IP Library › Granted Patent US 12,722,228
Granted Patent B2
US 12,722,228 · App. 17/610,950 · Granted Sep 1, 2026

Laser processing machine, laser processing system, rotator unit apparatus, laser processing method, and method for producing probe card

Inventors: Shinichi Nakashiba (Kyoto, JP); Osamu Endo (Kyoto, JP)
Assignee: NITTOKU KYOTO CO., LTD.
B23K26/0665B23K26/062B23K26/0643B23K26/0648B23K26/082B23K26/083B23K26/0869B23K26/384B23K26/388B23K26/702
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Quick Facts
Patent No.
US 12,722,228
App. No.
17/610,950
Granted
Sep 1, 2026
Kind
B2
Abstract

A laser processing machine including: a laser source that emits a laser beam; a polarization rotator unit; a beam rotator unit; a lens; and a controller, which apply the laser beam to a workpiece, the polarization rotator unit includes a wave plate and first actuator that rotates the wave plate, the beam rotator unit includes an optical system that adjusts an irradiation angle of the laser beam to the workpiece by making an incident laser beam eccentric to output and making the laser beam incident on the lens at a position eccentric from a central axis, a second actuator rotates the optical system, the lens condenses the laser beam on the workpiece, the controller controls a rotational speed ratio between the first actuator and the second actuator, and adjusts a polarized state of the laser beam by controlling the rotational speed ratio.

Claims (61)

1 . A laser processing machine comprising:

a laser light source configured to emit a laser beam that is linearly polarized;

a polarization rotator unit comprising:

a wave plate configured to change a polarization direction of the laser beam; and

a first rotation actuator configured to rotate the wave plate;

a beam rotator unit comprising:

an irradiation angle adjusting optical system including at least one prism; and

a second rotation actuator configured to rotate the irradiation angle adjusting optical system;

a condensing optical system including at least one lens configured to condense the laser beam on a workpiece; and

a controller configured to adjust a polarized state of the laser beam by controlling a rotational speed ratio between the first rotation actuator and the second rotation actuator, wherein

the irradiation angle adjusting optical system is configured to adjust an irradiation angle of the laser beam to the workpiece by making an incident laser beam eccentric to output and making the laser beam incident on the condensing optical system at a position eccentric from a central axis thereof.

2 . A laser processing machine comprising:

a laser light source configured to emit a linearly polarized laser beam;

a polarization rotator unit;

a beam rotator unit;

a condensing optical system including at least one lens;

at least one rotational driving actuator; and

a controller, wherein

the polarization rotator unit, the beam rotator unit, and the at least one lens are configured to apply the laser beam to a workpiece,

the polarization rotator unit comprises a wave plate configured to change a polarization direction of the laser beam,

the beam rotator unit comprises an irradiation angle adjusting optical system including at least one prism configured to adjust an irradiation angle of the laser beam to the workpiece by making an incident laser beam eccentric to output and making the laser beam incident on the condensing optical system at a position eccentric from a central axis thereof,

the at least one rotational driving actuator is configured to rotate the wave plate and to rotate the irradiation angle adjusting optical system,

the at least one lens is configured to condense the laser beam on the workpiece, and

the controller is configured to:

control the at least one rotational driving actuator to control a rotational speed ratio between the wave plate and the irradiation angle adjusting optical system, and

adjust a polarized state of the laser beam by controlling the rotational speed ratio.

3 . The laser processing machine according to claim 1 , wherein

the first rotation actuator comprises a first motor and the second rotation actuator comprises a second motor that individually supply rotational driving force to the wave plate and the irradiation angle adjusting optical system, respectively,

the laser processing machine further comprises a first amplifier and a second amplifier that are connected to the first motor and the second motor, respectively, and

the controller comprises a motor synchronous controlling unit configured to transmit a control signal to the first amplifier and the second amplifier effective to control the rotational speed of the first motor and the second motor.

4 . The laser processing machine according to claim 1 , wherein the wave plate is a λ/2 plate.

5 . The laser processing machine according to claim 2 , wherein

the at least one rotational driving actuator comprises a first rotation actuator configured to rotate the wave plate and a second rotation actuator configured to rotate the irradiation angle adjusting optical system, wherein a rotational speed ratio (X:Y) between a rotational speed (X) of the first rotation actuator and a rotational speed (Y) of the second rotation actuator is one of 1.5:1, −0.5:1, or 0.5:1.

6 . The laser processing machine according to claim 1 , wherein

the controller is further configured to control a rotational phase difference between the first rotation actuator and the second rotation actuator,

a first initial position of the first rotation actuator is a rotation angle in which a polarization direction of the laser beam and a fast axis direction of the wave plate coincide,

a second initial position of the second rotation actuator is a rotation angle in which the polarization direction of the laser beam and a beam eccentric direction of the beam rotator unit coincide, and

the rotational phase difference is a phase difference between the first initial position and the second initial position.

7 . The laser processing machine according to claim 2 , further comprising:

a processing stage, wherein

the processing stage is configured to hold the workpiece and is movable in a horizontal direction.

8 . The laser processing machine according to claim 2 , further comprising:

a galvano scanner, wherein

the galvano scanner is configured to scan the workpiece with the laser beam condensed by the condensing optical system.

9 . The laser processing machine according to claim 8 , wherein

the controller is further configured to control scanning of the laser beam by the galvano scanner.

10 . The laser processing machine according to claim 2 , wherein

the beam rotator unit further comprises a rotation radius adjusting optical system comprising at least one prism,

configured to:

tilt an incident laser beam with respect to an incident optical axis,

make the laser beam obliquely incident on the condensing optical system, and

annularly scan an irradiation position of the workpiece with the laser beam.

11 . The laser processing machine according to claim 2 , wherein

the at least one rotational driving actuator comprises a first motor and a second motor that individually supply rotational driving force to the wave plate and the irradiation angle adjusting optical system, respectively, and

the laser processing machine further comprises a first amplifier and a second amplifier that are connected to the first motor and the second motor, respectively, and

the controller comprises a motor synchronous controlling unit configured to transmit a control signal to the first amplifier and the second amplifier effective to control the rotational speed of the first motor and the second motor.

12 . The laser processing machine according to claim 11 , wherein

the controller is further configured to control a rotational phase difference between the first motor and the second motor,

a first initial position of the first motor is a rotation angle in which a polarization direction of the laser beam and a fast axis direction of the wave plate coincide,

a second initial position of the second motor is a rotation angle in which the polarization direction of the laser beam and a beam eccentric direction of the beam rotator unit coincide, and

the rotational phase difference is a phase difference between the first initial position and the second initial position.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 9, 2026
From: KATAOKA CORPORATION
To: NITTOKU KYOTO CO., LTD.
Reel/Frame 075217/0980 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 12, 2021
From: NAKASHIBA, SHINICHI; ENDO, OSAMU
To: KATAOKA CORPORATION
Reel/Frame 058100/0096 →
Priority Claims (1)
JP 2020-100120 · Jun 9, 2020 · national
Continuity (1)
Related Publication 20230092230A1 · Mar 23, 2023
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