Plasma reactor and plasma chemical reactions
The present disclosure is related to the field of chemistry and provides methods and devices for stimulation of endothermic reactions in gas phase with high activation barriers by nanosecond pulsed electrical discharge. It can be used for, e.g., CO 2 functionalization of methane, H 2 S dissociation, hydrogen and syngas production, for processing ammonia synthesis and dissociation, etc. Some embodiments include methods and devices associated with the stimulation of plasma chemical reactions with nanosecond pulse electric discharge in the presence of gas flow.
1 . A plasmachemical reactor with nanosecond pulse electric discharge generation, wherein the reactor comprises:
one or more cylindrical channels having a gas input system and output system;
a high voltage positive electrode and a high voltage negative electrode in each channel; and
a gas swirling system in each channel for increasing local tangential gas velocity at electrodes ends; wherein
the pulse electric discharge generation has a frequency f,
the tangential gas velocity is greater than f*5*10 −3 m/s, and
wherein each high voltage positive electrode and each high voltage negative electrode has a cylindrical shape and at least one electrode has a tangential channel in the electrode body and a circular row of equal length rods on a flat end and at least one electrode having no tangential channel has a circular row of rods having lengths which decrease along a direction of gas rotation.
2 . The plasmachemical reactor of claim 1 , wherein the gas swirling system has an auger shaped electrode isolator, a tangential channel in one or more electrode, and a tangential channel in the gas input and/or the gas output systems.
3 . The plasmachemical reactor of claim 1 , wherein a power supply provides an alternating voltage supply to the positive electrode and the negative electrode of each N channels by N pairs of half-wave rectifiers having a high voltage diode and a capacitor wherein one rectifier of each pair charges the positive electrode positively and another rectifier charges the negative electrode negatively.
4 . The plasmachemical reactor of claim 3 , wherein a high voltage inductor and/or high voltage capacitor is connected in series to the diode of each half-wave rectifier.
5 . The plasmachemical reactor of claim 3 , wherein the power supply includes a half-wave fly-back.
6 . The plasmachemical reactor of claim 4 , wherein the power supply includes a full-wave push-pull circuit with an insulated gate bipolar transistor (IGBT) semi-bridge.
7 . The plasmachemical reactor of claim 4 , wherein the power supply is a full-wave push-pull circuit with IGBT semi-bridge with midpoint transformer primary winding.
8 . The plasmachemical reactor of claim 4 , wherein the power supply a full-wave push-pull with IGBT bridge.