Multilayer articles including an absorbent layer and an ultraviolet mirror, systems, devices, and methods of disinfecting
Multilayer articles are provided, including an absorbent layer and an ultraviolet mirror containing at least a plurality of alternating first and second optical layers. The absorbent layer absorbs ultraviolet light having a wavelength between at least 230 nanometers (nm) and 400 nm. The ultraviolet mirror reflects ultraviolet light in a wavelength range from 190 nm to 240 nm. Systems are also provided including a broadband UVC light source and a multilayer article. Devices are provided including a chamber, a broadband UVC light source located within the chamber, an absorbent layer in the chamber, and an ultraviolet mirror between the light source and absorbent layer. Methods of disinfecting a material are further provided, including obtaining a system or device, directing UVC light at the ultraviolet mirror, and exposing the material to ultraviolet light in a wavelength range from 190 nm to 240 nm, reflected by the ultraviolet mirror towards the material.
1 . A multilayer article comprising:
a) an absorbent layer that absorbs at least 50, 60, 70, 80, 90, or 95 percent of incident ultraviolet light having a wavelength between at least 230 nanometers and 400 nanometers while absorbing at least 70 percent of incident visible light having a wavelength between at least 400 nm and 700 nm, the absorbent layer comprising a major surface; and
b) an ultraviolet mirror adjacent to the major surface of the absorbent layer, wherein the ultraviolet mirror is comprised of at least a plurality of alternating first and second optical layers collectively reflecting at an incident light angle of at least one of 0°, 15°, 30°, 45°, 60°, or 75°, at least 50, 60, 70, 80, 90, or 95 percent of incident ultraviolet light in a wavelength range from 190 nanometers, 195 nm, or 200 nm, to 230 nanometers, 235 nm, or 240 nm, and collectively transmitting at an incident light angle of at least one of 0°, 15°, 30°, 45°, 60°, or 75°, at least 50, 60, 70, 80, 90, or 95 percent of incident ultraviolet light in a wavelength range from greater than 230 nanometers, greater than 235 nm, or greater than 240 nm, to 400 nanometers.
2 . The multilayer article of claim 1 , wherein the absorbent layer comprises a silicone thermoplastic, a fluoropolymer, copolymers thereof, or blends thereof.
3 . The multilayer article of claim 1 , wherein the absorbent layer further comprises one or more of an ultraviolet radiation absorber, an ultraviolet radiation scatterer, a hindered amine light stabilizer, an anti-oxidant, a pigment, or a combination thereof.
4 . The multilayer article of claim 1 , wherein the absorbent layer comprises a continuous metal coating or layer.
5 . The multilayer article of claim 1 , wherein the absorbent layer comprises metal particles disposed in a polymer matrix.
6 . The multilayer article of claim 1 , wherein the absorbent layer absorbs at least 90 percent of incident visible light having a wavelength between at least 400 nanometers and 700 nanometers.
7 . The multilayer article of claim 1 , wherein the at least first optical layer comprises at least one of zirconium oxynitride, hafnia, alumina, magnesium oxide, yttrium oxide, lanthanum fluoride, or neodymium fluoride and wherein the second optical layer comprises at least one of silica, aluminum fluoride, magnesium fluoride, calcium fluoride, silica alumina oxide, or alumina doped silica.
8 . The multilayer article of claim 1 , wherein the at least first optical layer comprises at least one of polyvinylidene fluoride or polyethylene tetrafluoroethylene and wherein the second optical layer comprises fluorinated ethylene propylene (FEP) or a copolymer of tetrafluoroethylene, hexafluoropropylene, and vinylidene fluoride.
9 . The multilayer article of claim 1 , wherein the ultraviolet mirror is separated from the absorbent layer by an air gap.
10 . The multilayer article of claim 1 , further comprising at least one of a heat transfer layer, a plurality of heat transfer fins, or a plurality of heat transfer pins, adjacent to a major surface of the absorbing layer opposite the ultraviolet mirror.
11 . The multilayer article of claim 1 , comprising a hollow nonplanar shape.
12 . The multilayer article of claim 1 , wherein a major surface of the ultraviolet mirror comprises a plurality of nonplanar features protruding from the major surface.
13 . A system comprising:
a) a broadband UVC light source; and
b) the multilayer article of claim 1 .
14 . The system of claim 13 , wherein the broadband UVC light source is a low pressure mercury lamp, a medium pressure mercury lamp, a deuterium arc lamp, a xenon arc lamp, or an excimer lamp.
15 . The system of claim 13 , wherein the broadband UVC light source is configured to direct light at the ultraviolet mirror of the multilayer article.
16 . A method of disinfecting at least one material, the method comprising:
a) obtaining a system of claim 13 ;
b) directing UVC light from the broadband UVC light source at the ultraviolet mirror; and
c) exposing the at least one material to ultraviolet light in a wavelength range from 190 nanometers, 195 nm, or 200 nm, to 230 nanometers, 235 nm, or 240 nm, the ultraviolet light reflected by the ultraviolet mirror towards the at least one material.
17 . A device comprising:
a) a chamber, the chamber comprising at least one wall;
b) a broadband UVC light source located within the chamber;
c) an absorbent layer adjacent to the at least one wall of the chamber that absorbs at least 70 percent of incident visible light having a wavelength between at least 400 nm and 700 nm; and
d) an ultraviolet mirror located within the chamber between the broadband UVC light source and the absorbent layer, wherein the ultraviolet mirror is comprised of at least a plurality of alternating first and second optical layers collectively reflecting at an incident light angle of at least one of 0°, 15°, 30°, 45°, 60°, or 75°, at least 50, 60, 70, 80, 90, or 95 percent of incident ultraviolet light in a wavelength range from 190 nanometers, 195 nm, or 200 nm, to 230 nanometers, 235 nm, or 240 nm, and collectively transmitting at an incident light angle of at least one of 0°, 15°, 30°, 45°, 60°, or 75°, at least 50, 60, 70, 80, 90, or 95 percent of incident ultraviolet light in a wavelength range from greater than 230 nanometers, greater than 235 nm, or greater than 240 nm, to 400 nanometers,
wherein at least 50, 60, 70, 80, 90, or 95 percent of ultraviolet light having a wavelength between at least 230 nanometers and 400 nanometers transmitted through the ultraviolet mirror is absorbed in the chamber.
18 . The device of claim 17 , wherein the ultraviolet mirror and the absorbent layer are separate from each other.
19 . A method of disinfecting at least one material, the method comprising:
a) obtaining a system comprising:
a broadband UVC light source; and
a multilayer article comprising:
an absorbent layer that absorbs at least 50, 60, 70, 80, 90, or 95 percent of incident ultraviolet light having a wavelength between at least 230 nanometers and 400 nanometers the absorbent layer comprising a major surface; and
an ultraviolet mirror adjacent to the major surface of the absorbent layer, wherein the ultraviolet mirror is comprised of at least a plurality of alternating first and second optical layers collectively reflecting at an incident light angle of at least one of 0°, 15°, 30°, 45°, 60°, or 75°, at least 50, 60, 70, 80, 90, or 95 percent of incident ultraviolet light in a wavelength range from 190 nanometers, 195 nm, or 200 nm, to 230 nanometers, 235 nm, or 240 nm, and collectively transmitting at an incident light angle of at least one of 0°, 15°, 30°, 45°, 60°, or 75°, at least 50, 60, 70, 80, 90, or 95 percent of incident ultraviolet light in a wavelength range from greater than 230 nanometers, greater than 235 nm, or greater than 240 nm, to 400 nanometers;
b) directing UVC light from the broadband UVC light source at the ultraviolet mirror; and
c) exposing the at least one material to ultraviolet light in a wavelength range from 190 nanometers, 195 nm, or 200 nm, to 230 nanometers, 235 nm, or 240 nm, the ultraviolet light reflected by the ultraviolet mirror towards the at least one material,
wherein the at least one material is exposed to 10, 8, 6, 5, 4, 3, 2, or 1 percent or less of ultraviolet light having a wavelength between greater than 230 nanometers, 235 nm, or 240 nm, and 400 nanometers that is emitted by the broadband UVC source.