Display device and method of manufacturing the same
A display device includes a base substrate, a pixel defining layer disposed on the base substrate and including a first opening, a light emitting structure disposed in the first opening of the pixel defining layer, a thin film encapsulation layer disposed on the light emitting structure, a touch electrode disposed on the thin film encapsulation layer, an insulating pattern disposed on the touch electrode and including a second opening which overlaps the first opening, and a high refractive layer disposed on the insulating pattern, the high refractive layer including a plurality of grid patterns disposed on a top surface of the high refractive layer, and a refractive index higher than a refractive index of the insulating pattern.
1 . A method of manufacturing a display device, the method comprising:
forming a pixel defining layer on a base substrate, the pixel defining layer including a first opening;
forming a light emitting structure in the first opening of the pixel defining layer;
forming a thin film encapsulation layer on the light emitting structure;
forming a touch electrode on the thin film encapsulation layer;
forming an insulating pattern on the thin film encapsulation layer on which the touch electrode is formed, the insulating pattern including a second opening that overlaps the first opening;
forming a first refractive layer on the insulating pattern, the first refractive layer having a refractive index higher than a refractive index of the insulating pattern; and
forming a plurality of grid patterns on a top surface of the first refractive layer,
wherein the plurality of grid patterns are formed in both a portion of the first refractive layer that overlaps the second opening in a thickness direction of the display device that corresponds to an emission area and in a portion of the first refractive layer that does not overlap the second opening in the thickness direction that corresponds to a non-emission area.
2 . The method of claim 1 , wherein the forming of the plurality of grid patterns includes arranging the plurality of grid patterns on the top surface of the first refractive layer in a first direction at a constant interval and in a second direction perpendicular to the first direction at the constant interval.
3 . A method of manufacturing a display device, the method comprising:
forming a pixel defining layer on a base substrate, the pixel defining layer including a first opening;
forming a light emitting structure in the first opening of the pixel defining layer;
forming a thin film encapsulation layer on the light emitting structure;
forming a touch electrode on the thin film encapsulation layer;
forming an insulating pattern on the thin film encapsulation layer on which the touch electrode is formed, the insulating pattern including a second opening that overlaps the first opening;
forming a first refractive layer on the insulating pattern, the first refractive layer having a refractive index higher than a refractive index of the insulating pattern; and
forming a plurality of grid patterns on a top surface of the first refractive layer, wherein
the plurality of grid patterns reduce deviation in white angular difference (WAD) in the display device, and
the forming of the plurality of grid patterns comprises:
forming a photoresist pattern on the first refractive layer; and
etching the first refractive layer by using the photoresist pattern as an etching barrier.
4 . The method of claim 1 , wherein the forming of the first refractive layer comprises an inkjet process.
5 . A method of manufacturing a display device, the method comprising:
forming a pixel defining layer on a base substrate, the pixel defining layer including a first opening;
forming a light emitting structure in the first opening of the pixel defining layer;
forming a thin film encapsulation layer on the light emitting structure;
forming a touch electrode on the thin film encapsulation layer;
forming an insulating pattern on the thin film encapsulation layer on which the touch electrode is formed, the insulating pattern including a second opening that overlaps the first opening;
forming a first refractive layer on the insulating pattern, the first refractive layer having a refractive index higher than a refractive index of the insulating pattern; and
forming a plurality of grid patterns on a top surface of the first refractive laver, wherein
the plurality of grid patterns reduce deviation in white angular difference (WAD) in the display device, the forming of the first refractive layer comprises an inkjet process, and
the forming of the plurality of grid patterns comprises:
pressing a mold having a pattern corresponding to the plurality of grid patterns, on the first refractive layer; and
transferring the pattern to the top surface of the first refractive layer.
6 . The method of claim 5 , further comprising:
physically separating the mold from the top surface of the first refractive layer.
7 . The method of claim 5 , further comprising:
removing the mold through a chemical scheme.
8 . The method of claim 1 , wherein the plurality of grid patterns are formed in the first refractive layer.
9 . The method of claim 1 , wherein the second opening is larger than the first opening in a plan view.
10 . The method of claim 1 , wherein the plurality of grid patterns are formed in the top surface of the first refractive layer in a first direction at a constant interval and in a second direction perpendicular to the first direction at the constant interval.
11 . The method of claim 1 , wherein each of the plurality of grid patterns are a circular recess or a circular protrusion.
12 . The method of claim 1 , wherein
an interval between neighboring ones of the plurality of grid patterns is in a range of about 2 μm to about 5 μm, and
a height or depth of each of the plurality of grid patterns is in a range of about 5000 Å to about 10000 Å.
13 . The method of claim 1 , further comprising:
forming a second refractive layer disposed on the first refractive layer, the second refractive layer having a refractive index lower than the refractive index of the first refractive layer.
14 . The method of claim 1 , wherein
the insulating pattern includes an organic insulating material.
15 . The method of claim 1 , wherein the second opening is a through hole.
16 . The method of claim 1 , wherein the second opening overlaps an entirety of the first opening in a plan view corresponding to a thickness direction of the display device.
17 . The method of claim 1 , wherein the insulating pattern is formed directly on the thin film encapsulation layer.
18 . The method of claim 1 , wherein
in the forming of the grid patterns, the grid patterns are formed in the top surface of the first refractive layer, and
the first refractive layer entirely covers the insulating pattern.
19 . The method of claim 5 , further comprising:
curing the first refractive layer; and
removing the mold from the first refractive layer, wherein
the pressing and the transferring occur when the first refractive layer is an uncured layer state having fluidity.
20 . The method of claim 19 , wherein
the mold is comprised of photoresist; and
the removing of the mold comprises dissolving and chemically removing the mold using a developer.