IP Library › Granted Patent US 12,719,007
Granted Patent B2
US 12,719,007 · App. 18/238,884 · Granted Aug 25, 2026

Ion source containing a sputter target

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Quick Facts
Patent No.
US 12,719,007
App. No.
18/238,884
Filed
Aug 28, 2023
Granted
Aug 25, 2026
Kind
B2
Art Unit
2878
USPC
250/425
Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 30, 2023
From: WRIGHT, GRAHAM
To: APPLIED MATERIALS, INC.
Reel/Frame 064753/0560 →
Continuity (1)
Related Publication 20250079113A1 · Mar 6, 2025
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