Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography

1. A method for detecting phase and amplitude error of an alternating phase shifting mask, the method comprising:

passing a collimated light beam through a pair of adjacent, phase shifted openings in the phase shifting mask;

recording, as a function of angular position, beam intensities of diffracted light passed through said pair of adjacent openings;

determining, from said recorded beam intensities, an angle α at which a first diffraction order and a second diffraction order occurs, wherein α represents a deviation from a pair of symmetrically distributed diffraction orders; and

determining, from said recorded beam intensities, a minimum intensity and a maximum intensity;

wherein the phase error is calculated from the determined value of α, and the amplitude error is calculated from said minimum intensity and said maximum intensity.

2. The method of claim 1 , wherein the phase error is expressed in terms of a depth error, said depth error being calculated by using α, an index of refraction of a transmissive layer of the mask, and a center separation distance between said pair of adjacent openings.

3. The method of claim 2 , wherein said depth error, d, is calculated in accordance with time equation:

α= d ( n− 1)/ p;

wherein n is said index of refraction and p is said center separation distance.

4. The method of claim 1 , wherein the amplitude error is determined from a ratio between said minimum intensity and said maximum intensity.

5. The method of claim 1 , wherein said angle α, said minimum intensity and said maximum intensity are determined from an angular distribution of diffraction curve plotted from said recorded beam intensities.

6. A method for detecting phase and amplitude error of an alternating phase shifting mask, the method comprising:

passing a collimated light beam through a pair of adjacent, phase shifted openings in the phase shifting mask;

recording, as a function of angular position, beam intensities of diffracted light passed through said pair of adjacent openings, said beam intensities further being used to plot an angular distribution of diffraction curve with respect to an arc of constant radius about a centerline between said pair of adjacent openings;

determining, from said angular distribution of diffraction curve, an angle α at which a first diffraction order and a second diffraction order occurs, wherein α represents a deviation from a pair of symmetrically distributed diffraction orders; and

determining, from said angular distribution of diffraction curve, a minimum intensity and a maximum intensity;

wherein the phase error is calculated from the determined value of α, and the amplitude error is calculated from said minimum intensity and said maximum intensity.

7. The method of claim 6 , wherein said beam intensities are recorded with a photo detector.

8. The method of claim 7 , wherein said photo detector is passed through said arc of constant radius.

9. The method of claim 6 , wherein the phase error is expressed in terms of a depth error, said depth error being calculated by using α, an index of refraction of a transmissive layer of the mask, and a center separation distance between said pair of adjacent openings.

10. The method of claim 9 , wherein said depth error, d, is calculated in accordance with the equation:

α= d ( n− 1)/ p;

wherein n is said index of refraction and p is said center separation distance.

11. The method of claim 6 , wherein the amplitude error is determined from a ratio between said minimum intensity and said maximum intensity.

12. The method of claim 6 , wherein said collimated light beam is incident upon the mask at a normal angle thereto.

13. A system for detecting phase and amplitude error of an alternating phase shifting mask, comprising:

an optical source for directing a collimated light beam through a pair of adjacent, phase shifted openings in the phase shifting mask;

a photo detector for detecting, through an arc of constant radius about a centerline between said pair of adjacent openings, beam intensities of diffracted light passed through said pair of adjacent openings; and

a test apparatus for recording, as a function of angular position, said beam intensities, said test apparatus further using said beam intensities to plot an angular distribution of diffraction curve;

said test apparatus further comprising a computer processing device for determining, from said angular distribution of diffraction curve an angle α at which a first diffraction order and a second diffraction order occurs, wherein α represents a deviation from a pair of symmetrically distributed diffraction orders

said computer processing device configured to compute a depth error, d, using α, an index of refraction of a transmissive layer of the mask, and a center separation distance between said pair of adjacent openings, in accordance with the equation:

α= d ( n− 1)/ p;

wherein n is said index of refraction and p is said center separation distance; and

wherein the phase error and the amplitude error are determined from said angular distribution of diffraction curve.

14. The system of claim 13 , wherein said photo detector is configured upon an angular stage, said angular stage being adjustably movable about said an arc of constant radius.

15. The system of claim 13 , wherein said computer processing device determines the amplitude error from a ratio between a minimum intensity and a maximum intensity from said angular distribution of diffraction curve.

16. The system of claim 13 , wherein said photo detector further comprises a pinhole detector.