Granted Patent B2

US 12,730,041 · App. 18/661,104 · Granted Sep 8, 2026

Inventors: W. Henry Benner (Carmel, CA); Ben Aguilar (Monterey, CA)

Assignee: ION DX, INC.

G01N1/42

Abstract

Claims (55)

1 . An apparatus for preparing samples for examination by cryo-EM, the apparatus comprising:

(a) an electrospray ion source;

(b) means to reduce the charge on electrospray droplets and ions;

(c) a mobility filter configured to select ions having a particular conformation out of a mixture of ions;

(d) a humidifier configured to control the dew point and temperature of ion-laden air;

(e) an ion focusing funnel;

(f) a holder for a cryo-EM grid;

(g) a cooled pedestal configured to preserve the conformation of deposited ions;

(h) a chamber for protecting deposited ions; and

(i) means to transfer deposited ions or particles into liquid nitrogen.

2 . The apparatus of claim 1 , wherein said means to reduce the charge on electrospray droplets and ions comprises a source of 210 Polonium, wherein alpha particles are released from the 210 Polonium into the electrospray droplets and ions.

3 . The apparatus of claim 1 , wherein said means to reduce the charge on electrospray droplets and ions comprises a source of electrons having an energy of less than about 20 eV, wherein said electrons are released into the electrospray droplets and ions.

4 . The apparatus of claim 1 , wherein the means to transfer deposited ions or particles into liquid nitrogen comprises tweezers.

5 . An apparatus for depositing samples onto a surface for subsequent analysis, the apparatus comprising:

(a) an electrospray ion source;

(b) means to reduce charge on electrospray droplets, ions and particles;

(c) a mobility filter configured to select ions and charged particles having a particular conformation or size out of a mixture of ions and particles;

(d) means to control dew point and temperature of ion-laden or particle-laden gas;

(e) means to control hydration of ions and charged-particles;

(f) an ion- and charged-particle focusing device;

(g) means to control kinetic energy of ions and charged-particles;

(h) a holder for substrates onto which ions or charged-particles are deposited;

(i) means to deposit ions and charged-particles onto a substrate;

(j) means to control temperature of the collection surface;

(k) a chamber configured to protect deposited ions or charged-particles;

(l) means for transferring deposited ions or charged-particles into ancillary analytical devices; and

(m) means to preserve deposited ions or charged particles with a cryo-protectant.

6 . The apparatus of claim 5 , wherein said means to reduce charge on electrospray droplets, ions and particles comprises a source of 210 Polonium, wherein alpha particles are released from the 210 Polonium into the electrospray droplets, ions and particles.

7 . The apparatus of claim 5 , wherein said means to reduce charge on electrospray droplets, ions and particles comprises a source of electrons having an energy of less than about 20 eV, wherein said electrons are released into the electrospray droplets, ions and particles.

8 . The apparatus of claim 5 , wherein said means to control dew point of ion-laden or particle-laden gas comprises a dew point controller configured to add or remove water vapor based on heating or cooling a supply of water vapor.

9 . The apparatus of claim 5 , wherein said means to control temperature of ion-laden or particle-laden gas comprises a temperature controller configured to sense temperature of gas flow.

10 . The apparatus of claim 5 , wherein said means to control hydration of ions and charged-particles comprises a humidifier configured to hydrate ions or particles based on condensing water vapor onto ions and charged-particles.

11 . The apparatus of claim 5 , wherein said means to control kinetic energy of ions and charged-particles comprises a mass flow controller or a pressure controller or an electric field generator, or any combination thereof.

12 . The apparatus of claim 11 , wherein said means to control kinetic energy uses physical distances, gas density, and gas velocity to produce ions and charged particles having low kinetic energy, wherein separation between electrically powered electrodes affects ion energy, wherein higher gas density reduces ion velocity and thus ion energy, and wherein velocity of ion- and particle-laden gas directly influences ion kinetic energy.

13 . The apparatus of claim 5 , wherein said means to deposit ions and charged-particles onto a substrate comprises an ion funnel.

14 . The apparatus of claim 5 , wherein said means to control temperature of the collection surface comprises a temperature controller.

15 . The apparatus of claim 5 , wherein said means for transferring deposited ions or charged-particles into ancillary analytical devices, comprises tweezers.

16 . The apparatus of claim 5 , wherein said means to preserve deposited ions or charged particles with a cryo-protectant comprises a refrigeration source.

17 . The apparatus of claim 5 , wherein said mobility filter comprises a nano-differential mobility analyzer.

18 . An apparatus for depositing samples onto a surface for subsequent analysis, the apparatus comprising:

(a) an electrospray source;

(b) a source of 210 Polonium, wherein alpha particles are released from the 210 Polonium into electrospray droplets, ions and particles, or a source of electrons having an energy of less than about 20 eV, wherein said electrons are released into the electrospray droplets, ions and particles;

(c) a mobility filter comprising a nano differential mobility analyzer;

(d) a temperature controller and dew point controller configured to control temperature and dew point of ion and particle flow streams wherein temperature control is based sensing gas flow temperature and wherein dew point control is provided by adding or removing water vapor based on heating or cooling a supply of water vapor;

(e) a humidifier configured to hydrate ions or particles based on condensing water vapor onto ions and charged particles;

(f) an ion funnel configured to increase flux of ions and charged particles so as to minimize time needed to deposit a predetermined number of ions or particles;

(g) a mass flow controller or a pressure controller or an electric field generator, or any combination thereof, configured to control kinetic energy using physical distances, gas density, and gas velocity to produce ions and charged particles having low kinetic energy, wherein separation between electrically powered electrodes affects ion energy, wherein higher gas density reduces ion velocity and thus ion energy, and wherein velocity of ion- and particle-laden gas directly influences ion kinetic energy;

(h) a holder configured to support a collection surface;

(i) an ion deposition device configured to use and control of electric fields, gas density and gas velocity for guiding ions and charged particles to strike the collection surface;

(j) an optional temperature controller configured to control temperature of the collection surface and collected ions and particles during the time they are collected;

(k) an optional temperature controller configured to control temperature of collected ions and particles after they are collected;

(l) a transfer stage or instrument for moving the collected particles out of the holder and into an ancillary analytical instrument of storage container;

(m) an optional temperature controller configured to control temperature of the collected ions and particles while the collected particles are transferred to alternative analytical devices; and

(o) a transfer stage or instrument for transferring the collected particles into a long-term storage container, such as a liquid-nitrogen dewar during the time they are collected.

19 . A method comprising preparing samples for examination by cryo-EM using the apparatus of any of claims 1 through 18 .

Assignments (1)

Continuity (4)

References Cited (67)