Localized heating device and localized heating system having the same
A localized heating device includes a plasma deforming portion and a heating portion. The plasma deforming portion includes an inlet end having a circular hole, an outlet end having an elongated hole with a first length and a first width, and a channel smoothly connected with the circular hole and the elongated hole. The heating portion, disposed at the outlet end, includes two control covers spaced by a slot. The elongated hole and the slot being oppositely disposed with respect to the plasma deforming portion. A plasma flow provided by a plasma producing source being to enter the channel via the circular hole, then to flow through the elongated hole, and finally to reach the slot.
1 . A localized heating device, comprising:
a plasma deforming portion, including:
an inlet end, having a circular hole, connected with a plasma producing source;
an outlet end, having an elongated hole, the elongated hole having a first length and a first width perpendicular to each other, the first length being parallel to a first direction, the first direction and an axis of the circular hole being perpendicular to each other; and
a channel, connected with the circular hole and the elongated hole; and
a heating portion, including two control covers, the two control covers being spaced to each other by a slot having a first distance, the slot having a second length parallel to the first direction, the slot being parallel to the axis and having a second width, the heating portion being disposed at the outlet end of the plasma deforming portion, the first length and the second length being parallel to each other, the elongated hole and the slot being oppositely disposed, a plasma flow provided by the plasma producing source being to enter the channel via the circular hole, then to flow through the elongated hole, and finally to reach the slot,
wherein the heating portion is adjustably engaged with the outlet end of the plasma deforming portion by being parallel to the axis, so as to vary the second width.
2 . The localized heating device of claim 1 , wherein the two control covers are furnished individually with recess portions to face each other.
3 . The localized heating device of claim 2 , wherein the two recess portions are spaced by a second distance, and the second distance is greater than the first width, and the second distance is also greater than the first distance.
4 . The localized heating device of claim 2 , wherein the two recess portions are configured as opposite rectangles, each of the recess portions has a third length parallel to the first direction and a third width parallel to the axis, the third length is greater than the first length but less than the second length, and the third width is less than the second width.
5 . The localized heating device of claim 1 , wherein a diameter of the circular hole is greater than or equal to the first length.
6 . The localized heating device of claim 1 , wherein the first length is less than the second length.
7 . A localized heating system, comprising:
a plasma producing source, providing a plasma flow;
a localized heating device, including:
a plasma deforming portion, including:
an inlet end, having a circular hole, connected with a plasma producing source;
an outlet end, having an elongated hole, the elongated hole having a first length and a first width perpendicular to each other, the first length being parallel to a first direction, the first direction and an axis of the circular hole being perpendicular to each other; and
a channel, connected with the circular hole and the elongated hole; and
a heating portion, including two control covers, the two control covers being spaced to each other by a slot having a first distance, the slot having a second length parallel to the first direction, the slot being parallel to the axis and having a second width, the heating portion being disposed at the outlet end of the plasma deforming portion, the first length and the second length being parallel to each other, the elongated hole and the slot being oppositely disposed, a plasma flow provided by the plasma producing source being to enter the channel via the circular hole, then to flow through the elongated hole, and finally to reach the slot; and
a fixture, configured for loading a workpiece, driven to displace an edge of the workpiece to enter the slot for undergoing a plasma treatment.
8 . The localized heating system of claim 7 , wherein the two control covers are furnished individually with recess portions to face each other.
9 . The localized heating system of claim 8 , wherein the two recess portions are spaced by a second distance, and the second distance is greater than the first width, and the second distance is also greater than the first distance.
10 . The localized heating system of claim 8 , wherein the two recess portions are configured as opposite rectangles, each of the recess portions has a third length parallel to the first direction and a third width parallel to the axis, the third length is greater than the first length but less than the second length, and the third width is less than the second width.
11 . The localized heating system of claim 7 , wherein a diameter of the circular hole is greater than or equal to the first length.
12 . The localized heating system of claim 7 , wherein the first length is less than the second length.
13 . The localized heating system of claim 7 , wherein the heating portion is adjustably engaged with the outlet end of the plasma deforming portion by being parallel to the axis, so as to vary the second width.