IP Library › Granted Patent US 12,658,341
Granted Patent B2
US 12,658,341 · App. 18/538,822 · Granted Jun 16, 2026

Wire structure, wire capacitor, and electronic device including the wire capacitor

Inventors: Jaehoon Kim (Suwon-si, KR); Hyun-Ji Song (Suwon-si, KR)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
H01B7/04H01B7/0216H01G4/085H01G4/14H05K1/183H10W70/685H01G4/01H01G4/012H05K2201/10015H05K2201/10583
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Quick Facts
Patent No.
US 12,658,341
App. No.
18/538,822
Granted
Jun 16, 2026
Kind
B2
Abstract

A wire structure includes a metal layer, a dielectric layer covering at least a portion of an outer surface of the metal layer, and a filling material provided in the dielectric layer, wherein a flexibility of the filling material is higher than a flexibility of the dielectric layer.

Claims (44)

1 . A wire structure comprising:

a metal layer;

a dielectric layer covering at least a portion of an outer surface of the metal layer, the dielectric layer being hollow and cylindrical; and

a filling material provided in the dielectric layer and filling cracks generated by applying an external force to the dielectric layer,

wherein a flexibility of the filling material is higher than a flexibility of the dielectric layer.

2 . The wire structure of claim 1 , wherein the filling material comprises:

a first filling material which contacts the metal layer; and

a second filling material which is spaced apart from the metal layer.

3 . The wire structure of claim 1 , wherein a length of the filling material in a circumferential-direction of the metal layer is greater than a length of the filling material in a length direction of the metal layer.

4 . The wire structure of claim 1 , further comprising a filling layer which covers an outer surface of the dielectric layer.

5 . The wire structure of claim 1 , wherein a thickness of the filling material in a radial direction of the metal layer is less than or equal to a thickness of the dielectric layer in the radial direction.

6 . The wire structure of claim 1 , wherein the filling material has a tapered shape having a decreasing horizontal width toward the metal layer.

7 . The wire structure of claim 1 , wherein a Young's modulus of the filling material is less than a Young's modulus of the dielectric layer.

8 . The wire structure of claim 1 , wherein the filling material comprises a polymeric material having insulating properties.

9 . A wire capacitor comprising:

a first metal layer;

a dielectric layer covering at least a portion of an outer surface of the first metal layer, the dielectric layer being hollow and cylindrical;

a second metal layer covering at least a portion of an outer surface of the dielectric layer; and

a filling material provided in the dielectric layer and filling cracks generated by applying an external force to the dielectric layer,

wherein a flexibility of the filling material is higher than a flexibility of the dielectric layer.

10 . The wire capacitor of claim 9 , wherein a first surface of the filling material contacts the second metal layer, and

a second surface of the filling material contacts the dielectric layer or the first metal layer.

11 . The wire capacitor of claim 10 , wherein a flexibility of the first metal layer is higher than the flexibility of the dielectric layer.

12 . The wire capacitor of claim 9 , further comprising a filling layer provided between the dielectric layer and the second metal layer.

13 . The wire capacitor of claim 12 , wherein the filling material is formed integrally with the filling layer.

14 . The wire capacitor of claim 12 , wherein a thickness of the filling layer in a radial direction of the first metal layer is less than or equal to a thickness of the dielectric layer in the radial direction.

15 . The wire capacitor of claim 9 , wherein a thickness of the first metal layer in a radial direction of the first metal layer is in a range of from about 5 μm to about 200 μm, and

wherein a thickness of each of the dielectric layer, the filling material, and the second metal layer, in the radial direction, is in a range of from about 100 nm to about 1 μm.

16 . An electronic device comprising:

a substrate comprising:

a base insulating layer;

a plurality of line patterns provided in the base insulating layer; and

a plurality of vias provided in the base insulating layer and contacting and electrically connected to at least some line patterns of the plurality of line patterns; and

a wire capacitor contacting at least some line patterns of the plurality of line patterns and configured to store charges,

wherein the wire capacitor comprises:

a first metal layer;

a dielectric layer covering at least a portion of an outer surface of the first metal layer, the dielectric layer being hollow and cylindrical;

a second metal layer covering at least a portion of an outer surface of the dielectric layer; and

a filling material provided in the dielectric layer and filling cracks generated by applying an external force to the dielectric layer,

wherein a flexibility of the filling material is higher than a flexibility of the dielectric layer.

17 . The electronic device of claim 16 , wherein the wire capacitor is bent.

18 . The electronic device of claim 16 , further comprising a filling layer provided between the dielectric layer and the second metal layer, and having a hollow cylindrical shape.

19 . The electronic device of claim 16 , wherein both ends of the wire capacitor are provided at a same vertical level.

20 . The electronic device of claim 16 , wherein both ends of the wire capacitor are provided at different vertical levels.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 13, 2023
From: KIM, JAEHOON; SONG, HYUN-JI
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 065862/0352 →
Priority Claims (2)
KR 10-2023-0039003 · Mar 24, 2023 · national
KR 10-2023-0067726 · May 25, 2023 · national
Continuity (1)
Related Publication 20240321483A1 · Sep 26, 2024
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