Method of inspecting for defects and apparatus for performing the method
In a method of inspecting an object, a first light is irradiated onto a bare object and a first reflection signal is reflected from the bare object. A second light is irradiated onto a processed object and a second reflection signal is reflected from the processed object. The first and second reflection signals are differentiated, to thereby generate respective first and second differential signals. A defect on the processed object is detected by a comparison between the first and second differential signals. The first and second differential signals overlap with each other and at least one signal-deviation portion is detected. The first and second differential signals are spaced apart out of an allowable error range in the signal-deviation portion. The defect is detected from a portion of the processed object corresponding to the signal-deviation portion.
1. A method of inspecting an object, comprising:
scanning a bare object using a first light, the bare object including no structures thereon;
receiving a first reflection signal that is reflected from the object;
performing a process on the object, so that a structure is formed on the object;
scanning the processed object using a second light;
receiving a second reflection signal that is reflected from the processed object;
generating first and second differential signals by respectively differentiating the first and second reflection signals; and
detecting a processing defect on the processed object by a comparison between the first and second differential signals,
wherein detecting the processing defect includes:
overlapping the first and second differential signals;
detecting at least one signal-deviation portion in which the first and second differential signals are spaced apart out of an allowable error range; and
locating a portion of the processed object corresponding to the signal-deviation portion.
2. The method of claim 1 , wherein the first and second differential signals overlap each other on a basis of peak points of the first and second differential signals, the peak points being substantially identical to one another in the first and second differential signals.
3. The method of claim 1 , wherein the first reflection signal includes an intensity of the first reflected light and the second reflection signal includes an intensity of the second reflected light.
4. The method of claim 1 , wherein the first and second lights have the same incident angle with respect to the bare substrate and the processed object, respectively.
5. The method of claim 4 , wherein the incident angle is in a range from about 10° to about 90° with respect to a surface of the processed object.
6. The method of claim 1 , wherein the object includes a semiconductor substrate and processing the object includes forming a minute structure on the semiconductor substrate.
7. An apparatus for inspecting an object, comprising:
a light source for irradiating a first light onto a bare object and for irradiating a second light onto a processed object, the bare object including no structures thereon and the processed object including structures thereon;
a light receiver for receiving first and second reflection signals reflected from the bare object and the processed object, respectively;
a differentiation operator for generating first and second differential signals by differentiating the first and second reflection signals; and
a detector for detecting a processing defect on the processed object by a comparison between the first and second differential signals,
wherein the detector includes:
a first processing module for detecting peak points in the first and second differential signals, the peak points being substantially identical to one another in the first and second differential signals;
a second processing module for overlapping the first and second differential signals on a basis of the detected peak points;
a third processing module for detecting at least one signal-deviation portion in which the first and second differential signals are spaced apart out of an allowable error range; and
a fourth processing module for locating a portion of the processed object corresponding to the signal-deviation portion.
8. The apparatus of claim 7 , further comprising a memory unit for storing the first and second differential signals.
9. The apparatus of claim 7 , wherein the light source and the light receiver positions are disposed parallel with each other in a direction vertical to the object, so that the first and second lights are vertically irradiated onto the bare and processed objects, respectively, and the first and second reflection signals are also vertically received into the light receiver, respectively.
10. The apparatus of claim 7 , wherein the light receiver includes a photo multiplier tube, a photodiode, a phototransistor and a photoelectric tube.
11. The apparatus of claim 7 , wherein the object includes a semiconductor substrate including a plurality of dies.