Method and system for carrying out plasma chemical reaction in gas flow
A plasma chemical reactor including an anode having a generally cylindrical shape and an axis of rotational symmetry; a cathode inside the anode and co-axial with the anode; a hot plasma channel between the between the anode and the cathode; a gas input module providing gas flow into the anode; a gas output module at a distal end of the anode; and a high voltage power supply providing with a current in a range of 0.1-1.0 A. The high voltage power supply provides a voltage to the cathode in a range of 0-5 kV, a power of at least 1 kW, and a voltage/current ratio of at least 1000 V/A.
1. A plasma chemical reactor comprising:
an anode having an axis of rotational symmetry, the anode having a proximal cylindrical portion having a first diameter, a distal cylindrical portion having a second diameter that is smaller than the first diameter, and a conical portion connecting the distal and proximal portions;
a cathode inside the proximal cylindrical portion of the anode and having a cylindrical portion that is co-axial with the anode, the cathode having a conical tip that extends in a distal direction no further than the conical portion of the anode;
a hot plasma channel in the distal cylindrical portion of the anode;
a gas input module providing gas flow into the anode;
a gas output module at a distal end of the anode, such that the distal cylindrical portion of the anode forms a reaction chamber to break down the gas flow into component gases due to a moving plasma filament in the distal cylindrical portion of the anode; and
a high voltage power supply providing a current in a range of 0.1-1.0 A,
the high voltage power supply providing a voltage to the cathode in a range of 0-5 kV and providing power of at least 1 kW, wherein the voltage has a DC component, and
the high voltage power supply providing a voltage/current ratio of at least 1000 V/A.
2. The plasma chemical reactor of claim 1 , wherein the high voltage power supply limits current by output reactive resistance based on a series capacitor.
3. The plasma chemical reactor of claim 1 , wherein the high voltage power supply limits current by output reactive resistance based on a series inductor.
4. The plasma chemical reactor of claim 1 , wherein the high voltage power supply limits current by output reactive resistance based on a series inductor adjustable by a biased magnetic core.
5. The plasma chemical reactor of claim 1 , wherein the high voltage power supply limits current by using a voltage doubling scheme.
6. The plasma chemical reactor of claim 1 , wherein the high voltage power supply limits current by an output reactive resistance based on a series capacitor, a series inductor, a series inductor adjustable by a biased magnetic core, or voltage doubling, which connect with each other in parallel, or in series, or in series-parallel.
7. The plasma chemical reactor of claim 1 , further comprising a gas recirculation line that recirculates some of the gas from the gas output of chemical reactor back into the gas input of chemical reactor.
8. A plasma chemical reactor comprising:
an anode having a proximal cylindrical portion having a first diameter, a distal cylindrical portion having a second diameter that is smaller than the first diameter, and a conical portion connecting the distal and proximal portions;
a cathode inside the proximal cylindrical portion of the anode and having a cylindrical portion that is co-axial with the anode, the cathode having a conical tip that extends in a distal direction no further than the conical portion of the anode;
a plasma channel in the distal cylindrical portion of the anode;
a gas input module providing gas flow into a proximal end of the anode;
a gas output module at a distal end of the anode, such that the distal cylindrical portion of the anode forms a reaction chamber to break down the gas flow into component gases due to a moving plasma filament in the distal cylindrical portion of the anode; and
a high voltage power supply providing a current in a range of 0.1-1.0 A,
the high voltage power supply providing a voltage to the cathode in a range of up to 5 kV for each 1 kW of power, wherein the voltage has a DC component;
the high voltage power supply providing with a voltage/current ratio of at least 1000 V/A,
wherein the high voltage power supply includes a plurality on series-connected or parallel-connected or series-parallel modules that limit current by an output reactive resistance based on a series capacitor, a series inductor, a series inductor adjustable by a biased magnetic core, or voltage doubling.
9. The plasma chemical reactor of claim 8 , further comprising a gas recirculation line that recirculates some of the gas from the gas output of chemical reactor back into the gas input of chemical reactor.