Method for producing semiconductor including forming a layer containing at least silicon carbide and forming a second layer containing at least silicon oxygen carbide
Methods are provided for depositing a silicon carbide layer having significantly reduced current leakage. The silicon carbide layer may be a barrier layer or part of a barrier bilayer that also includes a barrier layer. Methods for depositing oxygen-doped silicon carbide barrier layers are also provided. The silicon carbide layer may be deposited by reacting a gas mixture comprising an organosilicon compound, an aliphatic hydrocarbon comprising a carbon-carbon double bond or a carbon-carbon triple bond, and optionally, helium in a plasma. Alternatively, the silicon carbide layer may be deposited by reacting a gas mixture comprising hydrogen or argon and an organosilicon compound in a plasma.
1. A method for processing a substrate, comprising:
depositing an phenyl containing silicon carbide layer on the substrate by reacting a first gas mixture comprising hydrogen, an inert gas, and a phenylsilane compound in a plasma; and
depositing an oxygen-doped silicon carbide layer on the phenyl containing silicon carbide layer by reacting a second gas mixture comprising trimethylsilane.
2. The method of claim 1 , wherein the phenylsilane compound is selected from the group consisting of diphenylsilane, dimethylphenylsilane, diphenylmethylsilane, phenylmethylsilane, an combinations thereof.
3. The method of claim 2 , wherein the first gas mixture further comprises an aliphatic hydrocarbon comprising carbon-carbon double bond or a carbon-carbon triple bond.
4. The method of claim 3 , wherein the aliphatic hydrocarbon is ethylene.
5. The method of claim 1 , wherein the inert gas comprises helium, argon, or combinations thereof.
6. The method of claim 1 , further comprising depositing a low dielectric constant material on the oxygen-doped silicon carbide layer.
7. The method of claim 1 , wherein the second gas mixture further comprises an oxygen-containing compound having the general formula:
8. The method of claim 7 , wherein the oxygen-containing compound is selected from the group consisting of tetramethyldisiloxane and dimethyldimethoxysilane.
9. The method of claim 1 , wherein the second gas mixture further comprises an oxygen-containing gas having the formula C X H Y O Z , with X being from 0 to 2, Y being from 0 to 2, and Z being from 1 to 3, wherein X+Y is at least 1 and X+Y+Z is 3 or less.
10. The method of claim 9 , wherein the second gas mixture further comprises an inert gas.
11. The method of claim 10 , wherein the oxygen-containing as is carbon dioxide and the inert gas is helium.
12. The method of claim 9 , wherein the trimethylsilane is introduced into a processing chamber at a flow rate between about 50 sccm and about 300 sccm and the oxygen-containing gas is introduced into the processing chamber at a flow rate between a out 100 sccm and about 800 sccm.
13. A method for processing a substrate, comprising:
pre-treating a substrate with a hydrogen plasma;
depositing an phenyl containing silicon carbide layer on the substrate by reacting a first gas mixture comprising hydrogen, an inert gas, and a phenylsilane compound in a plasma and depositing a silicon carbide layer on the substrate; and
reacting a second gas mixture comprising trimethylsilane and an oxygen-containing gas having the formula C X H Y O Z , with X being from 0 to 2, Y being from 0 to 2, and Z being from 1 to 3, wherein X+Y; s at least 1 and X+Y+Z is 3 or less, in a plasma and depositing an oxygen-doped silicon carbide layer on the phenyl containing silicon carbide layer.
14. The method of claim 13 , wherein the phenylsilane compound is selected from the group consisting of diphenylsilane, dimethylphenylsilane, diphenylmethylsilane, phenylmethylsilane, and combinations thereof.
15. The method of claim 14 , wherein the first gas mixture further comprises an aliphatic hydrocarbon comprising carbon-carbon double bond or a carbon-carbon triple bond.
16. The method of claim 15 , wherein the aliphatic hydrocarbon is ethylene.
17. The method of claim 13 , wherein the inert gas comprises helium, argon, or combinations thereof.
18. The method of claim 13 , wherein the second gas mixture further comprises an inert gas.
19. The method of claim 18 , wherein the oxygen-containing gas is carbon dioxide and the inert gas is helium.
20. The method of claim 13 , wherein the trimethylsilane is introduced into a processing chamber at a flow rate between about 50 sccm and about 300 sccm and the oxygen-containing gas is introduced into the processing chamber at a flow rate between about 100 sccm and about 800 sccm.
21. The method of claim 13 , further comprising depositing a photoresist on the oxygen-doped silicon carbide layer.
22. A method for processing a substrate, comprising:
depositing a layer comprising silicon, carbon, and nitrogen, on the substrate; and
reacting a gas mixture comprising an organosilicon compound and carbon dioxide in a plasma and depositing an oxygen-doped silicon carbide layer on the substrate.
23. The method of claim 22 , wherein the gas mixture further comprises an inert gas.
24. The method of claim 23 , wherein the organosilicon compound is trimethylsilane and the inert gas is helium.
25. The method of claim 22 , wherein the organosilicon compound is introduced into a processing chamber at a flow rate between about 50 sccm and about 300 sccm, end carbon dioxide is introduced into the processing chamber at a flow rate between about 100 sccm and about 800 sccm.
26. The method of claim 22 , further comprising depositing a photoresist on the oxygen-doped silicon carbide layer.
27. The method of claim 22 , further comprising pretreating a substrate with a hydrogen plasma.