the substrate has translucency, and
the first multilayer film reflecting mirror and the second multilayer film reflecting mirror of the second harmonic generation element are configured such that the fundamental wave is incident on the first multilayer film reflecting mirror from the substrate and the second harmonic wave is emitted to outside from the second multilayer film reflecting mirror.