Display device and manufacturing method thereof
According to one embodiment, a manufacturing method of a display device includes forming a first conductive oxide layer, forming a first metal layer at a first pressure, forming a second metal layer at a second pressure, forming a second conductive oxide layer, forming a resist having a predetermined shape, etching the second conductive oxide layer using the resist as a mask, retracting an end portion of the second metal layer relative to an end portion of the second conductive oxide layer and an edge of a lower surface of the first metal layer by etching the second metal layer and the first metal layer using the resist as a mask, etching the first conductive oxide layer using the resist as a mask, and removing the resist.
1 . A manufacturing method of a display device, comprising:
forming a lower electrode;
forming an organic layer located on the lower electrode and including a light emitting layer; and
forming an upper electrode located on the organic layer, wherein
the lower electrode is formed by:
forming a first conductive oxide layer;
forming a first metal layer on the first conductive oxide layer at a first pressure;
forming a second metal layer on the first metal layer at a second pressure different from the first pressure;
forming a second conductive oxide layer on the second metal layer;
forming a resist having a predetermined shape on the second conductive oxide layer;
etching the second conductive oxide layer using the resist as a mask;
retracting an end portion of the second metal layer relative to an end portion of the second conductive oxide layer and an edge of a lower surface of the first metal layer by etching the second metal layer and the first metal layer using the resist as a mask;
etching the first conductive oxide layer using the resist as a mask; and
removing the resist.
2 . The manufacturing method of claim 1 , wherein
each of the first conductive oxide layer and the second conductive oxide layer is formed of indium tin oxide (ITO) or indium zinc oxide (IZO).
3 . The manufacturing method of claim 1 , wherein
each of the first metal layer and the second metal layer is formed of silver or a silver alloy.
4 . The manufacturing method of claim 1 , wherein
the second pressure is greater than the first pressure.
5 . The manufacturing method of claim 1 , wherein
a thickness of the second metal layer is less than a thickness of the first metal layer.
6 . The manufacturing method of claim 1 , wherein
a thickness of the second conductive oxide layer is greater than a thickness of the first conductive oxide layer.
7 . The manufacturing method of claim 1 , wherein
a thickness of the first metal layer is greater than a thickness of the first conductive oxide layer.
8 . The manufacturing method of claim 1 , wherein
when the first conductive oxide layer is etched, the end portion of the second conductive oxide layer is retracted relative to the end portion of the second metal layer.
9 . The manufacturing method of claim 1 , further comprising
forming a rib which covers a peripheral portion of the lower electrode after forming the lower electrode.
10 . The manufacturing method of claim 9 , wherein
the rib is formed of an inorganic insulating material.
11 . The manufacturing method of claim 10 , further comprising
forming a partition which comprises a lower portion located on the rib and formed of a conductive material and an upper portion located on the lower portion and protruding from a side surface of the lower portion.
12 . The manufacturing method of claim 11 , further comprising:
forming the organic layer on the lower electrode; and
forming the upper electrode which covers the organic layer and is in contact with the lower portion of the partition.
13 . A display device comprising:
a substrate;
a lower electrode provided above the substrate;
an organic layer provided on the lower electrode and including a light emitting layer; and
an upper electrode provided on the organic layer, wherein
the lower electrode comprises:
a first transparent electrode;
a metal electrode provided on the first transparent electrode; and
a second transparent electrode provided on the metal electrode,
an edge of an upper surface of the metal electrode is retracted relative to an edge of a lower surface of the metal electrode, and
an end portion of the second transparent electrode is retracted relative to the edge of the upper surface of the metal electrode.
14 . The display device of claim 13 , wherein
each of the first transparent electrode and the second transparent electrode is formed of indium tin oxide (ITO) or indium zinc oxide (IZO).
15 . The display device of claim 13 , wherein
the metal electrode is formed of silver or a silver alloy.
16 . The display device of claim 13 , wherein
an end portion of the first transparent electrode is retracted relative to the edge of the lower surface of the metal electrode.
17 . The display device of claim 13 , further comprising a rib which covers a peripheral portion of the lower electrode.
18 . The display device of claim 17 , wherein
the rib is formed of an inorganic insulating material.
19 . The display device of claim 18 , further comprising a partition which comprises a lower portion located on the rib and formed of a conductive material and an upper portion located on the lower portion and protruding from a side surface of the lower portion.
20 . The display device of claim 19 , wherein
the organic layer and the upper electrode are surrounded by the partition,
a peripheral portion of the organic layer is provided on the rib, and
the upper electrode covers the organic layer and is in contact with the lower portion of the partition.