Cross flow gas delivery for particle reduction
Gas distribution apparatus comprising a backing plate and faceplate, and methods of use are described. The backing plate has a peripheral channel with a plurality of inwardly angled inlet channels extending from the peripheral channel to the front surface of the backing plate. The plurality of inwardly angled inlet channels are located in an inlet semicircle of the backing plate and spaced to form an inlet zone comprising a minor arc of a semicircle less than 160°. An outlet opening in an outlet semicircle in the range of 30° to 90° is centered opposite the center of the minor arc of the inlet semicircle.
1 . A gas distribution apparatus comprising:
a backing plate having a front surface and a back surface defining a thickness of the backing plate, a peripheral channel formed in the back surface of the backing plate, the peripheral channel having a depth from the back surface of the backing plate to a bottom surface of the peripheral channel, a plurality of inwardly angled inlet channels extending from the peripheral channel to the front surface of the backing plate at an inlet angle, the plurality of inwardly angled inlet channels located in an inlet semicircle of the backing plate and spaced to form an inlet zone comprising a minor arc of the inlet semicircle less than 160°, the backing plate having an outlet opening on an outlet semicircle of the backing plate, the outlet opening in a range of 30° to 90° of the minor arc and centered opposite a center of the minor arc of the inlet semicircle; and
a faceplate having a front surface and a back surface defining a thickness of the faceplate, the faceplate positioned adjacent to the backing plate so that there is a gap between the front surface of the backing plate and the back surface of the faceplate, the faceplate having a plurality of apertures extending through the thickness of the faceplate.
2 . The gas distribution apparatus of claim 1 , further comprising a clamping ring having an upper portion and a lower portion, the upper portion having an outer diameter greater than an outer diameter of the lower portion, the upper portion having an inner diameter sized to enclose the faceplate, the lower portion having an upper support surface configured to support the faceplate, the lower portion having an inwardly directed extension having a back surface spaced from the upper support surface, the lower portion having a plurality of spaced apertures between the back surface of the inwardly directed extension and the upper support surface.
3 . The gas distribution apparatus of claim 2 , wherein the backing plate further comprises an exhaust opening extending through the thickness of the backing plate outside an outer diameter of the peripheral channel and outside an outer diameter of the faceplate.
4 . The gas distribution apparatus of claim 3 , wherein the upper portion of the clamping ring further comprises an exhaust aperture extending from the back surface of the upper portion to a front surface of the upper portion, the exhaust aperture of the clamping ring aligned with the exhaust opening of the backing plate.
5 . The gas distribution apparatus of claim 4 , further comprising a pumping ring in contact with the back surface of the backing plate, the pumping ring having an exhaust opening aligned with the exhaust opening of the backing plate.
6 . The gas distribution apparatus of claim 1 , wherein there are at least five inwardly angled inlet channels.
7 . The gas distribution apparatus of claim 1 , wherein the plurality of inwardly angled inlet channels have outlet openings in the front surface of the backing plate, the outlet openings located equidistant from each other.
8 . The gas distribution apparatus of claim 6 , wherein there are five inwardly angled inlet channels.
9 . The gas distribution apparatus of claim 8 , wherein an inner arc between two adjacent outlet openings is 30 degrees.
10 . The gas distribution apparatus of claim 1 , wherein the peripheral channel has a depth in a range of 5 mm to 15 mm.
11 . The gas distribution apparatus of claim 10 , wherein the peripheral channel has a depth in a range of 7 mm to 9.5 mm.
12 . The gas distribution apparatus of claim 1 , wherein the plurality of inwardly angled inlet channels have a diameter in a range of 2 mm to 4 mm.
13 . The gas distribution apparatus of claim 1 , wherein the plurality of inwardly angled inlet channels connect to the peripheral channel at a depth where a center of a diameter of the plurality of inwardly angled inlet channels is in a range of 3 mm to 5 mm from the back surface of the backing plate.
14 . The gas distribution apparatus of claim 1 , wherein the plurality of inwardly angled inlet channels have an angle in a range of 15° to 40° from to the front surface of the backing plate.
15 . A gas distribution apparatus comprising:
a backing plate having a front surface and a back surface defining a thickness of the backing plate, a peripheral channel formed in the back surface of the backing plate, the peripheral channel having a depth from the back surface of the backing plate to a bottom surface of the peripheral channel, a plurality of inwardly angled inlet channels extending from the peripheral channel to the front surface of the backing plate at an inlet angle, the plurality of inwardly angled inlet channels located in an inlet semicircle of the backing plate and spaced to form an inlet zone comprising a minor arc of the inlet semicircle less than 160°, the backing plate having an outlet opening on an outlet semicircle of the backing plate, the outlet opening in a range of 30° to 90° of the minor arc and centered opposite a center of the minor arc of the inlet semicircle;
a faceplate having a front surface and a back surface defining a thickness of the faceplate, the faceplate positioned adjacent to the backing plate so that there is a gap between the front surface of the backing plate and the back surface of the faceplate, the faceplate having a plurality of apertures extending through the thickness of the faceplate; and
a clamping ring having an upper portion and a lower portion, the upper portion having an outer diameter greater than an outer diameter of the lower portion, the upper portion having an inner diameter sized to enclose the faceplate, the lower portion having an upper support surface configured to support the faceplate, the lower portion having an inwardly directed extension having a back surface spaced from the upper support surface, the lower portion having a plurality of spaced apertures between the back surface of the inwardly directed extension and the upper support surface.
16 . The gas distribution apparatus of claim 15 , wherein the backing plate further comprises an exhaust opening extending through the thickness of the backing plate outside an outer diameter of the peripheral channel and outside an outer diameter of the faceplate.
17 . The gas distribution apparatus of claim 16 , wherein the upper portion of the clamping ring further comprises an exhaust aperture extending from the back surface of the upper portion to a front surface of the upper portion, the exhaust aperture of the clamping ring aligned with the exhaust opening of the backing plate.
18 . The gas distribution apparatus of claim 15 , wherein the peripheral channel has a depth in a range of 5 mm to 15 mm.
19 . The gas distribution apparatus of claim 15 , wherein there are at least five inwardly angled inlet channels.
20 . A gas distribution apparatus comprising:
a backing plate having a front surface and a back surface defining a thickness of the backing plate, a peripheral channel formed in the back surface of the backing plate, the peripheral channel having a depth from the back surface of the backing plate to a bottom surface of the peripheral channel, a plurality of inwardly angled inlet channels extending from the peripheral channel to the front surface of the backing plate at an inlet angle, the plurality of inwardly angled inlet channels located in an inlet semicircle of the backing plate and spaced to form an inlet zone comprising a minor arc of the inlet semicircle less than 160°, the backing plate having an outlet opening on an outlet semicircle of the backing plate, the outlet opening in a range of 30° to 90° of the minor arc and centered opposite a center of the minor arc of the inlet semicircle;
a faceplate having a front surface and a back surface defining a thickness of the faceplate, the faceplate positioned adjacent to the backing plate so that there is a gap between the front surface of the backing plate and the back surface of the faceplate, the faceplate having a plurality of apertures extending through the thickness of the faceplate;
a clamping ring having an upper portion and a lower portion, the upper portion having an outer diameter greater than an outer diameter of the lower portion, the upper portion having an inner diameter sized to enclose the faceplate, the lower portion having an upper support surface configured to support the faceplate, the lower portion having an inwardly directed extension having a back surface spaced from the upper support surface, the lower portion having a plurality of spaced apertures between the back surface of the inwardly directed extension and the upper support surface; and
a pumping ring in contact with the back surface of the backing plate, the pumping ring having an exhaust opening aligned with the exhaust opening of the backing plate,
wherein the backing plate further comprises an exhaust opening extending through the thickness of the backing plate outside an outer diameter of the peripheral channel and outside an outer diameter of the faceplate,
wherein the upper portion of the clamping ring further comprises an exhaust aperture extending from the back surface of the upper portion to a front surface of the upper portion, the exhaust aperture of the clamping ring aligned with the exhaust opening of the backing plate,
wherein the inwardly angled inlet channels have outlet openings in the front surface of the backing plate, the outlet openings located equidistant from each other,
wherein there are at least five inwardly angled inlet channels,
wherein the peripheral channel has a depth in a range of 5 mm to 15 mm.