Compact silicon qubit cell with embedded readout
A quantum device is disclosed having an LC resonator circuit for performing qubit measurement or readout. The device comprises a silicon layer ( 601 ), a dielectric layer ( 603 ) disposed upon and forming a functional interface with the silicon layer ( 601 ), a first metallic region ( 614 ) disposed upon the dielectric layer 603 , and a second metallic region ( 624 ) disposed upon the dielectric layer 603 and laterally separated from the first metallic region ( 614 ). The first and second metallic regions ( 614, 624 ) are arranged to be electrically connected such that a double quantum dot, forming a qubit having a first state and a second state, can be induced beneath the first and second metallic regions ( 614, 624 ) at the functional interface. The double quantum dot provides a capacitor C 1 in the LC resonator circuit and the capacitance of the double quantum dot is dependent on the state of the qubit. The first metallic region ( 614 ) provides an inductor L 1 in the LC resonator circuit, and the resonant frequency of the LC resonator circuit is dependent on the state of the qubit such that the state of the qubit can be measured or inferred.
1 . A quantum device having an LC resonator circuit for performing qubit measurement or readout, the device comprising:
a semiconductor layer;
a dielectric layer disposed upon and forming a functional interface with the semiconductor layer;
a first metallic region disposed upon the dielectric layer; and
a second metallic region disposed upon the dielectric layer and laterally separated from the first metallic region;
wherein the first and second metallic regions are arranged to be electrically connected such that a double quantum dot, forming a qubit having a first state and a second state, can be induced beneath the first and second metallic regions at the functional interface;
wherein the double quantum dot provides a capacitor in the LC resonator circuit and the capacitance of the double quantum dot is dependent on the state of the qubit;
wherein the first metallic region provides an inductor in the LC resonator circuit; and
wherein the resonant frequency of the LC resonator circuit is dependent on the state of the qubit such that the state of the qubit can be measured or inferred.
2 . A quantum device according to claim 1 , wherein the first metallic region comprises a superconductor.
3 . A quantum device according to claim 1 , further comprising:
a power source configured to supply power at a frequency corresponding to a resonant frequency of the LC resonator circuit; and
a probe connected to the first and/or second metallic region and configured to measure the power transmission through the LC resonator circuit to infer the state of the qubit.
4 . A quantum device according to claim 1 , wherein the first metallic region provides a first inductor in the LC resonator circuit and the second metallic region provides a second inductor in the LC resonator circuit.
5 . A quantum device according to claim 1 , further comprising a masking layer covering the first metallic region.
6 . A quantum device according to claim 1 , wherein the semiconductor layer comprises a nanowire, and wherein the first and second metallic regions are laterally separated along the longitudinal axis of the nanowire.
7 . A quantum device according to claim 1 , wherein the dielectric layer comprises a thin region and a thick region and wherein the functional interface is formed between the semiconductor layer and the thin region of the dielectric layer.
8 . A method for performing qubit measurement or readout using the device according to claim 1 , comprising the steps of:
applying first and second bias potentials to the first and second metallic regions respectively to induce a double quantum dot, forming a qubit having a first state and a second state, beneath the first and second metallic regions at the functional interface, wherein the first and second bias potentials are substantially the same;
applying a signal to the first metallic region with a selected frequency;
applying a bias difference between the first and second metallic regions; and
measuring the power transmission at the first or second metallic region, wherein the measurement is used to measure or infer the state of the qubit.
9 . A method according to claim 8 , wherein the selected frequency is the resonant frequency of the circuit when the capacitance of the double quantum dot is maximum.
10 . A method according to claim 8 , wherein the method is performed at a temperature below 20 Kelvin.
11 . A quantum device according to claim 1 , wherein the semiconductor layer comprises a nanowire, and wherein the first and second metallic regions are disposed on opposing sides of the nanowire such that each of the first and second metallic regions partially overlaps one edge of the nanowire and includes respective portions that extend away from the nanowire.
12 . A quantum device according to claim 11 , further comprising:
third and fourth metallic regions disposed upon the dielectric layer;
wherein the third and fourth metallic regions are disposed on opposing sides of the nanowire such that each of the third and fourth metallic regions partially overlaps one edge of the nanowire and includes respective portions that extend away from the nanowire;
wherein the third and fourth metallic regions are laterally separated from the first and second metallic regions along the longitudinal axis of the nanowire;
wherein the first and second metallic regions are arranged to be electrically connected such that a first double quantum dot can be induced beneath the first and second metallic regions at the functional interface; and
wherein the third and fourth metallic regions are arranged to be electrically connected such that a second double quantum dot can be induced beneath the third and fourth metallic regions at the functional interface.
13 . A quantum device according to claim 12 , wherein the inductance of each of the third and fourth metallic regions is greater than the inductance of each of the first and second metallic regions.
14 . A method of assembling a quantum device according to claim 1 , comprising the steps of:
disposing a dielectric layer upon a semiconductor layer to form a functional interface; and
disposing a first metallic region upon the dielectric layer; and
disposing a second metallic region upon the dielectric layer, laterally separate from the first metallic region;
wherein the first and second metallic regions are configured to be electrically connected such that a double quantum dot, forming a qubit having a first state and a second state, can be induced beneath the first and second metallic regions at the functional interface;
wherein the double quantum dot provides a capacitor in the LC resonator circuit and the capacitance of the double quantum dot is dependent on the state of the qubit;
wherein the first metallic region provides an inductor in the LC resonator circuit; and
wherein the resonant frequency of the LC resonator circuit is dependent on the state of the qubit such that the state of the qubit can be measured or inferred.